Middlefield, CT, United States
Middlefield, CT, United States

Zygo Corporation is a company that specializes in optical systems & equipment for areas such as optical metrology. Zygo's metrology systems are based on optical interferometry measuring displacement, surface figure, and optical wavefront. Metrology and optical markets for end-user and OEM applications include semiconductor capital equipment, aerospace/defense, automotive, and research.Zygo Corporation is listed on NASDAQ and traded under the symbol ZIGO. It is headquartered at Middlefield, Connecticut, and has 484 employees worldwide. Wikipedia.


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Patent
Zygo Corporation | Date: 2016-05-05

A method for measuring a position of an object, the method includes probing a sensing mark arranged in a first plane on a substrate to determine the position of the object, a portion of the substrate connecting the sensing mark to the object. An edge of the object can be sufficiently close to an edge of the sensing mark to reduce measurement errors in the position of the object caused by a deformation of the substrate.


Patent
Zygo Corporation | Date: 2016-04-13

A lithography method for use in fabricating integrated circuits on a substrate, the method comprising:supporting the substrate on a moveable stage;imaging spatially patterned radiation onto the substrate;adjusting the position of the stage;using a method for determining information about changes along a degree of freedom of an encoder scale to monitor the position of the stage, the method comprising:monitoring the position of the first component using a method for determining information about changes along a degree of freedom of an encoder scale, the method comprising:directing a first beam and a second beam along different paths and combining the first and second beams to form an output beam, where the first and second beams are derived from a common source, the first and second beams have different frequencies, where the first beam contacts the encoder scale at a non-Littrow angle and the first beam diffracts from the encoder scale at least once;detecting an interference signal based on the output beam, the interference signal comprising a heterodyne phase related to an optical path difference between the first beam and the second beam; anddetermining information about a degree of freedom of the encoder scale based on the heterodyne phase,wherein the encoder scale or the optical assembly are attached to the stage and the information corresponds to the position of the stage along an axis.


Patent
Zygo Corporation | Date: 2015-04-01

A photo-mask for use in extreme ultraviolet (EUV) lithography, in which the photo-mask has low coefficient of thermal expansion and high specific stiffness.


Patent
Zygo Corporation | Date: 2015-10-12

An encoder interferometry system includes an encoder scale arranged to receive and diffract a measurement beam. The system further includes one or more optical elements configured and arranged to receive a first diffracted measurement beam and a second diffracted measurement beam from the encoder scale and to redirect the first diffracted measurement beam and the second diffracted measurement beam toward the encoder scale such that the first diffracted measurement beam and the second diffracted measurement beam propagate along non-parallel beam paths having an angular separation following a second diffraction at the encoder scale. The system further includes a first detector arranged to receive the first diffracted measurement beam and a second detector arranged to receive the second diffracted measurement beam.


Patent
Zygo Corporation | Date: 2015-08-11

Calibrating a scanning interferometry imaging system includes: configuring the scanning interferometry imaging system for operation with an interference objective using light having a narrowband wavelength spectrum; using the scanning interferometry imaging system to direct measurement light and reference light along different paths and to overlap the measurement and reference light on a detector, the measurement and reference light having the narrowband wavelength spectrum; scanning an optical path length difference between the measurement light and the reference light at the detector while acquiring intensity data using the detector, the detector acquiring the intensity data at a frame rate and the scanning being performed at a scan speed; determining information about the scan speed based on the acquired intensity data, geometric information about the scanning interferometry imaging system, and the narrowband wavelength spectrum; and calibrating the scanning interferometry imaging system based on the information about the scan speed.


Patent
Zygo Corporation | Date: 2015-08-13

A method for determining information about an object including a curved portion and a planar portion, the curved portion having a first curved surface having an apex and defining an axis of the object, includes: directing measurement light to the object; detecting measurement light reflected from the first curved surface of the curved portion; detecting measurement light reflected from at least one other surface of the object; and determining, based on the detected light, information about the apex of the first curved surface of the curved portion.


Patent
Zygo Corporation | Date: 2015-08-13

A method for determining information about a transparent optical element including a lens portion and a plane parallel portion, the lens portion having at least one curved surface and the plane parallel portion having opposing first and second surfaces, includes: directing measurement light to the transparent optical element; detecting measurement light reflected from at least one location on the first surface of the plane parallel portion; detecting measurement light reflected from the second surface of the plane parallel portion at a location corresponding to the at least one location on the first surface; determining, based on the detected light, information about the plane parallel portion; and evaluating the transparent optical element based on the information about the plane parallel portion.


Patent
Zygo Corporation | Date: 2015-01-08

Generating a composite image of a non-flat surface includes: acquiring, using a microscope, multiple images of different areas of the non-flat surface, where each image includes a region of overlap with at least one adjacent image, the microscope having sufficient resolution to image in three dimensions a microstructure on the non-flat surface having a lateral dimension of 10 microns or less and a height of 10 nm or less; determining, for each of the images, a set of rigid body parameters relating a position and orientation of the test object in the image to a common coordinate system, where the set of rigid body parameters is determined by fitting the resolved microstructure in the overlap region in the image with the corresponding microstructure in the overlap region of the adjacent image; and combining the images based on the sets of rigid body parameters to generate a composite image.


Patent
Zygo Corporation | Date: 2015-07-14

Determining information about a degree of freedom of rigid body motion of an encoder scale includes: directing a first beam toward an encoder scale, in which the first beam diffracts from an encoder scale; combining a diffracted component of the first beam with a second beam to form an interfering output beam; monitoring changes in the output beam as a function of a wavelength of the first and second beams; and determining the information about a degree of freedom of rigid body motion of the encoder scale based on changes in the output beam as a function of the wavelength.


Patent
Zygo Corporation | Date: 2015-03-24

An encoder head includes one or more components arranged to: i) direct a first incident beam to the diffractive encoder scale at a first incident angle with respect to the encoder scale; ii) receive a first return beam from the encoder scale at a first return angle, the first return angle being different from the first incident angle; iii) redirect the first return beam to the encoder scale as a second incident beam at a second incident angle; and iv) receive a second return beam back from the encoder scale at a second return angle, the second return angle being different from the second incident angle, in which a difference between the first incident angle and second incident angle is less than a difference between the first incident angle and the first return angle and less than a difference between the second incident angle and the second return angle.

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