Veeco MOCVD Operations394 Elizabeth AvenueSomerset

Veeco MOCVD Operations394 Elizabeth AvenueSomerset

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Su J.,Veeco MOCVD Operations394 Elizabeth AvenueSomerset | Armour E.,Veeco MOCVD Operations394 Elizabeth AvenueSomerset | Lee S.M.,Veeco MOCVD Operations394 Elizabeth AvenueSomerset | Arif R.,Veeco MOCVD Operations394 Elizabeth AvenueSomerset | Papasouliotis G.D.,Veeco MOCVD Operations394 Elizabeth AvenueSomerset
Physica Status Solidi (A) Applications and Materials Science | Year: 2016

We are reporting on the uniform growth of III-nitrides (AlN, GaN, and AlGaN layers) on 200mm silicon substrates using Veeco's Propel rotating disk, single wafer vertical MOCVD reactor. The reactor is designed for homogeneous alkyl/hydride flow distribution, and uniform temperature profile, resulting in excellent uniformity in epilayer thickness, alloy composition, and doping profiles. Thickness uniformity for single layers of AlN and GaN are 0.71 and 0.67% 1σ, respectively, without edge exclusion. A 21nm Al0.23Ga0.77N layer has 0.29%, 1σ uniformity for Al composition, and a range of 1.2nm (max-min) for thickness. Uniformity of magnesium and carbon doping profiles is presented across the 200mm substrate. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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