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Patent
Wako Pure Chemical Industries Inc. and WAKO LIFE science INC. | Date: 2015-04-10

A method for purifying polynucleic acids is disclosed, comprising adsorbing the polynucleic acids to a filter, washing the filter with a water-immiscible solution, and eluting the polynucleic acids from the filter. The method can be used to prepare purified RNA and/or DNA.


Patent
Wako Pure Chemical Industries Ltd. and Tokyo University of Science | Date: 2015-04-21

It is an object of the present invention to provide an electrode having superior charge-discharge capacity, even in the case of using an active material containing silicon. The present invention relates to a binder for a lithium cell comprises a polymer having a monomer unit derived from acrylic acid, and 1 to 2 kinds of monomer units derived from the compound shown by the general formula (I), the general formula (II), or the general formula (III), as constituents, and cross-linked by a cross-linking agent selected from the compounds described by the following general formulae [1] to [13], and the polymer described by the following general formula [14], a composition for producing an electrode of a lithium cell comprising 1) an active material containing silicon, 2) a conductive assistant, and 3) the above-described binder for a cell, and an electrode for a lithium cell having 1) an active material containing silicon, 2) a conductive assistant, 3) the above-described binder for a cell, and (4) a current collector.


Patent
Wako Pure Chemical Industries Ltd. and Tokyo University of Science | Date: 2016-05-11

It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.^(1) to R^(5) each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R^(6) represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R^(7) represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z^(-) represents an anion derived from a carboxylic acid having a specific structure.)


Patent
Wako Pure Chemical Industries Ltd. and Osaka University | Date: 2016-01-06

The present invention provides a breast cancer marker selected from the group consisting of fucosylated hornerin, fucosylated Zn--2-glycoprotein, fucosylated Ig -1 chain C region, and fucosylated desmoplakin; a method for determining breast cancer comprising detecting the breast cancer marker in a sample, and determining on the basis of the results of the results; and a kit to be used for the determination.


The present invention relates to a cleaning agent for a semiconductor substrate having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film to be used in a post-process of a chemical mechanical polishing process, comprising (A) an organic acid represented by general formula described in the present specification, (B) amines selected from the group consisting of (B-1) diamines, (B-2) amidines, (B-3) azoles, and (B-4) pyrazines or pyrimidines, represented by general formulae described in the present specification, (C) a hydroxylamine derivative, and (D) an oxygen scavenger represented by general formula described in the present specification, and being an aqueous solution having a pH of 10 or higher; and a processing method for the surface of a semiconductor substrate, having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film, which comprises using the cleaning agent.


The present invention addresses the problem of providing a chelate color former which can measure the concentration of iron with high sensitivity and with low blank values when measuring the concentration of iron, and an iron concentration measurement method and kit that use this chelate color former. The present invention relates to: a compound represented by following formula [1] or a salt thereof_(1) and R_(2) each independently represent -SO_(3)H or -CO_(2)H; an iron concentration measurement method in which the compound is used as a chelate color former, the compound is brought into contact with iron in a sample, and the concentration of iron in the sample is measured on the basis of the degree of resulting color development; and a kit to be used therein.


Patent
Wako Pure Chemical Industries Ltd. | Date: 2016-11-30

An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound.^(1) represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R^(2) to R^(4) each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z^(+) represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)


Patent
Wako Pure Chemical Industries Ltd. | Date: 2016-02-17

It is a subject of the present invention to provide a cleaning agent for a substrate having a metal wiring, and a cleaning method for a semiconductor substrate comprising that the cleaning agent is used, by which following effects (1) to (5) are obtained, in a cleaning process after chemical mechanical polishing (CMP) in a manufacturing process of a semiconductor device. (1) Residues of fine particles (polishing agents) used in the CMP process, fine particles (metal particles) derived from a polished metal, an anticorrosive, and the like, can be removed sufficiently. (2) A coating film (protective film: oxidation resistant film) on a surface of the metal wiring, containing a complex between an anticorrosive, such as benzotriazole or quinaldic acid, and a surface metal of the metal wiring, formed in the CMP process, can be removed (stripped) sufficiently. (3) An oxide film containing a metal oxide can be formed after removal (stripping) of the coating film. (4) A semiconductor substrate can be obtained stably for a long period of time, without impairing flatness of the surface of the metal wiring (the surface of the oxide film containing the metal oxide), even leaving a substrate after the cleaning process after the CMP. (5) It is hard to deteriorate even after using the cleaning agent for a long period of time. The present invention relates to a cleaning agent for a substrate having a metal wiring, comprising an aqueous solution containing (A) carboxylic acid having a nitrogen-containing heterocyclic ring and (B) alkylhydroxylamine, and having a pH of 10 or higher, as well as a cleaning method for a semiconductor substrate, comprising that the cleaning agent is used.


Patent
Wako Pure Chemical Industries Ltd. | Date: 2015-01-22

An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R^(1 )represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R^(2 )to R^(4 )each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z^(+) represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)


Patent
Wako Pure Chemical Industries Ltd. | Date: 2015-03-05

It is an object of the present invention to provide a cyanine-based coloring composition having higher heat resistance, as compared with a conventional coloring composition. The present invention relates to a compound represented by the following general formula (1), a polymer having a monomer unit derived from the compound, along with a coloring composition, a coloring composition for a color filter, and a colored resin comprising the above-described compound or the above-described polymer.

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