Nippon Steel & Sumitomo Metal Corporation and Tocalo Co. | Date: 2015-10-02
A hearth roll includes a base roll, a thermally sprayed coating formed on the base roll, and a modified coating formed on the thermally sprayed coating. The modified coating is formed by modifying a part or the whole of a surface of the thermally sprayed coating by melting and solidification of the thermally sprayed coating, by irradiating a part or the whole of the surface of the thermally sprayed coating with an energy beam. The thickness of the modified coating is from 2 to 20 m, and the Vickers hardness HV of the modified coating is from 1.2 to 1.4 times larger than the Vickers hardness HV of the thermally sprayed coating.
Tocalo Co. and Hitachi Kokusai Electrical Inc. | Date: 2012-03-27
There is provided a substrate processing apparatus, comprising: a processing chamber in which a plurality of substrates are housed, the substrate having thereon a lamination film composed of any one of copper-indium, copper-gallium, or copper-indium-gallium; a reaction tube formed so as to constitute the processing chamber; a gas supply tube configured to introduce elemental selenium-containing gas or elemental sulfur-containing gas to the processing chamber; an exhaust tube configured to exhaust an atmosphere in the processing chamber; and a heating section provided so as to surround the reaction tube, wherein a porous coating film having a void rate of 5% to 15% mainly composed of a mixture of chromium oxide (Cr_(x)O_(y):x, y are arbitrary integer of 1 or more) silica is formed on a surface exposed to at least the elemental selenium-containing gas or the elemental sulfur-containing gas, out of the surface of the reaction tube on the processing chamber side.
Tokyo Electron and Tocalo Co. | Date: 2015-09-15
Particle generation can be suppressed from a thermally sprayed film of yttrium fluoride. A component exposed to plasma in a plasma processing apparatus is provided. The component includes a base and a film. The base is made of aluminum or an aluminum alloy, and an alumite film may be formed on a surface of the base. The film is formed by thermally spraying yttrium fluoride on a surface of the base or on a surface of an underlying layer including a layer provided on the base. A porosity of the film is 4% or less, and an arithmetic mean roughness of a surface of the film is 4.5 m or less.
Tocalo Co. | Date: 2013-01-16
This invention is to provide a fluoride spray coating covered member having excellent resistance to halogen corrosion and resistance to plasma erosion and displaying identification symbols such as letters, numeric characters, graphic, pattern, firm name, serial number and so on. In the invention, one or more implanting gases selected from fluorine-containing gas, oxygen gas and inert gas are ion-implanted onto a white fluoride spray coating formed on a surface of a substrate, whereby at least a part of the surface of the white fluoride spray coating is changed into a black color to form a black ion-implanted layer.
Tocalo Co. | Date: 2012-11-28
[Problem] To provide a fluoride spray coating covered member in which a fluoride spray coating firmly adheres by coating carbide cermet to a surface of a substrate and interposing it, and to propose a method therefor. [Solution] A fluoride spray coating is formed in such a manner that an undercoat layer of carbide cermet, which covers a substrate in a film-shaped manner while a tip portion of carbide cermet particles is embedded in the substrate, or a primer part of carbide cermet, is formed by blowing a carbide cermet material at a high velocity by using a spray gun to a surface of the substrate, and after that, a fluoride particle is sprayed thereon.
Tocalo Co. | Date: 2013-03-22
An electrostatic chuck and a manufacturing method are disclosed in which drawbacks of using an adhesive are not existent and a freedom degree of design is high. The electrostatic chuck includes a substrate part constituting a main chuck body, a first insulating layer of a spray coating formed to the surface of the substrate part, a heater part of an electric conductor formed by applying a conductive paste to the surface of the first insulating layer, a second insulating layer of a spray coating formed to the surface of the first insulating layer so as to cover the heater part, an electrode part formed by thermal spraying to the surface of the second insulating layer and a dielectric layer of a spray coating formed to the surface of the second layer so as to cover the electrode part and lowers a volume resistivity without using an adhesive.
Tocalo Co. and Tokyo Electron | Date: 2012-12-05
A plasma processing apparatus includes a processing chamber; a lower electrode serving as a mounting table for mounting thereon a target object; and an upper electrode or an antenna electrode provided to be opposite to the lower electrode. The apparatus further includes a gas supply source for introducing a gas including a halogen-containing gas and an oxygen gas into the processing chamber and a high frequency power supply for applying a high frequency power for generating plasma to at least one of the upper electrode, the antenna electrode, or the lower electrode. Among inner surfaces of the processing chamber which are exposed to the plasma, at least a part of or all of the surfaces between a mounting position of the target object and the upper electrode, or the antenna electrode; or at least a part of or all of the surfaces of the upper electrode or the antenna electrode are coated with a fluorinated compound.
Techno Quartz Inc. and Tocalo Co. | Date: 2014-09-26
A quartz glass part silicon powder is plasma-sprayed onto a surface of a quartz glass substrate and thereby a coating film is formed, the quartz glass substrate is composed of opaque quartz glass a fraction of grains having a diameter of 100 m or larger in the silicon powder is 3% or smaller.
Tocalo Co. | Date: 2012-04-11
Provided is a member for semiconductor manufacturing device which hardly causes component contamination and is capable of sufficiently reducing generation of particles in a semiconductor manufacturing device. A spray coating is formed by spraying a ceramic onto a mounting member of a transfer arm, and laser beam is irradiated to the spray coating to remelt and resolidify the ceramic composition for modification to thereby form a high-strength ceramic layer made from a ceramic recrystallized material and having a net-like crack, whereby particles dropped out from the mounting member due to external factors in a semiconductor manufacturing device are reduced to an extent not affecting a semiconductor manufacturing process.
Tocalo Co. | Date: 2012-04-12
Forming a densified layer in a spray coating which forms a densified layer providing a sufficient effect while preventing generation of excessively large cracks and does not cause the increase of costs; also provided in a spray coating covering member. When a high-energy beam for remelting and resolidifying a coating composition of a surface layer of an Al_(2)O_(3 )spray coating is scanned over a surface of the Al_(2)O_(3 )spray coating, it is constituted with a precedent laser beam precedently scanned in a scanning direction and a follow-up laser beam subserviently scanned on the same trajectory as that of the precedent laser beam, and the precedent laser beam is irradiated on to the surface of the Al_(2)O_(3 )spray coating while scanning, and the follow-up laser beam is superimposedly irradiated to an irradiation region scanned with the precedent laser beam while scanning to thereby densify the surface layer of the irradiation region.