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An object of the invention is a contacting arrangement of solid oxide cells, each solid oxide cell comprising at least two flow field plates (121) to arrange gas flows in the cell, and an active electrode structure (130), which comprises an anode side (100), a cathode side (102), and an electrolyte element (104) between the anode side and the cathode side. The contacting arrangement comprises gasket structure (128) to perform sealing functions in the solid oxide cell and a contact structure (132) locating between the flow field plates (121) and the active electrode structure (130), said contact structure being at least partly a gas permeable structure being adapted according to structures of the flow field plates (121) and according to structure of the active electrode structure (130).

Claims which contain your search:

1. Contacting arrangement of solid oxide cells, each solid oxide cell comprising at least two flow field plates (121) to arrange gas flows in the cell, and an active electrode structure (130), which comprises an anode side (100), a cathode side (102), and an electrolyte element (104) between the anode side and the cathode side, characterized in that the contacting arrangement comprises gasket structure (128) to perform sealing functions in the solid oxide cell and a contact structure (132) locating between the flow field plates (121) and the active electrode structure (130), said contact structure being at least partly a gas permeable structure being adapted according to structures of the flow field plates (121) and according to structure of the active electrode structure (130).

2. Contacting arrangement of solid oxide cells according to claim 1, characterized in that the contact structure (132) being adaptively gas permeable by at least one of form of the holes (134), size of the holes (134), distance between the holes (134), porosity of the structure (132) and tortuosity of the structure (132).

4. Contacting arrangement of solid oxide cells according to claim 1, characterized in that thickness of the contact structure (132) is being optimized according to at least one of heat transfer characteristics, electrical characteristics of the contacting arrangement and gas distribution characteristics.

7. Contacting method of solid oxide cells, in which method is arranged gas flows in the cell, characterized in that in the method: - is performed sealing functions in the solid oxide cell, and is established a contact structure between the gas flows in the cell and an active electrode structure, - and said contact structure (132) is at least partly adapted by a gas permeable structure according to the gas flows in the cell and according to structure of the active electrode structure (130).

8. Contacting method of solid oxide cells according to claim 7, characterized in that in the method is utilized a gas permeable structure of the contact structure (132) adaptively on the basis of at least one of form of the holes (134), size of the holes (134), distance between the holes (134), porosity of the structure (132) and tortuosity of the structure (132).

10. Contacting method of solid oxide cells according to claim 7, characterized in that in the method is optimized thickness of the contact structure (132) according to at least one of heat transfer characteristics, electrical characteristics of the contacting arrangement and gas distribution characteristics.

...

Patent
Primetals Technologies Austria GmbH | Date: 2017-03-01

The invention relates to a method for monitoring a pressurized gas-based cleaning process in a hose filter installation (2), in which method, during a cleaning process, a throughflow (Q) of a pressurized-gas flow during a predefinable time period (T) is determined, a throughflow characteristic (V) is determined using the determined throughflow (Q) of the pressurized-gas flow, and the pressurized gas-based cleaning process is monitored using the throughflow characteristic (V), wherein the throughflow characteristic (V) is a pressurized-gas quantity that has flowed in the predefinable time period (T). The invention also relates to a monitoring system (40) for a hose filter installation (2), having at least one throughflow sensor (44) for determining a throughflow (Q) of a pressurized-gas flow, and a control unit (42) for controlling a pressurized gas-based cleaning process, wherein the throughflow sensor (44) is a volume flow sensor or a mass flow sensor, and the control unit (42) is set up for carrying out the method according to one of the preceding claims.

...
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Name Score Publications Conferences Grants Patents Trademarks News Webs
265.3 10 10 10 10 10 10 10
251.7 10 10 10 10 10 10 10
174.9 10 10 10 10 10 10 10
168.7 10 10 10 10 10 10 10
158.7 10 10 10 10 10 10 10
126.3 10 10 10 10 10 10 10
125.9 10 10 10 10 10 10 10
122.9 10 10 10 10 10 10 10
120.7 10 10 10 10 10 10 10
119.2 10 10 10 10 10 10 10
104.3 10 10 10 10 10 10 10
89.6 10 10 10 10 10 10 10
88.7 10 10 10 10 10 10 10
87.7 10 10 10 10 10 10 10
84.2 10 10 10 10 10 10 10
77.1 10 10 10 10 10 10 10
73.9 10 10 10 10 10 10 10
68.8 10 10 10 10 10 10 10
66.8 10 10 10 10 10 10 10
66.2 10 10 10 10 10 10 10
65.5 10 10 10 10 10 10 10
65.3 10 10 10 10 10 10 10
64.1 10 10 10 10 10 10 10
61.7 10 10 10 10 10 10 10
60.0 10 10 10 10 10 10 10
59.5 10 10 10 10 10 10 10
58.4 10 10 10 10 10 10 10
56.8 10 10 10 10 10 10 10
53.8 10 10 10 10 10 10 10
52.9 10 10 10 10 10 10 10
51.7 10 10 10 10 10 10 10
49.1 10 10 10 10 10 10 10
48.9 10 10 10 10 10 10 10
48.7 10 10 10 10 10 10 10
47.4 10 10 10 10 10 10 10
47.0 10 10 10 10 10 10 10
45.9 10 10 10 10 10 10 10
44.0 10 10 10 10 10 10 10
43.9 10 10 10 10 10 10 10
42.5 10 10 10 10 10 10 10
42.0 10 10 10 10 10 10 10
40.7 10 10 10 10 10 10 10
39.7 10 10 10 10 10 10 10
39.3 10 10 10 10 10 10 10
38.2 10 10 10 10 10 10 10
37.5 10 10 10 10 10 10 10
34.0 10 10 10 10 10 10 10
33.6 10 10 10 10 10 10 10
33.5 10 10 10 10 10 10 10
33.2 10 10 10 10 10 10 10
32.9 10 10 10 10 10 10 10
32.4 10 10 10 10 10 10 10
32.1 10 10 10 10 10 10 10
31.4 10 10 10 10 10 10 10
31.2 10 10 10 10 10 10 10
31.0 10 10 10 10 10 10 10
30.4 10 10 10 10 10 10 10
30.2 10 10 10 10 10 10 10
29.9 10 10 10 10 10 10 10
29.8 10 10 10 10 10 10 10
Taiyuan University of Technology
29.6 61 9 - 10 10 10 10
Nissan Motor Co.
29.4 4 3 - 10 10 10 10
Halliburton Co.
29.3 1 20 - 10 10 10 10
Nanjing University of Technology
29.1 52 6 - 10 10 10 10
Honda Corporation
29.1 1 5 - 10 10 10 10
Tongji University
29.0 85 18 - 10 10 10 10
Samsung
28.7 32 4 - 10 10 10 10
Pennsylvania State University
28.6 78 37 5 10 10 10 10
Wuhan University
27.3 123 21 - 10 10 10 10
Kyushu University
26.9 85 26 - 10 10 10 10
Inha University
26.8 71 5 - 10 10 10 10
Tokyo Electric Power Company
26.8 38 1 - 10 10 10 10
Hanoi University of Science and Technology
26.4 25 2 - 10 10 10 10
University of Texas at Austin
26.2 73 39 4 10 10 10 10
National University of Defense Technology
25.4 54 3 - 10 10 10 10
Yonsei University
25.3 80 12 - 10 10 10 10
University of Agriculture at Faisalabad
24.8 41 - - 10 10 10 10
Tohoku University
24.8 77 7 - 10 10 10 10
Central South University
24.5 70 17 - 10 10 10 10
University of Technology Malaysia
24.0 63 21 - 10 10 10 10
Georgia Institute of Technology
24.0 51 16 2 10 10 10 10
Texas A&M University
23.8 71 53 - 10 10 10 10
Honeywell
23.4 1 7 - 10 10 10 10
Toshiba Corporation
23.3 25 5 - 10 10 10 10
Nanjing University
22.7 51 4 - 10 10 10 10
Hunan University
22.5 47 9 - 10 10 10 10
Wuhan University of Technology
22.3 46 18 - 10 10 10 10
Northeast Petroleum University
22.2 83 38 - 10 10 10 10
Chinese Academy of Sciences
21.9 104 12 - 10 10 10 10
Tokyo Institute of Technology
21.9 55 12 - 10 10 10 10
Massachusetts Institute of Technology
21.8 60 10 2 10 10 10 10
University of Tokyo
21.7 74 18 - 10 10 10 10
Xi'an University of Science and Technology
21.6 42 23 - 10 10 10 10
Pusan National University
21.6 58 7 - 10 10 10 10
Amirkabir University of Technology
21.4 56 8 - 10 10 10 10
Beijing University of Chemical Technology
21.1 48 7 - 10 10 10 10
University of Michigan
20.4 51 15 2 10 10 10 10
Gwangju Institute of Science and Technology
20.3 24 8 - 10 10 10 10
Yangtze University
20.0 74 14 - 10 10 10 10
University of Electronic Science and Technology of China
19.9 34 17 - 10 10 10 10

