Shincron Co.

Yokohama-shi, Japan

Shincron Co.

Yokohama-shi, Japan
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A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11, in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end and a pressurizing means (a gas supply source 29, etc.) for pressurizing a liquid surface of a coating agent 21 stored in the storage container 23. A solution, which includes two or more kinds of materials including a first material (S1) and a second material (S2) having a higher vapor pressure (P2) than a vapor pressure (P1) of the S1 and has a concentration of the first material being 0.01 wt % or more, is used as the coating agent 21. The coating agent 21 is ejected to a substrate in an atmosphere with a pressure of P2 or higher (excepting pressures higher than P2 by one digit or more) and with an ejection pressure of 0.05 to 0.3 MPa.


A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials is used as the coating agent 21. The solution is ejected to the substrate in an atmosphere at a pressure set based on vapor pressures of respective materials composing the solution.


A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials including a first material (S1) and a second material (S2) having a higher vapor pressure (P2) than a vapor pressure (P1) of the Si is used as the coating agent 21. The coating agent 21 is ejected to the substrate in an atmosphere with a pressure higher than P1 and lower than P2.


Provided are a thin film formation apparatus, a sputtering cathode, and a method of forming thin film, capable of forming a multilayer optical film at a high film deposition rate on a large-sized substrate. The thin film formation apparatus 1 forms a thin film of a metal compound on a substrate 43 in a vacuum chamber 21 by sputtering. The vacuum chamber 21 is provided in its inside with targets 63a and b composed of metal or a conductive metal compound, and an active species source for generating an active species of a reactive gas, arranged to produce mutual electromagnetic and pressure interactions with the targets 63a and b. The active species source is provided with gas sources 76 and 77 for supplying the reactive gas, and an energy source 80 for supplying energy into the vacuum chamber to excite the reactive gas to a plasma state. The energy source 80 is provided between itself and the vacuum chamber 21 with a dielectric window for supplying the energy into the vacuum chamber 21. The dielectric window is arranged in parallel with the substrate 43, or in such a way as inclining towards the targets 63a and b side with an angle of less than 90 to the substrate 43.


Patent
Shincron Co. | Date: 2016-02-29

The method for depositing a film of the present invention comprises the first film deposition step of depositing a first film 103 having hardness higher than hardness of a substrate 101 on a surface of the substrate 101, the first irradiation step of irradiating particles having energy on the first film 103, and the second film deposition step of depositing an oil-repellent film 105 on a surface of the first film 103 subjected to the first irradiation step. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.


Patent
Shincron Co. | Date: 2014-08-06

Provided is a film formation apparatus with which an anti-fouling film having high usability and antiwear performance may be formed efficiently. According to a film formation apparatus (1) of the present invention, a substrate holder (12) which comprises a basal body holding surface for folding a plurality of substrates (14) is disposed in a vacuum container (10) in a rotatable manner. The film formation apparatus (1) comprises an evaporation source (34) which is disposed in the vacuum container (10) in such a manner that a larger amount of film formation material may be supplied to a first area (A3) that is part of the basal body holding surface than to an area other than the first area (remaining area) when operated toward the substrate holder (12) in a rotation stop state; and an ion source (38) which is disposed in the vacuum container (10) in such a manner, arrangement, and/or direction that energetic particle irradiation may be made toward only a second area (A2) that is part of the basal body holding surface when operated toward the substrate holder (12) in the rotation stop state.


Patent
Shincron Co. | Date: 2014-12-24

A translucent hard thin film having high transmissivity and film strength is provided. The translucent hard thin film of the present invention is composed of a laminated film 102 formed on a substrate S surface, wherein the laminated film 102 has a superlattice structure obtained by stacking a plurality of SiO_(2) layer 104 and SiC layers 106 alternately and the entire film thickness is 3000nm or more. A film thickness per layer is 5 to 30nm in a SiC layer and 30% to 60% of that of the SiO_(2) layer in a SiC layer.


Patent
Shincron Co. | Date: 2014-08-06

A method for depositing a film is provided, which enables to deposit an oil repellent film having an enhanced abrasion resistance properties not to mention being good enough for practical use. A film deposition system 1, wherein a substrate holder 12 having a substrate holding surface for holding a plurality of substrates 14 is provided rotatably to inside a vacuum container 10, is configured to comprise an ion source 38 provided to inside the vacuum container 10 to have a configuration and in an arrangement and/or a direction, by which an ion beam can be irradiated only to a partial region of the substrate holding surface, and a deposition source 34 provided to inside the vacuum container 10 in an arrangement and a direction, so that a film deposition material of an oil repellent film can be supplied to the whole region of the substrate holding surface; wherein an operation of the ion source 38 is stopped before starting an operation of the deposition source 34.


Patent
Shincron Co. | Date: 2016-11-02

Provided is an oil diffusion pump equipped with an oil vapor generator capable of eliminating a problem that arises when a heater wire is used as a heating source for a hydraulic oil. The oil diffusion pump is a vacuum pump in which an oil vapor generator (70) is arranged in a casing (51) and operated to vaporize a hydraulic oil (8) and produce oil vapor, and this oil vapor is sprayed from a jet (53, 53a) to exhaust an intake air. The oil vapor generator (70) comprises a tubular case (71) (object to be heated) extending in an upright direction, an induction coil (75) wound around the tubular member (71) via an insulating material (73), and a power supply means for applying an alternating current to the induction coil (75). The case (71) and the coil (75) are installed in the casing so as to be immersed in the hydraulic oil (8) stored in the casing (51). The power supply means is operated to apply an alternating current to the induction coil (75) to heat the case (71) itself and thus vaporize the hydraulic oil (8).


Patent
Shincron Co. | Date: 2016-01-20

Provided is an oil diffusion pump equipped with an oil vapor generator capable of eliminating the problems occurring when a heater wire is used as a heating source for an operating oil. The present invention is a vacuum pump for which an oil vapor generator (70) is arranged within a casing (51) and this oil vapor generator is operated to vaporize an operating oil (8), thereby producing oil vapor and this oil vapor is sprayed from a jet (53, 53a) to exhaust intake air. The oil vapor generator (70) is equipped with: a container (71, 72) in the interior of which oil is stored, with the lower end of the tubular member (71), which comprises a material to be heated, being closed; and induction coil (75) wrapped around the atmosphere-side perimeter of the tubular member (71) (in particular, the case inner wall (71b)) with an insulating material (73) therebetween; and a power supply means that applies a low-frequency alternating current of several tens of Hz to several hundreds of Hz to the induction coil (75). The configuration is such that the tubular member (71) itself is heated when the power supply means is operated and the low-frequency alternating current is applied to the induction coil (75), thereby vaporizing the oil within the container.

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