Shin - Etsu Chemical Co.

www.shinetsu.co.jp
Fukui, Japan

Shin-Etsu Chemical Co., Ltd. is the largest chemical company in Japan, ranked No. 9 in Forbes Global 2000 for chemical sector. Shin-Etsu has the largest global market share for polyvinyl chloride, semiconductor silicon, and photomask substrates.The company was named one of Thomson Reuters Top 100 Global Innovators in 2011, 2012, 2013 and 2014.“Shin-Etsu” in the company's name derives from Shin'etsu Region, where the company established the first chemical plant as Shin-Etsu Nitrogen Fertilizer in 1926, though the company today is headquartered in Tokyo and has its manufacturing locations in 14 countries worldwide. Wikipedia.

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Patent
Exatec LLC. and Shin - Etsu Chemical Co. | Date: 2017-04-19

An organic resin laminate comprising an organic resin substrate and a multilayer coating system on a surface of the substrate is provided. The multilayer coating system can include a plasma layer which is a dry hard coating obtained from plasma polymerization of an organosilicon compound, and an intermediate layer (II) on the substrate which is a cured coating of a wet coating composition comprising (A) a specific reactive UV absorber, (B) a multi-functional (meth)acrylate, and (C) a photopolymerization initiator. (B) a multifunctional (meth)acrylate, and (C) a photopolymerization initiator. The laminate has a high level of abrasion resistance and improved adhesion and weather resistance.


Patent
Shin - Etsu Chemical Co. | Date: 2017-01-26

A photo-curable composition having superior curability at room temperature and storage stability, and also offer a rubber-like cured product thereof having a good profile of properties including heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance. Specifically, A photo-curable composition which includes (A) 100 parts by mass of a linear polyfluoro compound having at least two alkenyl groups in a molecule and a linear perfluoropolyether structure in a backbone of the molecule, (B) a fluorine-containing organohydrogenpolysiloxane having at least two hydrogens bonded to a silicon atom in a molecule, and (C) 0.1 to 500 ppm of a photoactive hydrosililation catalyst relative to the mass of component (A) in terms of metal atom, wherein an amount of component (B) is 0.5 to 3.0 mol of SiH groups in component (B) relative to 1.0 mol of alkenyl groups in component (A).


Patent
Shin - Etsu Chemical Co. | Date: 2017-05-17

A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R^(1)-R^(6) are monovalent hydrocarbon groups, X^(1) is a divalent hydrocarbon group, Z^(1) is an aliphatic group, Z^(2) forms an alicyclic group, k = 0 or 1, m = 1 or 2, n = 1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.


Patent
Shin - Etsu Chemical Co. | Date: 2017-05-17

First, at least one of silanol and a siloxane compound is generated in a chlorosilane (S101). In the step, for example, an inert gas having a moisture concentration of 0.5 to 2.5 ppm is brought into contact with the chlorosilane to dissolve the moisture, and at least one of silanol and a siloxane compound is generated through a hydration reaction of a moiety of the chlorosilane. Next, a boron-containing compound contained in the chlorosilane is reacted with the silanol or the siloxane compound, thereby converting the boron-containing compound to a boron oxide (S102). Through the step (S102), the boron-containing compound being a low boiling point compound is converted to a boron oxide being a high boiling point compound, and therefore the difference in boiling point from the boiling point of chlorosilane becomes larger to make later separation easy.


Patent
Shin - Etsu Chemical Co. | Date: 2017-05-17

The present invention provides a silicone compound shown by the formula (1) and having a weight-average molecular weight in the range of 500 to 200,000, R^(1)_(a)R^(2)_(b)R^(3)_(c)R^(4)_(d)SiO_((4-a-b-c-d)/2) (1), wherein R^(1) represents the same or different organic group, R^(2) represents a polyoxyalkylene group shown by -C_(m)H_(2m)-O-(C_(2)H_(4)O)_(g)(C_(3)H_(6)O)_(h)R^(6), R^(3) represents a branched type monovalent organosiloxane group shown by the following general formula (4), M_(o)M^(R)_(p)D_(q)D^(R)_(r)T_(s)T^(R)_(t)Q_(u) (4), and R^(4) represents a monovalent organosiloxane group shown by the following general formula (5) or the general formula (6), MM^(R)D_(v-i) (5), M_(w)D_(v-1)DR_(v-2)T^(R)_(v-3) (6). This provides a silicone compound which has excellent emulsification ability and emulsion stability to silicone oil, and can secure high temporal stability.