An object of the invention is a contacting arrangement of solid oxide cells, each solid oxide cell comprising at least two flow field plates (121) to arrange gas flows in the cell, and an active electrode structure (130), which comprises an anode side (100), a cathode side (102), and an electrolyte element (104) between the anode side and the cathode side. The contacting arrangement comprises gasket structure (128) to perform sealing functions in the solid oxide cell and a contact structure (132) locating between the flow field plates (121) and the active electrode structure (130), said contact structure being at least partly a gas permeable structure being adapted according to structures of the flow field plates (121) and according to structure of the active electrode structure (130).

Claims which contain your search:

1. Contacting arrangement of solid oxide cells, each solid oxide cell comprising at least two flow field plates (121) to arrange gas flows in the cell, and an active electrode structure (130), which comprises an anode side (100), a cathode side (102), and an electrolyte element (104) between the anode side and the cathode side, characterized in that the contacting arrangement comprises gasket structure (128) to perform sealing functions in the solid oxide cell and a contact structure (132) locating between the flow field plates (121) and the active electrode structure (130), said contact structure being at least partly a gas permeable structure being adapted according to structures of the flow field plates (121) and according to structure of the active electrode structure (130).

2. Contacting arrangement of solid oxide cells according to claim 1, characterized in that the contact structure (132) being adaptively gas permeable by at least one of form of the holes (134), size of the holes (134), distance between the holes (134), porosity of the structure (132) and tortuosity of the structure (132).

4. Contacting arrangement of solid oxide cells according to claim 1, characterized in that thickness of the contact structure (132) is being optimized according to at least one of heat transfer characteristics, electrical characteristics of the contacting arrangement and gas distribution characteristics.

7. Contacting method of solid oxide cells, in which method is arranged gas flows in the cell, characterized in that in the method: - is performed sealing functions in the solid oxide cell, and is established a contact structure between the gas flows in the cell and an active electrode structure, - and said contact structure (132) is at least partly adapted by a gas permeable structure according to the gas flows in the cell and according to structure of the active electrode structure (130).

8. Contacting method of solid oxide cells according to claim 7, characterized in that in the method is utilized a gas permeable structure of the contact structure (132) adaptively on the basis of at least one of form of the holes (134), size of the holes (134), distance between the holes (134), porosity of the structure (132) and tortuosity of the structure (132).

10. Contacting method of solid oxide cells according to claim 7, characterized in that in the method is optimized thickness of the contact structure (132) according to at least one of heat transfer characteristics, electrical characteristics of the contacting arrangement and gas distribution characteristics.


Patent
Primetals Technologies Austria GmbH | Date: 2017-03-01

The invention relates to a method for monitoring a pressurized gas-based cleaning process in a hose filter installation (2), in which method, during a cleaning process, a throughflow (Q) of a pressurized-gas flow during a predefinable time period (T) is determined, a throughflow characteristic (V) is determined using the determined throughflow (Q) of the pressurized-gas flow, and the pressurized gas-based cleaning process is monitored using the throughflow characteristic (V), wherein the throughflow characteristic (V) is a pressurized-gas quantity that has flowed in the predefinable time period (T). The invention also relates to a monitoring system (40) for a hose filter installation (2), having at least one throughflow sensor (44) for determining a throughflow (Q) of a pressurized-gas flow, and a control unit (42) for controlling a pressurized gas-based cleaning process, wherein the throughflow sensor (44) is a volume flow sensor or a mass flow sensor, and the control unit (42) is set up for carrying out the method according to one of the preceding claims.


Patent
Cymer Inc | Date: 2017-04-24

A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.

Claims which contain your search:

1. A method of operating a gas discharge light source comprising a gas discharge system that includes one or more gas discharge chambers, each gas discharge chamber housing an energy source, the method comprising: filling each of the gas discharge chambers in the gas discharge system with a respective gas mixture; for each gas discharge chamber, supplying a pulsed energy to the respective gas mixture by activating its energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber; monitoring one or more operating characteristics of the gas discharge light source; determining whether any of the one or more monitored operating characteristics will be out of an acceptable range at a future time; and if it is determined that any of the one or more monitored operating characteristics would be out of an acceptable range at the future time, then selecting a restore gas maintenance scheme and applying the selected restore gas maintenance scheme to the gas discharge system by increasing a relative amount of a component gas in the gas mixture of at least one of the gas discharge chambers.

2. The method of claim 1, wherein the component gas includes a buffer gas.

3. The method of claim 1, wherein increasing a relative amount of the component gas in the gas mixture of at least one of the gas discharge chambers comprises applying a restore gas injection scheme to the at least one gas discharge chamber.

4. The method of claim 3, wherein applying the restore injection scheme comprises one or more of: increasing a temporal frequency at which an injection of the component gas is performed, and pumping more component gas into the gas mixture of the at least one gas discharge chamber than was pumped before it was determined that any of the one or more monitored operating characteristics will be out of an acceptable range.

5. The method of claim 1, wherein monitoring one or more operating characteristics of the gas discharge light source comprises monitoring one or more of: a pulsed energy that is supplied to the gas mixture of at least one of the gas discharge chambers; and an energy of the pulsed amplified light beam output from at least one of the gas discharge chambers.

6. The method of claim 5, wherein monitoring one or more operating characteristics comprises measuring one or more of the following characteristics of the gas discharge light source: a change in the pulsed energy supplied to the gas mixture of at least one of the gas discharge chambers over time; and a change in the energy of the pulsed amplified light beam output from at least one of the gas discharge chambers over time.

7. The method of claim 1, wherein: monitoring one or more operating characteristics of the gas discharge light source comprises calculating values of the operating characteristics, and determining whether any of the one or more monitored operating characteristics will be out of the acceptable range at a future time comprises determining whether any of the calculated values of the operating characteristics will be out of the acceptable range at a future time.

8. The method of claim 7, wherein calculating values of the operating characteristics comprises calculating average values of the operating characteristics.

9. The method of claim 1, wherein increasing a relative amount of the component gas in the gas mixture of at least one of the gas discharge chambers comprises applying a refill scheme to the at least one gas discharge chamber, the refill scheme comprising: purging the gas mixture from the at least one gas discharge chamber and filling the at least one gas discharge chamber with a fresh gas mixture that includes the component gas.

