University Mohammed First of Morocco

Selouane, Morocco

University Mohammed First of Morocco

Selouane, Morocco

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El Haim M.,University Mohammed First of Morocco | El Hammouti M.,University Mohammed First of Morocco | Chatei H.,University Mohammed First of Morocco | Atounti M.,Applied Information Sciences | El Bojaddaini M.,University Mohammed First of Morocco
International Review on Modelling and Simulations | Year: 2013

This paper presents the numerical simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor used for diamond thin film deposition. A COMSOL MWP module, based on fluid plasma model, has been used to study impact of hydrogen pressure and incident microwave power on plasma discharge characteristics such as electron density, electron temperature and electric potential, at low pressure. It is clearly shown that the plasma volume increases either by augmenting power and keeping a constant pressure or by decreasing pressure while maintaining a constant power. It is also seen that uniformity of the plasma is obtained as the gas pressure is decreased, and that electron density increases significantly as a function of pressure and power. However, electron temperature varies in the opposite direction of the electron density, in the ranges of power and gas pressure studied. Results also indicate that electric potential increases by augmenting the incident power and maintaining a constant pressure or decreasing the pressure while keeping a constant power. Comparisons between model and experimental results are mainly satisfactory and support the fact that average electron density varies in the range of (1 × 1017 ÷8 × 1017)m-3 for the input power range (50W-300W) at a given pressure value (1.5Torr). © 2013 Praise Worthy Prize S.r.l. - All rights reserved.


El Haim M.,University Mohammed First of Morocco | El Hammouti M.,University Mohammed First of Morocco | Chatei H.,University Mohammed First of Morocco | El Bojaddaini M.,University Mohammed First of Morocco | Atounti M.,Applied Information Sciences
International Review on Modelling and Simulations | Year: 2014

A 2D-fluid plasma model has been developed for a microwave cavity plasma reactor used for diamond thin film deposition. Dependencies of discharge characteristics on the main physical parameters namely the hydrogen pressure and the microwave power density have been numerically studied. The pure hydrogen plasma characteristics, such as electron density, electron temperature and electric potential are simulated by applying a COMSOL MWP module based on finite element method to solve electron continuity and electron energy equations coupled with Poisson's equation. This present paper provides the spatial and temporal evolutions of different discharge characteristics for various input conditions. It is shown that the electron density was in the range (5×1016-8×1017)m-3 for the pressure range of (40-60)Torr. It is also clearly shown that as the power density increases the electron density increases and that the electron temperature and electric potential vary slightly with gas pressure and microwave power density. © 2014 Praise Worthy Prize S.r.l. - All rights reserved.

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