Cai H.,Kunming Institute of Precious Metals |
Cai H.,Yunnan Key Laboratory of Precious Metallic Material |
Chen L.,Kunming Institute of Precious Metals |
Chen L.,Yunnan Key Laboratory of Precious Metallic Material |
And 4 more authors.
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | Year: 2010
Ir films were deposited on molybdenum substrates by MOCVD using iridium tri-acetylacetonate as precursors. The effects of deposition temperature and oxygen on deposition effectiveness of iridium were discussed. The relationship between the deposition rate and the deposition temperature does not accord with Arrhenius formula; however, there exists a parabola relation between them. The deposition rate of iridium will reach maximum at 750°C. The deposition temperature greatly affects the film properties. The component, the surface morphology and the structure of Ir films will be influenced by the addition of oxygen. Copyright © 2010, Northwest Institute for Nonferrous Metal Research. Published by Elsevier BV. All rights reserved. Source