Tokyo Ohka Kogyo | Date: 2016-09-21
A surface treatment liquid capable of making a surface of a treatment target hydrophilic or hydrophobic without including a resin having a coating film formation property, and a surface treatment method using the surface treatment liquid. The surface treatment liquid includes a resin, a solvent and a strong acid having a pKa of 1 or less. The resin includes a functional group I that is at least one of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II that is a hydrophilic group or a hydrophobic group other than the functional group I.
Tokyo Ohka Kogyo | Date: 2016-09-19
A surface treatment agent capable of effectively preventing pattern collapse of an inorganic pattern or a resin pattern provided on a substrate, and a surface treatment method using such a surface treatment agent. The surface treatment agent includes a silylation agent and a nitrogen-containing heterocyclic compound which does not include a silicon atom.
Tokyo Ohka Kogyo | Date: 2016-08-15
A filtering material which is used to filter a liquid chemical for lithography, in which a base material having a group represented by the following Formula (a0-1) is used: (*-Ya^(01)_(n)W(a0-1)
Tokyo Ohka Kogyo | Date: 2016-09-27
A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.
Tokyo Ohka Kogyo | Date: 2016-08-19
A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass:
Tokyo Ohka Kogyo | Date: 2017-02-22
Provided are: a photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, that has low cytotoxicity, and that can form a cell culture substrate with which cells can be cultured well; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. In the photosensitive resin composition, which includes a photopolymerizable monomer (A) and a photopolymerization initiator (B), the photopolymerizable monomer (A) used contains a defined amount of a polyfunctional monomer (A1) that is at least trifunctional, and the content of the photopolymerization initiator (B) is within a prescribed range.
Tokyo Ohka Kogyo | Date: 2017-01-11
First, there is provided a crystal growth control agent which is capable of suppressing an increase in a crystal size of a p-type semiconductor, and performing chemical modification on a surface of p-type semiconductor microparticle, a method for forming p-type semiconductor microparticles or a p-type semiconductor microparticle film by using the crystal growth control agent, a composition for forming a hole transport layer of a solar cell, and a solar cell using the composition for forming a hole transport layer. Second, there is provided a composition for forming a hole transport layer which is capable of prompting crystallization and fine pulverization of the p-type semiconductor and performing the chemical modification on the surface of the p-type semiconductor microparticle even in the case where an organic salt (an ionic liquid) containing an anion other than the thiocyanate ion is used, and a solar cell using the composition for forming a hole transport layer. According to the present invention, the crystal growth control agent contains at least one of sulfur-containing compounds (except for thiocyanate) selected from the group consisting of a compound, which generates a thiolate anion due to dissociation of a proton or a cation, and a disulfide compound, and controls crystal growth of a p-type semiconductor.
Tokyo Ohka Kogyo | Date: 2017-01-04
To provide a porous separator which has excellent handleability and provides a secondary battery with high electrical characteristics. A porous separator for secondary batteries according to the present invention is formed of a porous film, and is characterized by having a first layered region having an average pore diameter of from 100 nm to 500 nm (inclusive) and a second layered region having a larger average pore diameter than the first layered region. This porous separator for secondary batteries is also characterized in that the first layered region is positioned in one outermost surface of the porous film. Both the first layered region and the second layered region may be positioned as the outermost surface of the porous film.
Tokyo Ohka Kogyo | Date: 2017-03-29
To provide a surface treatment liquid capable of successfully making a surface of a treatment target hydrophilic or hydrophobic even without including resin having a coating film formation property, and a surface treatment method using the surface treatment liquid. In a surface treatment liquid including (A) resin and a (C) solvent, resin having a functional group I that is at least one group selected from the group consisting of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II that is a hydrophilic group or a hydrophobic group other than the functional group I is used as the (A) resin, and (B) strong acid having a pKa of 1 or less is added to the surface treatment liquid.
Tokyo Ohka Kogyo | Date: 2016-05-27
A method for producing a fiber having a pattern on a surface thereof. The fiber is produced by a method including forming a photosensitive composition layer on a template layer having a pattern, bonding a film including an adhesive layer on a principal plane onto the photosensitive composition layer, linearly exposing the photosensitive composition layer to light, separating an exposed laminate comprising the photosensitive composition layer, the adhesive layer, and the film from the template layer, and developing the photosensitive composition layer in the separated laminate.