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A cleaning agent is provided for a semiconductor substrate superior in corrosion resistance of a tungsten wiring or a tungsten alloy wiring, and superior in removal property of polishing fines (particle) such as silica or alumina, remaining at surface of the semiconductor substrate, in particular, at surface of a silicon oxide film such as a TEOS film, after a chemical mechanical polishing process; and a method for processing a semiconductor substrate surface. A cleaning agent for a semiconductor substrate is to be used in a post process of a chemical mechanical polishing process of the semiconductor substrate having a tungsten wiring or a tungsten alloy wiring, and a silicon oxide film, comprising (A) a phosphonic acid-based chelating agent, (B) a primary or secondary monoamine having at least one alkyl group or hydroxyalkyl group in a molecule and (C) water, wherein a pH is over 6 and below 7.


Patent
Wako Pure Chemical Industries Ltd. and Kanagawa Prefectural Hospital Organization | Date: 2013-03-22

The invention provides a method of detecting DNA having a microsatellite region without causing the problem of a non-specific reaction product. The method includes (1) contacting a probe, which does not have a nucleotide sequence complementary to the microsatellite region and hybridizes with both sides of the nucleotide sequences of the microsatellite region, with DNA having the microsatellite region, to form a hybrid of the DNA and the probe, which has a loop structure including a microsatellite region, (2) separating the obtained hybrid, (3) detecting the hybrid. The invention also provides a hybrid of DNA and a probe, having a loop structure including a microsatellite region, which is made by contacting DNA having a microsatellite region with the probe which does not have a nucleotide sequence complementary to the microsatellite region, and hybridizes with both sides of the nucleotide sequence of the microsatellite region.


Patent
Wako Pure Chemical Industries Ltd. and Kanagawa Prefectural Hospital Organization | Date: 2013-03-22

The invention provides a method for detection of mutant-type DNA or/and wild-type DNA by contacting at least one of a single-stranded DNA having a substituted nucleotide, a deficient nucleotide region, or an inserted nucleotide region (mutant-type DNA), or/and a wild-type single-stranded DNA corresponding to the mutant-type DNA (wild-type DNA) with a probe hybridizing with both single-stranded DNAs, to form a hybrid with the mutant-type DNA (mutant-type hybrid) or/and a hybrid with the wild-type DNA (wild-type hybrid) (at least one of the obtained mutant-type hybrid and wild-type hybrid has a loop structure), (2) contacting the obtained mutant-type hybrid or/and wild-type hybrid with an intercalator, and (3) detecting the presence or absence of the mutant-type DNA or/and the wild-type DNA by separating the conjugate of mutant-type hybrid and intercalator or/and the conjugate of wild-type hybrid and intercalator.


Patent
Wako Pure Chemical Industries Ltd. | Date: 2014-01-22

It is an object of the present invention to provide an electrochemical device having an electrolytic solution having high current density, as well as high safety, where dissolution and deposition of magnesium progress repeatedly and stably. Furthermore, the present invention relates to an electrolytic solution for an electrochemical device, comprising (1) a supporting electrolyte comprising a magnesium salt, and (2) at least one or more kinds of the compound represented by following general formula (I) (wherein n represents an integer of 0 to 6, and n pieces of R


Patent
Wako Pure Chemical Industries Ltd. | Date: 2013-05-10

It is the object of the present invention to provide an alkali etching solution for solar cell manufacturing, which is capable of forming uniformly a fine hubbly structure throughout a whole wafer on the surface of a wafer having a silicon as a main component, and still more is applicable to various wafers; and a method for manufacturing a silicon-based substrate for solar cell manufacturing, using the etching solution. The present invention relates to the alkali etching solution for solar cell manufacturing, comprising (A) a mono- or disulfonic acid or a salt thereof represented by the general formula [1], (B) an alkali compound, and (C) water; and a method for manufacturing a silicon-based substrate for solar cell manufacturing, characterized by etching a wafer having a silicon as a main component, using the etching solution, to form a hubbly structure at the surface of the wafer: {wherein p moieties of R

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