10. The method of claim 1, wherein determining whether any of the one or more monitored operating characteristics will be out of the acceptable range at a future time comprises determining whether any of the one or more monitored operating characteristics is likely to be out of the acceptable range at a future time.

11. The method of claim 1, wherein determining whether any of the one or more monitored operating characteristics will be out of the acceptable range at a future time comprises: determining a rate of change of each of the one or more monitored operating characteristics; and determining whether the rate of change for each of the one or more monitored operating characteristics indicates whether that monitored operating characteristic is likely to be out of the acceptable range at the future time.

12. The method of claim 1, further comprising determining whether any of the one or more monitored operating characteristics will be out of another acceptable range at a future time, and if it is determined that any of the one or more monitored operating characteristics will be out of the other acceptable range at a future time, then applying a refill scheme to at least one gas discharge chamber, the refill scheme comprising: purging the gas mixture from the at least one of the gas discharge chambers, and filling the purged gas discharge chamber with fresh gas mixture that includes the component gas.

13. The method of claim 1, wherein the one or more operating characteristics of the gas discharge light source are monitored while the pulsed amplified light beam is produced.

14. The method of claim 1, wherein the gas discharge system comprises a first gas discharge chamber housing a first energy source and a second gas discharge chamber housing a second energy source.

15. The method of claim 14, wherein filling each of the gas discharge chambers with a respective gas mixture comprises filling the first gas discharge chamber with a first gas mixture and filling the second gas discharge chamber with a second gas mixture.

16. The method of claim 14, wherein applying the selected restore gas maintenance scheme to the gas discharge system comprises increasing a relative amount of a component gas in a first gas mixture of the first gas discharge chamber and increasing a relative amount of a component gas in a second gas mixture of the second gas discharge chamber.

17. The method of claim 1, wherein filling a gas discharge chamber with the respective gas mixture comprises filling the gas discharge chamber with a mixture of a gain medium and a buffer gas.

18. The method of claim 17, wherein filling a gas discharge chamber with the mixture of the gain medium and the buffer gas comprises filling the gas discharge chamber with a gain medium that includes a noble gas and a halogen, and a buffer gas that includes an inert gas.

19. The method of claim 18, wherein the inert gas includes helium or neon and the component gas includes the inert gas.

20. A gas discharge light source comprising: a gas discharge system that includes one or more gas discharge chambers, each gas discharge chamber housing an energy source and containing a gas mixture that includes a gain medium; and a gas maintenance system comprising:a gas supply system;a monitoring system; anda control system coupled to the gas supply system and to the monitoring system, and configured to: wherein the restore gas maintenance scheme increases a relative amount of a component gas in the gas mixture of at least one of the gas discharge chambers.

21. The light source of claim 20, wherein the component gas includes a buffer gas and the gas mixture contained within the gas discharge chamber also includes a buffer gas.

22. The light source of claim 21, wherein: the gain medium includes a noble gas and a halogen; the buffer gas includes an inert gas; and the inert gas of the component gas includes an inert gas.

23. The light source of claim 20, wherein the gas discharge system includes a master oscillator having a master oscillator gas discharge chamber providing a seed light beam, and a power amplifier having a power amplifier gas discharge chamber that receives the seed light beam, wherein the one or more gas discharge chambers include the master oscillator gas discharge chamber and the power amplifier gas discharge chamber.

24. The light source of claim 20, wherein the gas supply system includes one or more gas sources and a valve system fluidly connected to both the one or more gas sources and the one or more gas discharge chambers.

25. The light source of claim 24, wherein the one or more gas sources include: a tri-mix gas source including three gases, wherein the three gases include one or more of: halogen fluorine, a noble gas, and a rare gas; and a bi-mix gas source including two gases, wherein the two gases include one or more of a noble gas and another gas and lack any fluorine.


The disclosure relates to methods of logging wells for gas capped oil reservoirs with a known mineral composition of constituent rocks. For determining characteristics of a gas-oil transition zone at least one sample of a reservoir fluid from a gas part and from an oil part of the reservoir are taken. Reservoir temperature and pressure are measured in places where the samples of the reservoir fluid are taken and densities and compositions of the samples are determined. The determined densities and compositions and the measured pressure and temperature are used to configure an equation of state of hydrocarbon mixtures. Porosity, water saturation and a total hydrogen content of a saturated rock are measured along the wellbore. A volume of hydrocarbon phases is computed from the measured values of porosity and water saturation of the saturated rock, and a hydrogen content of the hydrocarbon phases is determined from the measured values of the total hydrogen content of the saturated rock. Using the equation of state of hydrocarbon mixtures density and composition of the hydrocarbon phases along the wellbore are computed. A specific hydrogen content in gas and oil along the wellbore is determined from the computed values of density and composition of the hydrocarbon phases along the wellbore. Gas and oil saturation distribution along the wellbore is determined from the determined specific hydrogen content, determined hydrogen content of the hydrocarbon phases and the measured porosity.

Claims which contain your search:

1. A method for determining characteristics of a gas-oil transition zone in an uncased well drilled into a gas capped oil reservoir with a known mineralogical composition of constituent rocks, the method comprising: taking at least one sample of a reservoir fluid from a gas part of the reservoir and at least one sample of the reservoir fluid from an oil part of the reservoir; measuring reservoir temperature and pressure in places where the reservoir fluid samples are taken; determining densities and compositions of the reservoir fluid samples; using the determined densities and compositions of the reservoir fluid samples and the measured pressure and temperature to configure an equation of state of hydrocarbon mixtures; measuring porosity, water saturation, and total hydrogen content of a saturated rock along a wellbore; computing a volume of hydrocarbon phases from the measured porosity and water saturation; determining a hydrogen content of the hydrocarbon phases from the measured total hydrogen content of the saturated rock; computing density and composition of the hydrocarbon phases along the wellbore using the equation of state of hydrocarbon mixtures; determining specific hydrogen content in gas and oil along the wellbore from the computed density and composition of the hydrocarbon phases along the wellbore; and determining gas and oil saturation distribution along the wellbore based on the computed specific hydrogen content in gas and oil, the determined hydrogen content of the hydrocarbon phases, and the measured porosity of the saturated rock.

6. The method of claim 1, further comprising: computing from the equation of state of hydrocarbon mixtures a pressure distribution in gas and oil along the wellbore; and building a capillary pressure curve on the basis of the computed pressure distribution and the determined gas and oil saturation along the wellbore.


Patent
Beaconmedaes LLC | Date: 2017-03-01

A medical gas alarm systems and associated methods are disclosed. A method of monitoring the medical gas system includes the steps of monitoring a characteristic of a medical gas system using at least one monitoring instrument positioned in a medical gas supply network; generating and sending a particular signal from the monitoring instrument to a CPU when the characteristic measured by the monitoring instrument passes a predetermined threshold; generating a fault signal from the CPU when the CPU determines that a fault condition has occurred; retrieving a stored message from the CPU in response to the fault signal, and in which the stored message other than the fault or threshold condition monitored by the instrument; and sending the stored message from the CPU to an output at a medical gas alarm module.

Claims which contain your search:

1. A method of monitoring a medical gas system comprising: monitoring a characteristic of a medical gas system using at least one monitoring instrument positioned in a medical gas supply network; generating and sending a particular signal from the monitoring instrument to a CPU when the characteristic measured by the monitoring instrument passes a predetermined threshold; generating a fault signal from the CPU when the CPU evaluates the particular signal against at least one preset threshold; retrieving a stored message from the CPU in response to the fault signal and the preset threshold, and in which the stored message is other than the fault or threshold condition monitored by the instrument; and sending the stored message from the CPU to an output at a medical gas alarm module.

