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Yong-Peng Z.,Harbin Institute of Technology | Qiang X.,Harbin Institute of Technology | Yang L.,Harbin Institute of Technology | Gang W.,Harbin Institute of Technology | And 3 more authors.
2011 Academic International Symposium on Optoelectronics and Microelectronics Technology, AISOMT 2011 | Year: 2011

Spectra have been recorded from a Xe discharge capillary discharge source in the extreme ultraviolet (EUV) region between 10nm and 70nm. The origin of the spectra have been analyzed, which have shown that the spectra between 10nm and 20nm come from the transitions of 4p-4d, 4d-4f and 4d-5p by Xe 7+∼Xe 12+, and the spectra between 20nm∼70nm mainly from the transitions of Xe 6+∼Xe 8+ as well. The results which have been integrated the experimental results with the theory have shown that the spectra from Xe 6+∼Xe 8+ formed in the time after the collapsed of the compressing of the plasma. © 2011 IEEE.


Xu W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Xu W.,State Key Laboratory of Applied Optics | Huang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Huang W.,State Key Laboratory of Applied Optics | And 4 more authors.
Optics Express | Year: 2013

Clocking of lens elements is frequently used as an effective method of compensating for two-dimensional tolerances such as material inhomogeneity and surface figure errors. Typically, the lens designer has to determine the optimum angles of rotation by manually modeling lens element clocking in the commercial optical design software because the nature of errors resolved by lens clocking does not lead to good convergences for clocking optimization. In this paper, a method of automatic clocking optimization is developed. The method is implemented using a combination of particle swarm optimization algorithm and commercial optical design software. The optimum angles of rotation and predicted imaging performance are automatically calculated using this method. Methods of implementation and optimization examples are also given. © 2013 Optical Society of America.


Rui D.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Rui D.,State Key Laboratory of Applied Optics | Zhang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Yang H.,CAS Changchun Institute of Optics and Fine Mechanics and Physics
Optical Engineering | Year: 2015

Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method. © 2015 Society of Photo-Optical Instrumentation Engineers (SPIE).


Tang Z.-X.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Tang Z.-X.,University of Chinese Academy of Sciences | Huang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Huang W.,State Key Laboratory of Applied Optics | And 4 more authors.
Chinese Optics | Year: 2014

In order to realize the high precise wavefront test of large-aperture collimator and evaluate its wavefront quality, the method of differential pentaprism scanning wavefront detection is proposed in this paper. This method is the optimization of pentaprism scanning detection. Firstly, the information of wavefront curvature is obtained by measuring wavefront slope change to reconstruct the wavefront. The title and defocus error instructed by inaccurate calibration of center of mass are eliminated. Secondly, the differential pentaprism scanning wavefront detection system is established to verify the feasibility of this method. Lastly, the error analysis is given. The error analysis shows that the testing precise of this method is 10.54 nm. The experimental results show that the repeatability precisions of wave peak and valley value(PV) and root mean square(RMS) are increased by 74.41% and 125.81% compared with pentaprism scanning method. This method basically meets the requirements of high accuracy and good stability for collimator wavefront detection, which can be used to evaluate the quality of collimator wavefront. ©, 2014, Editorial Office of Chinese Optics. All right reserved.


Jun L.,University of Chinese Academy of Sciences | Jun L.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Jun L.,State Key Laboratory of Applied Optics | Huang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | And 3 more authors.
Optics Communications | Year: 2016

A novel method for finding the initial structure parameters of an optical system via the genetic algorithm (GA) is proposed in this research. Usually, optical designers start their designs from the commonly used structures from a patent database; however, it is time consuming to modify the patented structures to meet the specification. A high-performance design result largely depends on the choice of the starting point. Accordingly, it would be highly desirable to be able to calculate the initial structure parameters automatically. In this paper, a method that combines a genetic algorithm and aberration analysis is used to determine an appropriate initial structure of an optical system. We use a three-mirror system as an example to demonstrate the validity and reliability of this method. On-axis and off-axis telecentric three-mirror systems are obtained based on this method. © 2015 Published by Elsevier B.V.


Xu X.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Xu X.,University of Chinese Academy of Sciences | Huang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Huang W.,State Key Laboratory of Applied Optics | And 2 more authors.
Optics Express | Year: 2015

Optical lithography has approached a regime of high numerical aperture and wide field, where the impact of polarization aberration on imaging quality turns to be serious. Most of the existing studies focused on the distribution rule of polarization aberration on the pupil, and little attention had been paid to the field. In this paper, a new orthonormal set of polynomials is established to describe the polarization aberration of rotationally symmetric optical systems. The polynomials can simultaneously reveal the distribution rules of polarization aberration on the exit pupil and the field. Two examples are given to verify the polynomials. © 2015 Optical Society of America.


Xu X.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Xu X.,University of Chinese Academy of Sciences | Huang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Huang W.,State Key Laboratory of Applied Optics | And 2 more authors.
Optics Express | Year: 2016

Polarization aberration (PA) is a serious issue that affects imaging quality for optical systems with high numerical aperture. Numerous studies have focused on the distribution rule of PA on the pupil, but the field remains poorly studied. We previously developed an orthonormal set of polynomials to reveal the pupil and field dependences of PA in rotationally symmetric optical systems. However, factors, such as intrinsic birefringence of cubic crystalline material in deep ultraviolet optics and tolerance, break the rotational symmetry of PA. In this paper, we extend the polynomials from rotationally symmetric to M-fold to describe the PA of M-fold optical systems. Two examples are presented to verify the polynomials. © 2016 Optical Society of America.


Huang W.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Xu X.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Xu M.,CAS Changchun Institute of Optics and Fine Mechanics and Physics | Xu W.,State Key Laboratory of Applied Optics | Tang Z.,University of Chinese Academy of Sciences
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2014

A comprehensive polarization aberration function is proposed to evaluate the imaging quality of a perturbed high NA lithographic lens. In this function, the system polarization aberration, i.e. Jones matrix, is decomposed into several basic parts as wavefront aberration, apodization, diattenuation, retardance and rotation by single value decomposition (SVD). The wavefront aberration is described by field-Zernike polynomials (FZP), and the diattenuation, as well as retardance, is described by field-orientation Zernike polynomials (FOZP). The relationship of system polarization aberration with pupil, field and manufacturing errors is established by an approximately analytical equation, which provides a possible way to analyze lens tolerance for polarization aberration. © 2014 SPIE.

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