Kawasaki, Japan
Kawasaki, Japan

Time filter

Source Type

A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.


Patent
Tokyo Ohka Kogyo | Date: 2017-05-10

The purpose of the present invention is to provide a photosensitive composition having excellent sensitivity, an insulating film formed using said photosensitive composition, a color filter formed using said photosensitive composition, a display device provided with said insulating film or said color filter, and a compound suitable for incorporation as a photopolymerization initiator into said photosensitive composition. This photosensitive composition includes (A) a photopolymerizable compound and (B) a photopolymerization initiator, wherein the photopolymerization initiator (B) contains a compound represented by formula (1). In formula (1), R^(1) is a hydrogen atom, a nitro group, or a monovalent organic group; R^(2) and R^(3) are each an optionally substituted linear alkyl group, an optionally substituted cyclic organic group, or a hydrogen atom, and R^(2) and R^(3) may be bonded to one another to form a ring; R^(4) is a monovalent organic group; R^(5) is a hydrogen atom, an optionally substituted C1-11 alkyl group, or an optionally substituted aryl group; n is an integer from 0 to 4; and m is 0 or 1.


A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z^() represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and M^(m+) represents an organic cation having a valency of m. Z^()(M^(m+))_(1/m)(d1)


Patent
Tokyo Ohka Kogyo | Date: 2015-04-10

A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.


Patent
Tokyo Ohka Kogyo | Date: 2017-02-06

An adhesive composition for temporarily attaching a substrate to a support plate which supports the substrate, including a thermoplastic resin and a release agent.


A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R^(b1 )represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y^(b1 )represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V^(b1 )represents a fluorinated alkylene group; m represents an integer of 1 or more; and M^(m+) represents an organic cation having a valency of m). R^(b1)Y^(b1)V^(b1)SO_(3)^()(M^(m+))_(1/m)(b1)


Patent
Tokyo Ohka Kogyo | Date: 2016-12-01

A method for forming a resist pattern including forming a first contact hole pattern including a hole portion and a hole-unformed portion, which includes alkali developing the exposed positive-type resist film; preparing a structure including the first contact hole pattern and a first layer which covers the first contact hole pattern, which includes forming a first layer by applying a solution including an acid or a thermal acid generator onto a support on which the first contact hole pattern is formed; forming organic solvent-soluble and organic solvent-insoluble regions on the hole-unformed portion, which includes heating the structure; and forming a second contact hole pattern on the hole-unformed portion, which includes developing the heated structure with an organic solvent.


Patent
Tokyo Ohka Kogyo | Date: 2016-12-05

A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).


This invention provides: a new imidazole compound that yields a surface treatment liquid that is very effective at suppressing migration and the oxidation of a wiring surface; a metal surface treatment liquid that contains the imidazole compound; a metal surface treatment method that uses the metal surface treatment liquid; and a laminate production method that uses the surface treatment liquid. Metal is surface-treated using the surface treatment liquid which includes a saturated fatty acid or a saturated fatty acid ester of a specific structure, in which a prescribed position is substituted by an aromatic group of a prescribed structure and an imidazolyl group that may have a substituent group.


A homogeneous coating solution for forming a light-absorbing layer of a solar cell, the homogeneous solution including: at least one metal or metal compound selected from the group consisting of a group 11 metal, a group 13 metal, a group 11 metal compound and a group 13 metal compound; a Lewis base solvent; and a Lewis acid.

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