2. A method according to Claim 1 comprising monitoring a characteristic selected from the group consisting of characteristics of a medical gas, characteristics of the medical gas system, and combinations thereof.

3. A method according to Claim 1 comprising sending stored messages from the CPU to a visible display at a medical gas alarm screen wherein the sending step is selected from the group consisting of retrieving a stored message, retrieving a stored graphic, sending a stored message, and retrieving a stored message.

4. A method according to Claim 1 comprising monitoring the identity of the gas in the network, monitoring the gas pressure in the medical gas supply network, retrieving a designated stored message when the gas pressure crosses a predetermined threshold pressure, and generating the particular signal when the identity of the gas in the network changes.

6. In a medical gas alarm system, the improvement comprising: a gas sensor arranged to measure a characteristic of a medical gas in a medical gas supply network; a programmable monitor for displaying the gas characteristic from said gas sensor; and a current loop between said gas sensor and said monitor for calibrating the desired output on said monitor using the current range of said loop.

7. A medical gas alarm system according to Claim 6 wherein: said programmable monitor displays the gas characteristic from the sensor within a programmed range defined by the current boundaries of said loop.

8. A medical gas alarm system according to Claim 6 comprising a 4 mA-20 mA current loop.

9. A medical gas alarm system according to Claim 6 wherein a loop element selected from the group consisting of the transmitter and the monitor is programmable.

10. A medical gas alarm system according to Claim 6 wherein: said gas sensor is selected from the group consisting of a flow meter, a pressure sensor, a temperature sensor, and combinations thereof; and said loop is calibrated between two gas flow rates.

11. A medical gas alarm system according to Claim 6 further comprising an alarm in said loop and with said loop programmed to signal said alarm at respective high and low setpoints.

12. A medical gas alarm system comprising: at least first and second alarm stations; an Ethernet interface for each station; said first alarm station being connected to a gas monitoring instrument in a medical gas network; wherein said first alarm station transmits information generated at or originally received at said first alarm station using Ethernet protocol over an available Ethernet network to said second alarm system; and wherein said second alarm station is connected to said first alarm station over the Ethernet network and said second alarm station displays the information from said first alarm station.

13. A medical gas alarm system according to Claim 12 wherein said gas monitoring instrument is selected from the group consisting of pressure gauges, flow meters, scales, and thermometers; and wherein said medical gas network includes: a bank gas supply; a plurality of gas lines fed by said bank gas supply; and a plurality of delivery locations fed by different portions of said gas lines.

14. A medical gas alarm system according to claim 12 wherein each said alarm includes an indicator system selected from the group consisting of sound, lighting, and graphical user interfaces.

15. A medical gas alarm system according to Claim 14 wherein each said alarm includes a human machine interface with input and output capabilities.

16. A medical gas alarm system according to Claim 15 comprising at least 30 permutations of text, color, lines, and designs that can be applied to the human machine interface.

17. A medical gas alarm system according to Claim 16 wherein said human machine interface is a touch screen.

18. In a medical gas alarm system, the improvement comprising: memory; graphic images stored in the memory; an alarm display in communication with the memory; and an alarm processor in communication with both the memory and the alarm display.

19. A medical gas alarm system according to Claim 18 further comprising a gas monitor selected from the group consisting of a pressure sensor, flow meter and temperature sensor and in communication with said processor; and wherein said alarm processor selects an image from said memory based upon a signal from said monitor; and said processor provides said image to said display.

20. A medical gas alarm system according to Claim 18 wherein said graphic images are other than modern English characters.

21. A medical gas alarm system according to Claim 18 wherein said graphic images are HTML5 Canvas objects.

22. A medical gas alarm system according to Claim 18 further comprising a network connected independent processor in communication with said alarm processor for generating the graphic images on the display using commands entered into said network connected independent processor.

23. In a medical gas alarm system, the improvement comprising: a Web Server in the medical gas alarm; and a WiFi circuit in said medical gas alarm and in communication with said Web Server.

24. A medical gas alarm system according to Claim 23 wherein said medical gas alarm is selected from the group consisting of a pressure sensor, flowmeter and temperature sensors and is connected to a gas sensor in a medical gas network.

25. A method of monitoring the status of a medical gas system, the method comprising: repeatedly measuring a characteristic of a medical gas distribution network using a sensor positioned as part of the distribution network for a defined time interval; sending the characteristics measured by the sensor from the sensor to memory in which the measurements can be stored and from which the indexed measurements can be retrieved; periodically retrieving groups of the stored and indexed measurements based upon a designated time interval and sending the groups to a CPU; and generating a report from the CPU based on the retrieved groups in a form substantially compliant with a licensing or accreditation protocol.

26. A method of monitoring according to Claim 25 comprising measuring a characteristic selected from the group consisting of a single characteristic of a single medical gas, a single characteristic of a plurality of medical g plurality of characteristics of a single medical gas, and a plurality of characteristics of a plurality of medical gases in the distribution network.

27. A method of monitoring according to Claim 25 comprising continuously monitoring a characteristic of a medical gas in a medical gas distribution network and recording a fault in said characteristic in memory as a time- date stamped event.

28. A medical gas alarm comprising: respective first and second communication interfaces from which a medical gas alarm can both receive and transmit; said first communication interface using a different signal voltage and a different data rate than said second communication interface.

29. A medical gas alarm according to Claim 28 further comprising: an Ethernet protocol interface so that said alarm can send information from either of said first or second communication interface to a network external to said medical gas alarm.

30. A medical gas alarm according to claim 29 connected through said Ethernet protocol interface to a hospital network external to said medical gas alarm.

31. A medical gas alarm according to Claim 30 wherein said hospital network includes items selected from the group consisting of a building automation systems and remote alarm panels.

32. In a medical gas alarm system, the improvement comprising: a single input signal circuit in communication with source equipment; a processor in communication with said single input signal circuit; and at least two output relay circuits in communication with said processor.

33. A medical gas alarm system according to Claim 32 wherein said source equipment includes a gas monitor selected from the group consisting of pressure sensors, flow meters, and temperature sensors.

34. A medical gas alarm system according to Claim 32 wherein said gas monitor produces a standard output.

35. A medical gas alarm system according to claim 32 wherein said output relay circuits are in communication with respective medical gas alarm panels.

36. A medical gas alarm system according to claim 32 wherein said output relay circuits are in communication with a building management system.

37. In a medical gas alarm system the improvement comprising: a plurality of input signal circuits in communication with a respective plurality of source equipment; a processor in communication with said input signal circuits; and a single output relay circuit in communication with the processor.

38. A medical gas alarm system according to claim 37 wherein said source equipment is selected from the group consisting of compressors vacuum systems, manifolds, and combinations thereof.

39. A medical gas alarm system according to claim 37 wherein said single output relay circuit is in communication with a medical gas alarm panel.

40. A medical gas alarm system according to claim 37 wherein said single output relay circuit is in communication with a building management system. AMENDED CLAIMS received by the International Bureau on 15 October 2015 (15.10.2015)

1. A method of monitoring a medical gas system comprising: monitoring a characteristic of a medical gas system using at least one monitoring instrument positioned in a medical gas supply network; generating and sending a particular signal from the monitoring instrument to a CPU when the characteristic measured by the monitoring instrument passes a predetermined threshold; generating a fault signal from the CPU when the CPU evaluates the particular signal against at least one preset threshold; retrieving a stored message from the CPU in response to the fault signal and the preset threshold, and in which the stored message is other than the fault or threshold condition monitored by the instrument; and sending the stored message from the CPU to an output at a medical gas alarm module.

