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Peng S.,State Key Laboratory of Advanced Technology for Float Glass | Peng S.,Bengbu Glass Industry Design and Research Institute | Cao F.,State Key Laboratory of Advanced Technology for Float Glass | Cao F.,Bengbu Glass Industry Design and Research Institute | And 2 more authors.
Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering | Year: 2014

A series of novel Fe3+/TiO2 nano-films were synthesized by sol-gel method. The as-synthesized products were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-visible spectrophotometer. Influence of Fe doping content, storage time and film layers on the hydrophilicity of the film was investigated by contact goniometer. The photocatalytic activity of the film was evaluated by photocatalytic degradation of methylene blue under the UV light (8 W, λ=254 nm) irradiation. The results indicate that when the doping content of F3+ is 0.5% (mass fraction), the photocatalytic activity of the TiO2 film is greatly promoted; furthermore, it also shows the best hydrophilicity, with the contact angle between water and the film approximating 0°. ©, 2014, Tianjin University. All right reserved.


Meng F.,Ningbo Institute of Materials Technology and Engineering | Peng S.,State Key Laboratory of Advanced Technology for Float Glass | Peng S.,BengBu Design and Research Institute for Glass Industry | Xu G.,State Key Laboratory of Advanced Technology for Float Glass | And 5 more authors.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | Year: 2015

The role of negative ions in the sputter deposition of oxides can be termed negative in the sense that they typically cause radiation-induced structural damage during film growth. For magnetron sputtered Al-doped ZnO (AZO) films, efforts have been made to alleviate the radiation damage by decreasing the discharge voltage being the lower limit explored. Here, the authors report initial results of depositing highly conductive and transparent AZO films by reducing down to 40V. The deposition was performed by sputtering an AZO target using dense magnetron discharges, in which an 81MHz radio frequency power was superimposed onto a DC power applied to the cathode. The authors found an optimal window within which high quality AZO films, with a <4×10-4 Ω cm resistivity, >30cm2/(V s) Hall mobility, and >88% visible transmittance, were obtained at relatively high deposition rates (>30nm/min). Based on the corresponding structural features, i.e., a full mass density coupled with a slight c-axis contraction along the out-of-plane direction, energetic negative ions were identified to have dominated in the structural evolution. The window was then interpreted in terms of two competitive kinetic processes simultaneously caused by the energetic negative ions: void reduction via ballistic relocation of atoms as well as residual radiation-induced damage. The findings thus reveal a positive role (i.e., concomitant densification) played by the negative ions in growing high quality fully dense AZO films, which has been overshadowed by the excessive radiation damage induced by ions with relatively higher energies. © 2015 American Vacuum Society.


Wang Y.,University Of Science And Technology Liaoning | Wang Y.,Dalian Jiaotong University | Ding W.,Dalian Jiaotong University | Jiang W.,Dalian Jiaotong University | And 3 more authors.
Ceramics International | Year: 2015

Abstract Surface textured ZnO:Al (AZO) films with good optoelectronic and light trapping properties were prepared on glass substrates by direct current pulse magnetron sputtering followed by a wet chemical etching process in NaOH solution (5 wt%) at room temperature. The influence of working pressure on different properties of AZO films including etching rate, structural and optoelectronic properties, light trapping ability as well as etching behavior was studied in detail. Different surface features were observed with the increasing of working pressure. The relationship between surface textured structure and working pressure was discussed. The etched AZO film deposited at 0.8 Pa exhibited uniformly and distinctly crater-like surface textured structure, which is an effective textured surface for light trapping. Correspondingly, for the etched AZO film deposited at 0.8 Pa, high visible optical transparence, electrical conductivity and haze value were also achieved. © 2015 Elsevier Ltd and Techna Group S.r.l.


Wang Y.,University Of Science And Technology Liaoning | Wang Y.,Dalian Jiaotong University | Ding W.,Dalian Jiaotong University | Wang H.,Dalian Jiaotong University | And 3 more authors.
Materials Letters | Year: 2015

Abstract Double-textured ZnO:Al (AZO) transparent conducting films were prepared successfully by a novel method, including the process of deposition, etching and re-deposition. Only one-step etching process was adopted during the whole procedure, and NaOH solution (5 wt%) was employed as the etchant. Double-textured AZO films exhibited higher haze values when the working pressures of deposition and re-deposition process were different. Effective improvement of light trapping was obtained from the double-textured AZO films prepared by this method. For the double-textured AZO films, the resistivity kept the order of 10-3 Ω cm. The double-textured AZO films prepared by the novel method, which can be used as front electrodes, have potential application in thin film solar cells for light trapping. © 2015 Published by Elsevier B.V.


Wang Y.,Dalian Jiaotong University | Jiang W.,Dalian Jiaotong University | Ding W.,Dalian Jiaotong University | Wang Y.,State Key Laboratory of Advanced Technology for Float Glass | And 2 more authors.
Optoelectronics and Advanced Materials, Rapid Communications | Year: 2012

Transparent conductive ZnO:Al films with various thicknesses between 40 and 500 nm were deposited by direct current pulse magnetron sputtering at 270°C. The influence of film thickness on the crystal structure, surface morphology, optoelectronic properties was analyzed systematically. The crystal quality and the electrical properties of the films were improved with the increase of film thickness. The average transmittances in the visible region of all the films were over 90% regardless of film thickness. And the transmittance in the UV region decreased with increasing the film thickness. The grain size and roughness of films increased with the increasing film thickness.

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