Toei Scientific Industrial Co.

Sendai-shi, Japan

Toei Scientific Industrial Co.

Sendai-shi, Japan

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Yabukami S.,Tohoku Gakuin University | Sato A.,Tohoku Gakuin University | Takahashi J.,Sendai National College of Technology | Ozawa T.,Tohoku Gakuin University | And 5 more authors.
IEEE Transactions on Magnetics | Year: 2011

A highly sensitive and broadband method of obtaining thin film permeability without limitations in sample size was developed based on the high-frequency impedance change because of skin effect. A meander-type probe (3.5 mm×2.5 mm, 2 turns) was placed in proximity of a (Co25Fe75) 90B10 film (45 mm×25 mm, 0.53 μm thick), and the permeability was optimized by Newton-Raphson method. The measured values are in good agreements with theoretical values based on the Landau-Lifshitz-Gilbert equation up to 10.6 GHz. The proposed method shows promise for measuring the permeability of wafer-sized samples in line because it is not restricted by size limitations. © 2011 IEEE.


Takahashi J.,Sendai National College of Technology | Yabukami S.,Tohoku Gakuin University | Ozawa T.,Sendai National College of Technology | Miyazawa Y.,Toei Scientific Industrial Co. | And 2 more authors.
IEEJ Transactions on Fundamentals and Materials | Year: 2011

A highly sensitive and broadband method of obtaining the permeability of magnetic film without limitations in sample size was developed based on the high frequency impedance of microstrip meander probe and magnetic film. The probe (5.6 mm × 5 mm, 2 turns) was scanned in the vicinity of a CoNbZr thin film (50 × 50 mm, 0.1 μm thick), and the permeability was optimized by Newton-Raphson method in a frequency range of 10 MHz - 8 GHz. The measured values roughly corresponded to theoretical values based on the Landau-Lifshitz-Gilbert equation and eddy current generation. The proposed method shows promise for measuring the permeability of wafer-sized samples in-line because it is not restricted by size limitations. © 2011 The Institute of Electrical Engineers of Japan.


There is provided a prober chuck capable of carrying out low leakage evaluation on a magnetic memory under environment in which a magnetic field is applied. A prober chuck 1 for a magnetic memory retains a wafer W having a magnetic memory formed thereon. The chuck 1 includes: a chuck top 10 that is made of a conductive material and has a wafer W placed thereon; an insulating layer 11 that is made of an insulating material and is adapted to support the bottom surface of the chuck top 10; and a guard layer 12 that is made of a conductive material and is arranged under the insulating layer 11, the guard layer being insulated from the chuck top 10 via the insulating layer 11. All of the members constituting the chuck 1 including the chuck top 10 and the guard layer 12 are made of a non-magnetic material.

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