2. A method according to Claim 1 comprising: monitoring a characteristic selected from the group consisting of characteristics of a medical gas, characteristics of the medical gas system, and combinations thereof; and sending stored messages from the CPU to a visible display at a medical gas alarm screen wherein the sending step is selected from the group consisting of retrieving a stored message, retrieving a stored graphic, sending a stored message, and retrieving a stored message; and wherein the step of sending the stored message to the output comprises sending the store message to a destination selected from the group consisting of an Ethernet protocol network, a Wi-Fi transmitter, an email server, an address on the Internet from which the message can be accessed on demand, and combinations of these outputs.

3. A method according to Claim 1 comprising monitoring the identity of the gas in the network, monitoring the gas pressure in the medical gas supply network, retrieving a designated stored message when the gas pressure crosses a predetermined threshold pressure, and generating the particular signal when the identity of the gas in the network changes.

4. In a medical gas alarm system, the improvement comprising: a gas sensor arranged to measure a characteristic of a medical gas in a medical gas supply network; a programmable monitor for displaying the gas characteristic from said gas sensor; a current loop between said gas sensor and said monitor for calibrating the desired output on said monitor using the current range of said loop; wherein said programmable monitor displays the gas characteristic from the sensor within a programmed range defined by the current boundaries of said loop.

5. A medical gas alarm system according to Claim 4 comprising: a 4 mA-20 mA current loop; and wherein a loop element selected from the group consisting of the transmitter and the monitor is programmable..

6. A medical gas alarm system according to Claim 4 wherein: said gas sensor is selected from the group consisting of a flow meter, a pressure sensor, a temperature sensor, and combinations thereof; and said loop is calibrated between two gas flow rates.

7. A medical gas alarm system according to Claim 4 further comprising an alarm in said loop and with said loop programmed to signal said alarm at respective high and low setpoints.

8. A medical gas alarm system comprising: at least first and second alarm stations; an Ethernet interface for each station; said first alarm station being connected to a gas monitoring instrument in a medical gas network; wherein said first alarm station transmits information generated at or originally received at said first alarm station using Ethernet protocol over an available Ethernet network to said second alarm system; wherein said second alarm station is connected to said first alarm station over the Ethernet network and said second alarm station displays the information from said first alarm station; wherein each said alarm includes a human machine interface with input and output capabilities; and at least 30 permutations of text, color, lines, and designs that can be applied to the human machine interface.

9. A medical gas alarm system according to Claim 8 wherein said gas monitoring instrument is selected from the group consisting of pressure gauges, flow meters, scales, and thermometers; and wherein said medical gas network includes : a bank gas supply; a plurality of gas lines fed by said bank gas supply; and a plurality of delivery locations fed by different portions of said gas lines.

10. A medical gas alarm system according to Claim 8 wherein each said alarm includes an indicator system selected from the group consisting of sound, lighting, and graphical user interfaces.

11. A medical gas alarm system according to Claim 8 wherein said human machine interface is a touch screen.

12. In a medical gas alarm system, the improvement comprising: memory; graphic images stored in the memory; an alarm display in communication with the memory; and an alarm processor in communication with both the memory and the alarm display.

13. A medical gas alarm system according to Claim 12 further comprising a gas monitor selected from the group consisting of a pressure sensor, flow meter and temperature sensor and in communication with said processor; and wherein said alarm processor selects an image from said memory based upon a signal from said monitor; and said processor provides said image to said display.

14. A medical gas alarm system according to Claim 12 wherein said graphic images are other than modern English characters.

15. A medical gas alarm system according to Claim 12 wherein said graphic images are HTML5 Canvas objects.

16. A medical gas alarm system according to Claim 12 further comprising a network connected independent processor in communication with said alarm processor for generating the graphic images on the display using commands entered into said network connected independent processor.

17. In a medical gas alarm system, the improvement comprising: a medical gas alarm selected from the group consisting of a pressure sensor, flowmeter and temperature sensors and connected to a gas sensor in a medical gas network; a Web Server in the medical gas alarm; and a WiFi circuit in said medical gas alarm and in communication with said Web Server.

18. A method of monitoring the status of a medical gas system, the method comprising: repeatedly measuring a characteristic of a medical gas distribution network using a sensor positioned as part of the distribution network for a defined time interval; sending the characteristics measured by the sensor from the sensor to memory in which the measurements can be stored and from which the indexed measurements can be retrieved; periodically retrieving groups of the stored and indexed measurements based upon a designated time interval and sending the groups to a CPU; and generating a report from the CPU based on the retrieved groups in a form substantially compliant with a licensing or accreditation protocol.

19. A method of monitoring according to Claim 18 comprising measuring a characteristic selected from the group consisting of a single characteristic of a single medical gas, a single characteristic of a plurality of medical gases, a plurality of characteristics of a single medical gas, and a plurality of characteristics of a plurality of medical gases in the distribution network.

20. A method of monitoring according to Claim 18 comprising continuously monitoring a characteristic of a medical gas in a medical gas distribution network and recording a fault in said characteristic in memory as a time-date stamped event.

21. A medical gas alarm comprising: respective first and second communication interfaces from which a medical gas alarm can both receive and transmit; said first communication interface using a different signal voltage and a different data rate than said second communication interface.

22. A medical gas alarm according to Claim 21 further comprising: an Ethernet protocol interface so that said alarm can send information from either of said first or second communication interface to a network external to said medical gas alarm; a connection through said Ethernet protocol interface to a hospital network external to said medical gas alarm; and wherein said hospital network includes items selected from the group consisting of a building automation systems and remote alarm panels.

23. In a medical gas alarm system, the improvement comprising: a single input signal circuit in communication with source equipment; a processor in communication with said single input signal circuit; and at least two output relay circuits in communication with said processor; and in communication with respective medical gas alarm panels or with a building management system, or both.

24. A medical gas alarm system according to Claim 23 wherein said source equipment includes a gas monitor selected from the group consisting of pressure sensors, flow meters, and temperature sensors.

25. A medical gas alarm system according to Claim 23 wherein said gas monitor produces a standard output.

26. In a medical gas alarm system the improvement comprising: a plurality of input signal circuits in communication with a respective plurality of source equipment selected from the group consisting of compressors vacuum systems, manifolds, and combinations thereof; a processor in communication with said input signal circuits; and a single output relay circuit in communication with the processor; and in communication with a medical gas alarm panel or in communication with a building management system, or both.


Patent
Fisher & Paykel Healthcare Ltd | Date: 2015-05-01

A humidification arrangement can be configured to have multiple compartments with each compartment having at least one moisture source and at least one heater. The compartments can be thermally isolated and can be controlled such that the moisture output of both the first and second compartments is set to a function of the same set of input signals.

Claims which contain your search:

32. A multiple stage respiratory gases conditioning system comprising the arrangement of claim 1, wherein the controller is adapted to: receive data from the sensor; determine a control strategy as a function of the data received from the sensor and a target gas characteristic or substance being delivered by the system; and control a level of the gas characteristic or substance generated by each of the multiple stages based upon the determined control strategy.

1. A humidification arrangement comprising: a gas passageway extending between a first location and a second location, the gas passageway comprising a first compartment and a second compartment, each compartment comprising a moisture source configured to add moisture to gases in the gas passageway, each moisture source having an adjustable moisture output; a sensor adapted to sense one or more characteristic or substance of a gases flow; and a controller adapted to use data from the sensor to control the adjustable moisture output of at least one of the first compartment and the second compartment to deliver a target gas characteristic or substance, wherein the controller is adapted to control an actuator that varies an exposed surface area of a reservoir.

