Sumitomo Heavy Industries | Date: 2015-06-23
Disclosed is a power transmission apparatus that is cooled by airflow sent from a fan and includes fins provided on side surfaces of a casing. The fins include upstream fins close to the fan and downstream fins distant from the fan. An interval between the upstream fins is smaller than an interval between the downstream fins.
Sumitomo Heavy Industries | Date: 2015-04-22
A beamline unit of an ion implanter includes a steering electromagnet, a beam scanner, and a beam collimator. The beamline unit contains a reference trajectory of an ion beam. The steering electromagnet deflects the ion beam in an x direction perpendicular to a z direction. The beam scanner deflects the ion beam in the x direction in a reciprocating manner to scan the ion beam. The beam collimator includes a collimating lens that collimates the scanned ion beam in the z direction along the reference trajectory, and the collimating lens has a focus at a scan origin of the beam scanner. A controller corrects a deflection angle in the x direction in the steering electromagnet so that an actual trajectory of the deflected ion beam intersects with the reference trajectory at the scan origin on an xz plane.
Sumitomo Heavy Industries | Date: 2015-04-24
An ion implantation apparatus includes a beam scanner, a beam measurement unit that is able to measure an ion irradiation amount distribution in a beam scanning direction at a wafer position, and a control unit that outputs a control waveform to the beam scanner for scanning an ion beam. The control unit includes an output unit that outputs a reference control waveform to the beam scanner, an acquisition unit that acquires the ion irradiation amount distribution measured for the ion beam scanned based on the reference control waveform from a beam measurement unit, and a generation unit that generates a correction control waveform by using the acquired ion irradiation amount distribution. The control unit outputs the correction control waveform so that the ion irradiation amount distribution becomes a target distribution and the ion irradiation amount distribution per unit time becomes a target value.
Sumitomo Heavy Industries | Date: 2015-01-20
A construction machine includes a first hydraulic pump, a second hydraulic pump, and a hydraulic circuit. The first hydraulic pump supplies hydraulic oil to a hydraulic actuator of a first system. The second hydraulic pump supplies the hydraulic oil to a hydraulic actuator of a second system. The hydraulic circuit supplies the hydraulic oil flowing out from at least one of the hydraulic actuators of the first and second systems to the intake side or the discharge side of at least one of the first and second hydraulic pumps. At least one of the first and second hydraulic pumps operates as a hydraulic motor so as to assist the other of the first and second hydraulic pumps that operates as a hydraulic pump.
Sumitomo Heavy Industries | Date: 2015-08-07
An ion implanter includes: a beam deflector that deflects an ion beam passing through a previous stage beam path and outputs the beam to pass through a subsequent stage beam path toward a wafer; a beam filter slit that partially shields the beam traveling through the subsequent stage beam path and allows passage of a beam component having a predetermined trajectory toward the wafer; a dose cup that is disposed between the beam deflector and the beam filter slit and measures a part of the beam exiting from the beam deflector as a beam current; and a trajectory limiting mechanism that is disposed between the beam deflector and the dose cup and prevents a beam component having a trajectory deviated from the predetermined trajectory from being incident to a measurement region of the dose cup.