Time filter

Source Type

Patent
Wako Pure Chemical Industries Ltd. and Tokyo University of Science | Date: 2017-03-01

It is an object of the present invention to provide an electrode having superior charge-discharge capacity, even in the case of using an active material containing silicon. The present invention relates to a binder for a lithium cell comprises a polymer having a monomer unit derived from acrylic acid, and 1 to 2 kinds of monomer units derived from the compound shown by the general formula (I), the general formula (II), or the general formula (III), as constituents, and cross-linked by a cross-linking agent selected from the compounds described by the following general formulae [1] to [13], and the polymer described by the following general formula [14], a composition for producing an electrode of a lithium cell comprising 1) an active material containing silicon, 2) a conductive assistant, and 3) the above-described binder for a cell, and an electrode for a lithium cell having 1) an active material containing silicon, 2) a conductive assistant, 3) the above-described binder for a cell, and (4) a current collector.


Patent
Wako Pure Chemical Industries Ltd. | Date: 2017-03-08

The present invention addresses the problem of providing a method for specifically measuring CK-MB while avoiding an influence of CK-BB. That is, the present invention relates to A method for measuring CK-MB in a sample, comprising: a step for reacting the sample with a first antibody against CK-MB, a second antibody against CK-MB which recognizes an epitope different from that recognized by the first antibody, and an anti-CK-B antibody which recognizes a region of the 1st to 100th amino acid from N-terminus of the amino acid sequence of the subunit B of creatine kinase (step 1); a step for measuring an optical change generated by the reaction (step 2); and a step for determining a quantity of CK-MB in the sample on the basis of the result obtained in the step 2 (step 3), and a kit to be used in the method, and a method for avoiding a influence of creatine kinase BB isozyme in measuring CK-MB, comprising treating a sample with the anti-CK-B antibody.


Patent
Wako Pure Chemical Industries Ltd. | Date: 2017-04-05

Using the colored resin composition using a conventional triarylmethane derivative, heat resistance within a practical range has not been obtained. Therefore, it is an object of the present invention to provide a colored composition having higher heat resistance as compared with the conventional colored composition. The present invention relates to a compound represented by the following general formula (1), and a polymer having a monomer unit derived from the compound, and the like._(1) to R_(4) each independently represent an alkyl group or the like; R_(5) to R_(7) each independently represent a hydrogen atom or a methyl group; n pieces of R_(8) each independently represent a halogen atom, an alkyl group, an aryl group, a hydroxy group, a nitro group, a sulfo group, an alkoxy group, or the like; and n represents an integer of 0 to 4. A_(1) represents an alkylene group, or the like; A_(2) represents -NH- or -O-. An^(-) represents an anion containing an aryl group having an electron-withdrawing substituent, a sulfonyl group having an electron-withdrawing substituent, or a halogenated alkyl group.)


Patent
Wako Pure Chemical Industries Ltd. | Date: 2017-02-01

A colored resin composition using a conventional rhodamine derivative has not provided heat resistance in a practical range. Therefore, it is an object of the present invention to provide a coloring composition having higher heat resistance as compared with the conventional coloring composition. The present invention relates to a compound represented by the following general formula (1), and a polymer having a monomer unit derived from the compound, and the like._(1) to R_(4) each independently represent a hydrogen atom, an alkyl group, and the like; R_(7) represents a hydrogen atom or a methyl group; R_(8) and R_(9) each independently represent a hydrogen atom or an alkyl group; Y represents a nitrogen atom or a group represented by the following formula (1-1):_(1) represents an alkylene group which has at least one group selected from -O-, -OCO-, -COO-, -NHCO-, -CONH-, -NHCONH- and an arylene group in the chain, and the like; A_(2) represents -NH- or -O-; An^(-) represents an anion containing an aryl group having an electron-withdrawing substituent, and the like; n represents an integer of 0 to 3; R_(8) and R_(9) may form a cyclic structure of a 5 to 6 membered ring together with -N-(CH_(2))_(n)-Y bonding thereto.)


Patent
Wako Pure Chemical Industries Ltd. | Date: 2017-01-11

It is an object of the present invention to provide a cyanine-based coloring composition having higher heat resistance, as compared with a conventional coloring composition. The present invention relates to a compound represented by the following general formula (1), a polymer having a monomer unit derived from the compound, along with a coloring composition, a coloring composition for a color filter, and a colored resin comprising the above-described compound or the above-described polymer.


Patent
Wako Pure Chemical Industries Ltd. and Tokyo University of Science | Date: 2016-05-11

It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.^(1) to R^(5) each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R^(6) represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R^(7) represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z^(-) represents an anion derived from a carboxylic acid having a specific structure.)


Patent
Wako Pure Chemical Industries Ltd. and Osaka University | Date: 2016-01-06

The present invention provides a breast cancer marker selected from the group consisting of fucosylated hornerin, fucosylated Zn--2-glycoprotein, fucosylated Ig -1 chain C region, and fucosylated desmoplakin; a method for determining breast cancer comprising detecting the breast cancer marker in a sample, and determining on the basis of the results of the results; and a kit to be used for the determination.


The present invention relates to a cleaning agent for a semiconductor substrate having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film to be used in a post-process of a chemical mechanical polishing process, comprising (A) an organic acid represented by general formula described in the present specification, (B) amines selected from the group consisting of (B-1) diamines, (B-2) amidines, (B-3) azoles, and (B-4) pyrazines or pyrimidines, represented by general formulae described in the present specification, (C) a hydroxylamine derivative, and (D) an oxygen scavenger represented by general formula described in the present specification, and being an aqueous solution having a pH of 10 or higher; and a processing method for the surface of a semiconductor substrate, having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film, which comprises using the cleaning agent.


Patent
Wako Pure Chemical Industries Ltd. | Date: 2016-11-30

An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound.^(1) represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R^(2) to R^(4) each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z^(+) represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)


Patent
Wako Pure Chemical Industries Ltd. | Date: 2016-02-17

It is a subject of the present invention to provide a cleaning agent for a substrate having a metal wiring, and a cleaning method for a semiconductor substrate comprising that the cleaning agent is used, by which following effects (1) to (5) are obtained, in a cleaning process after chemical mechanical polishing (CMP) in a manufacturing process of a semiconductor device. (1) Residues of fine particles (polishing agents) used in the CMP process, fine particles (metal particles) derived from a polished metal, an anticorrosive, and the like, can be removed sufficiently. (2) A coating film (protective film: oxidation resistant film) on a surface of the metal wiring, containing a complex between an anticorrosive, such as benzotriazole or quinaldic acid, and a surface metal of the metal wiring, formed in the CMP process, can be removed (stripped) sufficiently. (3) An oxide film containing a metal oxide can be formed after removal (stripping) of the coating film. (4) A semiconductor substrate can be obtained stably for a long period of time, without impairing flatness of the surface of the metal wiring (the surface of the oxide film containing the metal oxide), even leaving a substrate after the cleaning process after the CMP. (5) It is hard to deteriorate even after using the cleaning agent for a long period of time. The present invention relates to a cleaning agent for a substrate having a metal wiring, comprising an aqueous solution containing (A) carboxylic acid having a nitrogen-containing heterocyclic ring and (B) alkylhydroxylamine, and having a pH of 10 or higher, as well as a cleaning method for a semiconductor substrate, comprising that the cleaning agent is used.

Loading Wako Pure Chemical Industries Ltd collaborators
Loading Wako Pure Chemical Industries Ltd collaborators