Yongin si, South Korea
Yongin si, South Korea

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Patent
Samsung and Soulbrain Co. | Date: 2015-08-12

Etching compositions are provided. The etching composition includes a phosphoric acid, ammonium ions and a silicon compound material. The silicon compound material includes a silicon atom, at least one selected from the group of a nitrogen atom, a phosphorus atom and a sulfur atom combined with the silicon atom, and at least two oxygen atoms combined with the silicon atom. Methods utilizing the etching compositions are also provided.


Provided are an electrolyte solution for lithium secondary battery, which includes dipentaerythritol hexaacrylate and a (meth)acrylate compound having a C_(4 )to C_(12 )linear or branched alkyl group as electrolyte additives, and a lithium secondary battery including the electrolyte solution. The electrolyte solution can improve the safety of the battery, and the performance characteristics, particularly cycle life characteristics, of the battery.


An etching composition that includes, based on the total weight of the etching composition, from about 0.05% to about 15% by weight of a halogen-containing compound, from about 0.1% to about 20% by weight of a nitrate compound, from about 0.1% to about 10% by weight of an acetate compound, from about 0.1% to about 10% by weight of a cyclic amine compound, from about 0% to about 50% by weight of a polyhydric alcohol, and a remainder of water.


Provided is a reagent composition for measuring moisture content in a lithium secondary battery electrolyte, more particularly, a reagent composition for measuring moisture content in a lithium secondary battery electrolyte, containing imidazole, iodine, sulfur dioxide, and an amide based solvent, so that the reagent composition can suppress side reactions to thereby accurately measure a small amount of moisture content.


Provided are a method for measuring hydrofluoric acid content in a lithium secondary battery electrolyte and an analytical reagent composition used in the same.


Patent
Soulbrain Co. | Date: 2015-07-10

The disclosure is related to a composition for etching, a method for manufacturing the composition, and a method for fabricating a semiconductor using the same. The composition may include a first inorganic acid, at least one of silane inorganic acid salts produced by reaction between a second inorganic acid and a silane compound, and a solvent. The second inorganic acid may be at least one selected from the group consisting of a sulfuric acid, a fuming sulfuric acid, a nitric acid, a phosphoric acid, and a combination thereof.


The present disclosure herein relates to methods of forming conductive patterns and to methods of manufacturing semiconductor devices using the same. In some embodiments, a method of forming a conductive pattern includes forming a first conductive layer and a second conductive layer on a substrate. The first conductive layer and the second conductive layer may include a metal nitride and a metal, respectively. The first conductive layer and the second conductive layer may be etched using an etchant composition that includes phosphoric acid, nitric acid, an assistant oxidant and a remainder of water. The etchant composition may have substantially the same etching rate for the metal nitride and the metal.


Patent
Soulbrain Co. and SK hynix | Date: 2012-12-07

The present invention provides an etching composition, comprising a silyl phosphate compound, phosphoric acid and deionized water, and a method for fabricating a semiconductor, which includes an etching process employing the etching composition. The etching composition of the invention shows a high etching selectivity for a nitride film with respect to an oxide film. Thus, when the etching composition of the present invention is used to remove a nitride film, the effective field oxide height (EEH) may be easily controlled by controlling the etch rate of the oxide film. In addition, the deterioration in electrical characteristics caused by damage to an oxide film or etching of the oxide film may be prevented, and particle generation may be prevented, thereby ensuring the stability and reliability of the etching process.


Provided are an electrolyte additive represented by the following formula (1), an electrolyte solution containing the electrolyte additive, and a lithium secondary battery including the electrolyte solution: The electrolyte solution containing the electrolyte additive can enhance the normal-temperature and high-temperature lifetime characteristics of the battery to be equivalent or superior to the characteristics of conventional batteries, and can extend the service life of the battery.


Etching compositions are provided. The etching composition includes a phosphoric acid, ammonium ions and a silicon compound. The silicon compound includes a silicon atom, an atomic group having an amino group combined with the silicon atom, and at least two oxygen atoms combined with the silicon atom. Methods utilizing the etching compositions are also provided.

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