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Fang X.-S.,Sichuan Xinguang Silicon Technology Co. | Liu Y.,Sichuan Xinguang Silicon Technology Co. | Chen J.,Sichuan Xinguang Silicon Technology Co. | Luo X.-F.,Sichuan Xinguang Silicon Technology Co. | And 2 more authors.
Xiandai Huagong/Modern Chemical Industry | Year: 2012

To improve the distillation tower top temperature, silicon tetrachloride (STC) with the volume ratio of 0.9%-20.3% is added to the feedstock trichlorosilane (TCS). The flow rate of gas mixture and the surface temperature of silicon rod are adjusted to weaken the adverse effect of addition of STC on the deposition rate of silicon. The amount of STC in the vent gas is significantly decreased and the quality of poly-silicon and the deposition rate of silicon have no obvious change. Under the optimal conditions, the mass ratio of STC in the inlet gas is increased from 4.21 w% to 18.11 w%, and that of the vent gas is decreased from 32.05 w% to 25.62 w%. The increase rate of STC mass ratio in the vent gas is reduced from 6.61 to 0.41.

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