TNO
Delft, Netherlands
Delft, Netherlands

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Patent
Tno | Date: 2017-01-18

The invention is directed to a bitumen composition, to a paving, to a roofing, to a method for preparing a bitumen composition, to a method for increasing the stiffness of a bitumen composition, to a method of adjusting the physical properties of a bitumen composition, and to the use of a bitumen composition. The bitumen composition of the invention comprises a lignin compound or derivative thereof, wherein 10 wt.% or more by weight of said lignin compound or derivative thereof is molecularly dissolved in said bitumen composition.


Patent
Tno | Date: 2017-02-08

The disclosure concerns an actuator module (10) for actuating a load (14). The actuator module (10) comprises a deformable frame (1) and an actuator (2) connected to the deformable frame (1). A time-varying force distribution (F) couples to an excited state (V0) of an eigenmode (V) of the deformable frame (1). The force distribution (F), as well as a stiffness distribution (K) and/or mass distribution (M) of the deformable frame 1 are adapted such that static nodal points (11s) of the deformable frame 1 are coincided with mode nodal points (11m). The locations where the nodal points coincide can be used to connect the actuator module (10) to a base frame to reduce transfer of vibrations to the base frame and back which may otherwise undesirably influence the transfer function from actuator to load. The disclosure further concerns a method for designing and/or manufacturing the actuator module.


The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system, the system including at least one probe head, the probe head comprising a probe tip arranged on a cantilever and a tip position detector for determining a position of the probe tip along a z- direction transverse to an image plane, the method comprising: positioning the at least one probe head relative to the substrate surface; moving the probe tip and the substrate surface relative to each other in one or more directions parallel to the image plane for scanning of the substrate surface with the probe tip; and determining the position of the probe tip with the tip position detector during said scanning for mapping nanostructures on the substrate surface; wherein said step of positioning is performed by placing the at least one probe head on a static carrier surface.


Patent
Koninklijke KPN N.V. and Tno | Date: 2017-03-01

System and method for making a vertical handover decision between first and second networks using a terminal configured to attach to both networks and a fixed point in either network. Both networks allow information flow between the terminal and the fixed point. When attached to the first network the terminal detects the second and compares a first bandwidth measurement, representing available bandwidth along a first path between the terminal and the fixed point, to a second bandwidth measurement representing available bandwidth along a second path between the terminal and the fixed point. The terminal maintains attach to the first network if the first bandwidth measurement is higher than the second bandwidth measurement and makes a decision to handover to the second network if the second band width measurement is higher than first bandwidth measurement.


The invention is directed at a method of manufacturing a stacked organic light emitting diode - OLED - device. The method comprises the steps of providing a carrier (9) and forming a first organic light emitting diode (9) on the carrier by means of solution based depositing of consecutive diode layers of said first organic light emitting diode. The method further comprises forming one or more charge injection layers (12, 14) on the first organic light emitting diode and forming a second organic light emitting diode (16) on the carrier by means of solution based depositing of consecutive diode layers of said second organic light emitting diode. The step of forming of the one or more charge injection layers comprises a step of performing atomic layer deposition for depositing at least one of the one or more charge injection layers. The invention further relates to an apparatus for manufacturing a stacked OLED and to a stacked OLED device.


The invention is directed at an exposure head for use in an exposure apparatus for illuminating a surface, the exposure head comprising one or more radiative sources for providing one or more beams, an optical scanning unit arranged for receiving the one or more beams and for directing the beams towards the surface for impinging each of the beams on an impingement spot, a rotation actuating unit connected to the optical scanning unit for at least partially rotating the optical scanning unit, wherein the impingement spots of the one or more beams are scanned across the surface by said at least partial rotation of the optical scanning unit, wherein the optical scanning unit comprises a transmissive element including one or more facets for receiving the one or more beams and for outputting the beams after conveying thereof through the transmissive element, for displacing the beams upon said rotation of the transmissive element for enabling the scanning of the impingement spots.


Patent
Tno | Date: 2017-05-03

Plasma source and surface treatment method. A plasma source has an outer surface (12), interrupted by an aperture (14) for delivering an atmospheric plasma from the outer surface. A transport mechanism (11) transports a substrate (10) in parallel with the outer surface, closely to the outer surface, so that gas from the atmospheric plasma may form a gas bearing between the outer surface the and the substrate. A first electrode (16a,b) of the plasma source has a first and second surface extending from an edge of the first electrode that runs along the aperture. The first surface defines the outer surface on a first side of the aperture. The distance between the first and second surface increasing with distance from the edge. A second electrode (17) covered at least partly by a dielectric layer (18) is provided with the dielectric layer facing the second surface of the first electrode, substantially in parallel with the second surface of the first electrode, leaving a plasma initiation space on said first side of the aperture, between the surface of the dielectric layer and the second surface of the first electrode. A gas inlet (19a,b) feeds into the plasma initiation space to provide gas flow from the gas inlet to the aperture through the plasma initiation space. Atmospheric plasma initiated in the plasma initiation space flows to the aperture, from which it leaves to react with the surface of the substrate.


A fluid density measuring device uses a pipe with a pipe wall that has an inner wall surface with a non-circular cross-section at least in an axial segment of the pipe. Preferably, the inner wall surface comprises one or more protrusions extending inward into the pipe and along the axial direction of the pipe. An ultrasound transducer located on the pipe wall is used to generate local motion of the pipe wall with a circumferential direction of motion. Preferably, the ultrasound transducer is located between successive protrusions. An ultrasound receiver located on the pipe wall receives an ultrasound torsion wave generated by said local motion after the torsion wave has traveled through the axial section wherein the inner wall surface has a non-circular cross-section. The fluid density is determined from the propagation speed of the torsion wave.


This document describes a method of determining an overlay error during manufacturing of a multilayer semiconductor device. Manufacturing of the semiconductor device comprises forming a stack of material layers comprising depositing of at least two subsequent patterned layers (26, 27) of semiconductor material, the patterned layers comprising a first patterned layer (26) having a first marker element (29) and a second patterned layer (27) having a second marker element (37). The determining of the overlay error comprises determining relative positions of the first and second marker element in relation to each other, such as to determine the overlay error between the first patterned layer and the second patterned layer. In addition an imaging step is performed on at least one of said first and second patterned layer, for determining relative positions of the respective first (29) or second (37) marker element and a pattern feature of a device pattern (30, 36) comprised by said respective first (26) and second (27) patterned layer.


Patent
Tno | Date: 2017-03-08

The invention relates to a gas desorption unit and a process for desorbing gas absorbed in an absorption liquid, and a gas separation process. A gas desorption unit, comprising an assembly of plates, wherein plates comprise a corrugated part comprising ridges and valleys, and a first channel there between, adapted for counter-current flow of said gaseous and liquid stream in said first channel, and a said second channel for a liquid stream in counter-current flow with the liquid stream in the first channel, wherein a first channel comprises a corrugated part of a first plate comprising ridges crossing with ridges of the corrugated part of a second plate, and wherein a second channel comprises ridges of a corrugated part of a second plate comprising ridges aligned with valleys of a corrugated part of a third plate.

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