39. The multiple stage respiratory gases conditioning system of claim 32, wherein the controller is further adapted to determine a control strategy based upon a target gas characteristic or substance specific to a stage of the multiple stages.

40. The multiple stage respiratory gases conditioning system of claim 32, wherein the controller is further adapted to use a stage target that represents a desired amount to increase the gas characteristic or substance for the gases flowing through that stage.

41. The multiple stage respiratory gases conditioning system of claim 32, wherein the controller is further adapted to use a target gas characteristic or substance that is a target temperature level or a target humidity level.

11. The humidification arrangement of claim 1, wherein the first compartment and the second compartment are arranged in series along the gas passageway.

12. The humidification arrangement of claim 1, wherein the gas passageway comprises a tube that connects the first compartment to the second compartment and wherein the tube connects an outlet of the first compartment to an inlet of the second compartment.

15. The humidification arrangement of claim 1, wherein the gas passageway comprises one or more valves that direct flow through the humidification arrangement.

24. The humidification arrangement of claim 1, wherein the target gas characteristic or substance is a temperature level or a humidity level.


Patent
Toshiba Corporation | Date: 2016-02-05

In one embodiment, a semiconductor manufacturing system includes a processing apparatus configured to process a wafer, an exhaust pump configured to discharge an exhaust gas from the processing apparatus, and a measurement module configured to measure a value that indicates operation of the exhaust pump. The system further includes a controller configured to feed a first gas for pushing out a fragment of a product that is generated by the exhaust gas and is attached to or flows into the exhaust pump, a second gas for cooling the exhaust pump, a third gas for changing characteristics of the product attached to the exhaust pump, or a fourth gas to react with the product attached to the exhaust pump, into the exhaust pump based on the value measured by the measurement module.

Claims which contain your search:

1. A semiconductor manufacturing system comprising: a processing apparatus configured to process a wafer; an exhaust pump configured to discharge an exhaust gas from the processing apparatus; a measurement module configured to measure a value that indicates operation of the exhaust pump; and a controller configured to feed a first gas for pushing out a fragment of a product that is generated by the exhaust gas and is attached to or flows into the exhaust pump, a second gas for cooling the exhaust pump, a third gas for changing characteristics of the product attached to the exhaust pump, or a fourth gas to react with the product attached to the exhaust pump, into the exhaust pump based on the value measured by the measurement module.

3. The system of claim 2, wherein the first gas causes the fragment to scrape off the product attached to the inner face of the first portion or the outer face of the second portion.

4. The system of claim 2, wherein the second gas cools the exhaust pump to bring the product attached to the inner face of the first portion and the product attached to the outer face of the second portion into contact with each other.

5. The system of claim 2, wherein the third gas changes the characteristics of the product attached to the inner face of the first portion or the outer face of the second portion.

6. The system of claim 2, wherein the fourth gas reacts with the product attached to the inner face of the first portion or the outer face of the second portion.

7. The system of claim 1, wherein the first gas is a nitrogen gas.

8. The system of claim 1, wherein the second gas is an argon gas.

9. The system of claim 1, wherein the third gas is a gas including moisture.

10. The system of claim 1, wherein the fourth gas is a hydrofluoric acid gas.

12. The system of claim 1, wherein the controller feeds the first, second, third or fourth gas into the exhaust pump during the operation of the exhaust pump.

14. The system of claim 1, wherein the first, second, third or fourth gas is fed to a feeding port provided on a flow path between the processing apparatus and the exhaust pump, or to a feeding port provided between an inlet and an outlet of the exhaust pump.

15. The system of claim 1, further comprising: one or more gas feeders configured to feed the first, second, third or fourth gas; and one or more flow rate adjustment modules configured to adjust a flow rate of the first, second, third or fourth gas.

16. A method of operating a semiconductor manufacturing system, comprising: processing a wafer by a processing apparatus; discharging an exhaust gas from the processing apparatus by an exhaust pump; measuring, by a measurement module, a value that indicates operation of the exhaust pump; and feeding a first gas for pushing out a fragment of a product that is generated by the exhaust gas and is attached to or flows into the exhaust pump, a second gas for cooling the exhaust pump, a third gas for changing characteristics of the product attached to the exhaust pump, or a fourth gas to react with the product attached to the exhaust pump, into the exhaust pump based on the value measured by the measurement module.

18. The method of claim 16, wherein the first, second, third or fourth gas is fed into the exhaust pump during the operation of the exhaust pump.


A contacting arrangement of solid oxide cells is disclosed, each solid oxide cell having at least two flow field plates to arrange gas flows in the cell, and an active electrode structure, which has an anode side, a cathode side, and an electrolyte element between the anode side and the cathode side. The contacting arrangement includes a gasket structure to perform sealing functions in the solid oxide cell and a contact structure located between the flow field plates and the active electrode structure, the contact structure being at least partly a gas permeable structure configured and adapted according to structures of the flow field plates and according to the active electrode structure.

Claims which contain your search:

1. A contacting arrangement of solid oxide cells, each solid oxide cell having at least two flow field plates to arrange gas flows in the cell, and an active electrode structure, which includes a fuel side, an oxygen side, and an electrolyte element between the fuel side and the oxygen side, wherein the contacting arrangement comprises: a gasket structure to perform sealing functions in a solid oxide cell; a contact structure configured for placement between flow field plates and an oxygen side of an active electrode structure, the contact structure being made of perforated metal which is protectively coated with oxide structures, said contact structure being at least partly a gas permeable structure having perforated holes, the contact structure being configured and adapted according to structures of the flow field plates and according to structures of the oxygen side, and a thickness of the gasket structure configured and adapted according to a thickness of the contact structure allowing tolerance variations to a thickness of solid oxide cells; and means for enhancing at least one of electric conductivity, heat transfer characteristics and mechanical support of the contact structure by selection of a distance between two adjacent holes and by minimizing a size of the holes in perforation of the contact structure.

2. The contacting arrangement of solid oxide cells according to claim 1, wherein the contact structure is adaptively gas permeable by at least one of: form of the holes, size of the holes, distance between the holes, porosity of the contact structure and tortuosity of the contact structure.

3. The contacting arrangement of solid oxide cells according to claim 1, wherein the thickness of the contact structure is optimized according to at least one of: heat transfer characteristics, electrical characteristics of the contacting arrangement and gas distribution characteristics.

4. A contacting method for solid oxide cells in which gas flows, the method comprising: sealing a solid oxide cell by a gasket structure, and locating a contact structure between flow field plates and an oxygen side of an active electrode structure, the contact structure being made of perforated metal, which is protectively coated with oxide structures; configuring and adapting said contact structure at least partly by a gas permeable structure having perforated holes according to the gas flows in the cell and according to structures of the oxygen side; configuring and adapting a thickness of the gasket structure according to a thickness of the contact structure allowing tolerance variations to thickness of solid oxide cells; and enhancing at least one of electric conductivity, heat transfer characteristics and mechanical support of the contact structure by selecting a distance between two adjacent holes and by minimizing size of the holes during a perforation of the contact structure.

5. The contacting method for solid oxide cells according to claim 7, comprising: using a gas permeable structure of the contact structure adaptively based on the at least one of form of the holes, size of the holes, distance between the holes, porosity of the structure and tortuosity of the structure.

6. The contacting method for solid oxide cells according to claim 7, comprising: optimizing the thickness of the contact structure according to at least one of heat transfer characteristics, electrical characteristics of the contacting arrangement and gas distribution characteristics.

