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Prague, Czech Republic

Kopecky D.,Ustav fyziky a merici techniky | Vrnata M.,Ustav fyziky a merici techniky | Kopecka J.,Ustav fyziky a merici techniky
Chemicke Listy | Year: 2015

This review deals with four major laser deposition technologies (pulsed laser deposition, matrix assisted pulsed laser evaporation, laser induced forward transfer, matrix assisted pulsed laser evaporation – direct write), used for depositions of organic materials in both vertical (thin films) and horizontal structures (with high-resolution motives). Each technology is described in terms of the principle and its capability of nondestructive depositing polymers and biological materials. The influences of the used deposition methods on chemical composition and morphology of the deposited material. Using the laser deposition technologies for organic materials is still considered an alternative to the conventional methods. The aim of this review is to show that laser deposition technologies can in many respects overcome the conventional technologies and serve well the needs of new, progressive trends in the chemistry, material science and electronics. © 2015, Czech Society of Chemical Engineering. All rights reserved.

Vrnata M.,Ustav fyziky a merici techniky | Kopecky D.,Ustav fyziky a merici techniky | Skodova J.,Ustav fyziky a merici techniky | Fitl P.,Ustav fyziky a merici techniky | And 2 more authors.
Chemicke Listy | Year: 2012

The increasing application of conductive polymers in electronics requires a precise and controlled deposition of these materials in thin layers. The article provides a brief description of the method, the principle and properties of both the source polymer and the matrix; also the experimental conditions necessary for successful thin layer preparation are presented. Matrix-assisted pulsed laser evaporation of polypyrrole was carried out at different laser fluences (0.1-0.6 J cm-2) with KrF excimer laser (λ = 248 nm) from water and dimethyl sulfoxide matrices - and also with Nd:YAG laser (λ = 266 nm) for comparison. The layer thickness was hundreds of nanometers. The relations of the laser wavelength, laser fluence and the used matrix on the one hand and chemical composition of the layers (analyzed by FTIR) on the other were studied. The ablation threshold was 0.25-0.30 J cm-2 for dimethyl sulfoxide matrix.

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