Patent
Shin - Etsu Chemical Co. | Date: 2017-09-20

Provided is an addition-curable silicone rubber composition in which a flame retardant has been added to a silicone rubber composition to improve the flame retardancy and, despite this, the physical properties of the silicone rubber serving as the base are unchanged. The addition-curable silicone rubber composition comprises (A) 100 parts by mass of an alkenyl-containing organopolysiloxane having at least two silicon-atom-bonded alkenyl groups in the molecule, (B) 0.2-20 parts by mass, per 100 parts by mass of component (A), of an organohydrogenpolysiloxane having at least two silicon-atom-bonded hydrogen atoms in the molecule, (C) 5-80 parts by mass, per 100 parts by mass of the sum of components (A) and (B), of a fine reinforcing silica powder having a specific surface area, as determined by the BET method, of 50 m^(2)/g or greater, (D) 0.001-1 part by mass of a triazole-based compound, (E) 0.001-5 parts by mass of a phosphoric ester compound, and (F) a catalytic amount of a platinum catalyst.


Patent
Shin - Etsu Chemical Co. | Date: 2017-09-20

Provided is a one-pack type ultraviolet-thickenable thermally conductive silicone grease composition which, at the initial stage, has a low viscosity (is easy to apply) but has high shape retentivity and which, after curing, is pliable (has low hardness). The ultraviolet-thickenable thermally conductive silicone grease composition comprises, as essential components, (A) an organopolysiloxane having a viscosity at 25C of 50-100,000 mPas and containing at least one alkenyl group in the molecule, (B) a liquid organohydrogenpolysiloxane which has a viscosity at 25C of 100 mPas or less, contains 2-10 silicon-atom-bonded hydrogen atoms in the molecule and contains at least one alkoxy and/or epoxy group bonded to a silicon atom through an alkylene group and in which the polysiloxane has a degree of polymerization of 15 or less and the skeleton of the polysiloxane includes a cyclic structure, (C) a photoactivable platinum complex curing catalyst, and (D) a thermally conductive filler having a thermal conductivity of 10 W/mC or greater.


Patent
Shin - Etsu Chemical Co. | Date: 2017-09-13

A cement mortar composition comprising a water-soluble cellulose ether, a tapioca starch derivative, cement, an aggregate and water has advantages including less change of flow with time, easy application with a trowel, short setting time and a reduction of construction time.


Patent
Shin - Etsu Chemical Co. | Date: 2017-09-20

The present invention is a solar cell having a P-type silicon substrate in which one main surface is a light-receiving surface and another main surface is a backside, a plurality of back surface electrodes formed on a part of the backside, an N-type layer in at least a part of the light-receiving surface of the P-type silicon substrate, and contact areas in which the P-type silicon substrate is in contact with the back surface electrodes; wherein the P-type silicon substrate is a silicon substrate doped with gallium; the P-type silicon substrate has a resistivity of 2.5 cm or less; and a back surface electrode pitch P_(rm) [mm] of the plurality of back surface electrodes and the resistivity R_(sub) [cm] of the P-type silicon substrate satisfy the relation represented by the following formula (1). This provides a solar cell and a solar cell module having excellent conversion efficiency with the resistance loss being prevented, with the solar cell using a substrate the light-induced degradation of which is eliminated.


Patent
Shin - Etsu Chemical Co. | Date: 2017-09-13

The present invention is a solar cell having a P-type silicon substrate in which one main surface is a light-receiving surface and another main surface is a backside, a dielectric film on the backside, and an N-conductivity type layer in at least a part of the light-receiving surface of the P-type silicon substrate, wherein the P-type silicon substrate is a silicon substrate doped with gallium, and the backside of the P-type silicon substrate contains a diffused group III element. This provides a solar cell with excellent conversion efficiency provided with a gallium-doped substrate, and a method for manufacturing the same.

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