7. The contacting arrangement according to claim 1, in combination with at least two solid oxide cells, each solid oxide cell comprising: at least two flow field plates to arrange gas flows in the cell, and an active electrode structure, which includes a fuel side, an oxygen side, and an electrolyte element between the fuel side and the oxygen side.


A system for metering gas includes a housing configured to allow a flow of the gas between an input port and an output port. Further, the system includes a flow manager disposed in the housing and configured to modify at least one physical characteristic of the flow of the gas in the housing. Furthermore, the system includes a flow sensor disposed in the housing and configured to generate an electrical signal in response to flow characteristics of the gas in the housing. Moreover, the system also includes a processor configured to determine at least one flow parameter of the gas based on an amplitude characteristic of the electrical signal, a temporal characteristic of the electrical signal, or both the amplitude characteristic and the temporal characteristic of the electrical signal. A method for metering the gas is also presented.

Claims which contain your search:

1. A system for metering gas, comprising: a housing comprising an input port and an output port, wherein the housing is configured to allow a flow of the gas between the input port and the output port; a flow manager disposed in the housing and configured to modify at least one physical characteristic of the flow of the gas in the housing; a flow sensor disposed in the housing and configured to generate an electrical signal in response to a flow characteristic of the gas in the housing; and a processor operatively coupled to the flow manager and the flow sensor and configured to determine at least one flow parameter of the gas based on an amplitude characteristic of the electrical signal, a temporal characteristic of the electrical signal, or both the amplitude characteristic and the temporal characteristic of the electrical signal.

8. The system of claim 1, wherein the at least one flow parameter comprises a mass flow rate of the gas, an accumulated volume of the gas, a volumetric flow rate of the gas, a cumulative gas volume per a determined time unit, or combinations thereof.

9. The system of claim 1, wherein in a first flow regime, the processor is configured to determine the at least one flow parameter based on the amplitude characteristic of the electrical signal, and in a second flow regime, the processor is configured to determine the at least one flow parameter based on the temporal characteristic of the electrical signal.

10. The system of claim 9, wherein the first flow regime comprises a range of flow rates of the gas in the housing that impedes application of disturbances to the flow of the gas.

11. The system of claim 9, wherein the second flow regime comprises a range of flow rates of the gas in the housing that allows disturbances to be imparted to the flow of the gas.

12. The system of claim 9, wherein the processor is further configured to determine a calibration function based on a third flow regime, wherein the third flow regime comprises an overlap region of the first flow regime and the second flow regime, and wherein, in the first flow regime, the calibration function is indicative of a relationship at least between a volumetric flow rate of the gas and a mass flow rate of the gas.

13. The system of claim 1, further comprising a third flow disrupter disposed in the housing and configured to impart disturbances to the flow of the gas in the housing.

14. The system of claim 1, further comprising a gas analyzer disposed in the housing and configured to determine one or more non-flow rate characteristics of the gas, wherein the one or more non-flow rate characteristics of the gas comprise a gas density, a gas temperature, a gas pressure, a gas mixture, an energy content of the gas, or combinations thereof.

15. The system of claim 14, wherein the gas analyzer comprises a fourth flow disrupter configured to aid in the determination of the one or more non-flow rate characteristics of the gas.

19. A method for metering gas, comprising: modifying at least one physical characteristic of a flow of the gas in a housing; generating an electrical signal in response to a flow characteristic of the gas in the housing; and determining at least one flow parameter of the gas based on an amplitude characteristic of the electrical signal, a temporal characteristic of the electrical signal, or both the amplitude characteristic and the temporal characteristic of the electrical signal.

20. The method of claim 19, further comprising determining non-flow rate characteristics of the gas, a tampering of a system, a gas leakage from the system, and one or more environmental conditions.

22. The method of claim 19, further comprising: determining, in a first flow regime, the at least one flow parameter based on the amplitude characteristic of the electrical signal; and determining, in a second flow regime, the at least one flow parameter based on the temporal characteristic of the electrical signal.

23. The method of claim 22, further comprising determining a calibration function based on a third flow regime, wherein the third flow regime comprises an overlap region of the first flow regime and the second flow regime, and wherein the calibration function is indicative of a relationship at least between a volumetric flow rate of the gas and a mass flow rate of the gas in the first flow regime.


Patent
Electro Scientific Industries Inc. | Date: 2016-08-10

Employing laser scanning directions (20) that are oblique to and against a predominant gas flow direction (25) equalize the quality and waviness characteristics of orthogonal scribe lines (26) made by the laser scans. Positioning and sequence of multiple scan passes to form a feature wider than the width of a scribe line (26) can be controlled to enhance quality and waviness characteristics of the edges of the feature.

Claims which contain your search:

1. A method for enhancing an edge characteristic of a laser-induced material effect resulting from transverse laser scans across a workpiece, comprising: relatively orienting a laser processing field and the workpiece at a processing station of a laser processing system; establishing, from a gas supply, a gas input flow in a gas input direction across at least a portion of a major surface of the workpiece, wherein gas in the gas input flow has a positive gas input velocity in the gas input direction; establishing, from a vacuum source, a gas outtake flow in a gas outtake direction across at least the portion of the major surface of the workpiece, wherein the gas input flow and the gas outtake flow establish a predominant gas flow direction across at least the portion of the major surface of the workpiece, and wherein the gas input flow and the gas outtake flow cooperate to provide cumulative gas flow characteristics across at least the portion of the major surface of the workpiece; while maintaining the gas input flow and the gas outtake flow, scanning a laser beam in a first laser scan direction of relative movement of a laser beam processing axis of the laser beam with respect to the workpiece, wherein the laser beam impinges the workpiece along the first laser scan direction affecting the material along the first laser scan direction that is obliquely oriented opposite to the predominant gas flow direction; and while maintaining the gas input flow and the gas outtake flow, scanning the same laser beam or a different laser beam in a second laser scan direction of relative movement of a respective laser beam processing axis with respect to the workpiece, wherein the laser beam impinges the workpiece along the second laser scan direction affecting the material along the second laser scan direction that is obliquely oriented opposite to the predominant gas flow direction, wherein the second laser scan direction is transverse to the first laser scan direction.

3. The method of claim 1, wherein the first scan direction is at a 1355.125 angle with respect to the predominant gas flow direction.

4. The method of claim 3, wherein the second scan direction is at a 2255.125 angle with respect to the predominant gas flow direction.

5. The method of claim 1, wherein the predominant gas flow direction remains generally the same during scans along the first laser scan direction and the second laser scan direction.

9. The method of claim 1, wherein the cumulative gas flow along the predominant gas flow direction is continuous during and between the step of scanning a laser beam in a first laser scan direction of relative movement and the step of scanning the same laser beam or a different laser beam in a second laser scan direction.

10. The method of claim 1, wherein the laser beam processing axis moves within a scan field, wherein the scan field includes a laser processing field that is smaller than or equal in area to the scan field, wherein the cumulative gas flow along the predominant gas flow direction is maximized with respect to flow dynamics encompassing the processing field, and wherein a velocity of scanning the laser beam in the first scan direction is maximized with respect to a parameter recipe that achieves desirable quality of the laser induced effect.

13. The method of claim 1, wherein the laser beam processing axis moves within a scan field, wherein the scan field includes a laser processing field that is smaller than or equal in area to the scan field, wherein the processing field has a major axis dimension of a major axis that bisects the processing field, wherein the gas input direction is generally perpendicular to the major axis of the processing field, wherein a gas flow volume traveling along the gas input direction has a flow width dimension that is perpendicular to the gas input direction, and wherein the flow width dimension is greater than the major axis dimension.

