Advanced Technology Development Division

Taipei, Taiwan

Advanced Technology Development Division

Taipei, Taiwan
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Hsieh C.-I.,Advanced Technology Development Division | Jao J.-H.,Nanya Technology Corporation | Chen W.-C.,Advanced Technology Development Division | Wu C.-R.,Advanced Technology Development Division | Shih N.-T.,Advanced Technology Development Division
International Symposium on VLSI Technology, Systems, and Applications, Proceedings | Year: 2011

In terms of defect generation and redistribution, the electrical forming process and filamentary conduction lead conventional RRAM cells to low yield, high operation current, and large operation variations [13]. Recently, emerging RRAM cells based on the redox reaction mechanism were proposed to eliminate electrical forming process [4]. However, the endurance was below few thousands cycles and device reliability still remained issues. Moreover, variations in operation parameters and device characteristics could not be avoided unless complex material engineering and film stacks were conducted [5, 6]. In this work, we fabricated TiN/TiOx/TiN RRAM cells with a oxygen injection (OI) treatment to place excess oxygen ions into TiOx films and characterized their forming-free and bi-polar resistive switching. Maximum resistance ratio is above 104 and low set/reset current density is lower than 10 nA/um2. The capability of various resistance sates shows highly potential of multi level cell (MLC). Then resistive switching is also discovered by structural and electrical analyses showing the excess oxygen occupations of vacancies in TiOx layers. © 2011 IEEE.

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