Tokyo Ohka Kogyo | Date: 2016-09-21
A surface treatment liquid capable of making a surface of a treatment target hydrophilic or hydrophobic without including a resin having a coating film formation property, and a surface treatment method using the surface treatment liquid. The surface treatment liquid includes a resin, a solvent and a strong acid having a pKa of 1 or less. The resin includes a functional group I that is at least one of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II that is a hydrophilic group or a hydrophobic group other than the functional group I.
Tokyo Ohka Kogyo | Date: 2016-09-19
A surface treatment agent capable of effectively preventing pattern collapse of an inorganic pattern or a resin pattern provided on a substrate, and a surface treatment method using such a surface treatment agent. The surface treatment agent includes a silylation agent and a nitrogen-containing heterocyclic compound which does not include a silicon atom.
Tokyo Ohka Kogyo | Date: 2016-08-15
A filtering material which is used to filter a liquid chemical for lithography, in which a base material having a group represented by the following Formula (a0-1) is used: (*-Ya^(01)_(n)W(a0-1)
Tokyo Ohka Kogyo | Date: 2016-09-27
A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.
Tokyo Ohka Kogyo | Date: 2016-08-19
A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass:
Tokyo Ohka Kogyo | Date: 2016-05-27
A method for producing a fiber having a pattern on a surface thereof. The fiber is produced by a method including forming a photosensitive composition layer on a template layer having a pattern, bonding a film including an adhesive layer on a principal plane onto the photosensitive composition layer, linearly exposing the photosensitive composition layer to light, separating an exposed laminate comprising the photosensitive composition layer, the adhesive layer, and the film from the template layer, and developing the photosensitive composition layer in the separated laminate.
Tokyo Ohka Kogyo | Date: 2016-06-01
A method for producing a fiber having a pattern on a surface thereof, the method including forming a resin composition layer having a linear first pattern using a resin composition; and forming a second pattern on the resin composition layer. The second pattern may be formed by forming a thin film of a block copolymer comprising at least two block chains different from each other in surface free energy on the resin composition layer and subjecting the block copolymer to microphase separation. Alternatively, the second pattern is formed by adhering particles onto the resin composition layer.
Tokyo Ohka Kogyo | Date: 2016-06-17
A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0):
Tokyo Ohka Kogyo | Date: 2016-03-18
A laminated film that is usable as a filter and has the strength high enough to withstand the pressure applied in filtration without breaking and a good filtration rate. The laminated film includes a thin film and a support film stacked on top of each other, the thin film having a thickness of 1 nm to 1 m and including a first pore portion having one or more pores, the support film having a thickness of 1 to 100 m and including a second pore portion having one or more pores. The pores of the thin film has an average aspect ratio of not more than 2, the thin film has an opening ratio of not more than 80%, and the first pore portion in the thin film is disposed so as to meet a predetermined relationship with the second pore portion in the support film.
Tokyo Ohka Kogyo | Date: 2016-03-15
A process for preparing a chemical liquid of a silylating agent that has a reduced metal impurity concentration, and a surface treatment method using a chemical liquid of a silylating agent obtained by the preparation process. The process includes reducing metal impurities contained in an untreated chemical liquid of a silylating agent using an ion-exchange resin membrane that has been brought into contact with an organic solvent in advance. A surface treatment method that hydrophobizes a substrate surface includes exposing, to the substrate surface, a chemical liquid of a silylating agent obtained by the above process for preparing a chemical liquid of a silylating agent.