15. The method of claim 1, wherein the laser beam processing axis moves within a scan field, wherein the step of scanning a laser beam in a first laser scan direction of relative movement and the step of scanning the same laser beam or a different laser beam in a second laser scan direction are each performed over multiple neighboring scan fields over the workpiece while maintaining the predominant gas flow direction of the gas input flow and the gas outtake flow.

16. The method of claim 1, wherein laser beam impingement of the workpiece creates one or more localized adverse gas characteristics that could interfere with the capability of the laser beam to impinge the workpiece accurately with respect to a directed position of the laser beam processing axis along the first laser scan direction and could cause fluctuation of the edge characteristic of the laser-induced material effect, and wherein the first ands second laser scan directions with respect to the predominant gas flow direction inhibit the one or more localized adverse gas characteristics.

18. The method of claim 1, wherein the workpiece includes one or more features having a feature orientation, wherein the processing station has a first processing station orientation with a first processing station axis and a second processing station axis that is orthogonal to the first processing station axis, wherein the laser beam processing axis moves within a scan field having a scan field orientation with a first scan field axis and a second scan field axis that is orthogonal to the first scan field axis, and wherein the feature orientation is oriented with respect to the processing station orientation or the scan field orientation, wherein the second scan direction is orthogonal to the first scan direction, wherein the first scan direction is at a 13511.25 angle with respect to the predominant gas flow direction, wherein the second scan direction is at a 22511.25 angle with respect to the predominant gas flow direction, wherein the predominant gas flow direction remains generally the same during scans along the first laser scan direction and the second laser scan direction, wherein the step of scanning the laser beam in the first laser scan direction of relative movement comprises scanning the laser beam along multiple parallel scan paths in the first laser scan direction before the step of scanning the same laser beam or a different laser beam in a second laser scan direction of relative movement, wherein the laser beam processing axis is provided with continuous motion during and between the steps of scanning a laser beam in a first laser scan direction of relative movement and scanning the same laser beam or a different laser beam in a second laser scan direction, wherein the laser-induced material effect forms a first scan feature along the first laser scan direction, wherein the first scan feature has opposing first primary and first secondary edges, wherein the laser-induced material effect forms a second scan feature along the second laser scan direction, wherein the second scan feature has opposing second primary and second secondary edges, wherein each of the edges can be expressed as a respective average straight fit line, wherein horizontal peaks and valleys of each edge can be expressed as absolute values with respect to the respective average straight fit line, and wherein a standard deviation of the absolute values of each edge to its respective average straight fit line is less than 0.3 microns.

19. A laser processing system for processing a workpiece having a major surface and one or more features formed on the major surface, wherein the major surface has a surface area, and wherein the laser processing system provides a processing field having a processing field orientation with a first processing field axis and a second processing field axis that is orthogonal to the first processing field axis, comprising: a processing station having a processing station orientation with a first processing station axis and a second processing station axis that is orthogonal to the first processing station axis; a chuck adapted for placing the workpiece in the processing station at which the workpiece is positionable so that at least one of the features is oriented with respect to the processing station orientation or the processing field orientation; a laser adapted for generating a laser beam; a beam positioning system including one or more stages for supporting the chuck or the workpiece, the beam positioning system also including a fast-positioner having a scan field that is smaller than the workpiece, wherein the laser processing field is within the scan field such that the laser processing field is smaller than or equal in area to the scan field, wherein the beam positioning system is adapted for positioning the processing field in multiple neighboring locations over the workpiece, and wherein the beam positioning system is adapted for scanning the laser beam along a laser beam processing axis to impinge the workpiece; a gas flow assembly that includes a gas input flow device adapted for establishing a gas input flow having a positive gas input velocity in a gas input direction across at least the processing field located over a portion of the major surface of the workpiece, wherein the gas flow assembly also includes a gas outtake port adapted for establishing a gas outtake flow in a gas outtake direction across at least the processing field located over the portion of the major surface of the workpiece, wherein the gas input flow and the gas outtake flow are adapted to establish a predominant gas flow direction across at least the processing field located over the portion of the major surface of the workpiece, and wherein the gas input flow and the gas outtake flow are adapted to cooperate to provide cumulative gas flow characteristics across at least the processing field located over the portion of the major surface of the workpiece; and a controller adapted to control, within the processing field and while maintaining the gas input flow and the gas outtake flow, scanning the laser beam in a first laser scan direction of relative movement of a laser beam processing axis of the laser beam with respect to the workpiece, such that the first laser scan direction is obliquely oriented opposite to the predominant gas flow direction and such that the laser beam impinges the workpiece along the first laser scan direction affecting the material along the first laser scan direction, wherein the controller is also adapted to control, within the processing field and while maintaining the gas input flow and the gas outtake flow, scanning the same laser beam or a different laser beam in a second laser scan direction of relative movement of a respective laser beam processing axis with respect to the workpiece, such that the second laser scan direction is obliquely oriented opposite to the predominant gas flow direction and such that the laser beam impinges the workpiece along the second laser scan direction affecting the material along the second laser scan direction, and wherein the second laser scan direction is transverse to the first laser scan direction.

20. A method for enhancing an edge characteristic of a laser-induced material effect resulting from transverse laser scans across a workpiece, comprising: relatively orienting a laser processing field and the workpiece at a processing station of a laser processing system; establishing, from a gas supply, a gas input flow in a gas input direction across at least a portion of a major surface of the workpiece, wherein gas in the gas input flow has a positive gas input velocity in the gas input direction; establishing, from a vacuum source, a gas outtake flow in a gas outtake direction across at least the portion of the major surface of the workpiece, wherein the gas input flow and the gas outtake flow establish a predominant gas flow direction across at least the portion of the major surface of the workpiece, and wherein the gas input flow and the gas outtake flow cooperate to provide a cumulative gas flow having a gas flow velocity across at least the portion of the workpiece; while maintaining the gas input flow and the gas outtake flow, scanning a laser beam in a first laser scan direction of relative movement of a laser beam processing axis of the laser beam with respect to the workpiece, wherein the laser beam impinges the workpiece along the first laser scan direction affecting the material along the first laser scan direction and creating one or more localized adverse gas characteristics that could interfere with the capability of the laser beam to impinge the workpiece accurately with respect to a directed position of the laser beam processing axis along the first laser scan direction and could cause fluctuation of the edge characteristic of the laser-induced material effect, wherein the first laser scan direction is transverse to the predominant gas flow direction, wherein the first laser scan direction includes a first laser scan direction component that is parallel with and opposite to the predominant gas flow direction, and wherein the first laser scan direction with respect to the predominant gas flow direction inhibits the one or more localized adverse gas characteristics; and while maintaining the gas input flow and the gas outtake flow, scanning the same laser beam or a different laser beam in a second laser scan direction of relative movement of a respective laser beam processing axis with respect to the workpiece, wherein the laser beam impinges the workpiece along the second laser scan direction affecting the material along the second laser scan direction and creating one or more localized adverse gas characteristics that could interfere with the capability of the laser beam to impinge the workpiece accurately with respect to a directed position of the laser beam processing axis along the second laser scan direction and could cause fluctuation of the edge characteristic of the laser-induced material effect, wherein the second laser scan direction is transverse to the first laser scan direction, wherein the second laser scan direction is transverse to the predominant gas flow direction, wherein the second laser scan direction includes a second laser scan direction component that is parallel with and opposite to the predominant gas flow direction, and wherein the second laser scan direction with respect to the predominant gas flow direction inhibits the one or more localized adverse gas characteristics.