Shin-Etsu Chemical Co., Ltd. is the largest chemical company in Japan, ranked No. 9 in Forbes Global 2000 for chemical sector. Shin-Etsu has the largest global market share for polyvinyl chloride, semiconductor silicon, and photomask substrates.The company was named one of Thomson Reuters Top 100 Global Innovators in 2011, 2012, 2013 and 2014.“Shin-Etsu” in the company's name derives from Shin'etsu Region, where the company established the first chemical plant as Shin-Etsu Nitrogen Fertilizer in 1926, though the company today is headquartered in Tokyo and has its manufacturing locations in 14 countries worldwide. Wikipedia.
Exatec LLC. and Shin - Etsu Chemical Co. | Date: 2017-04-19
An organic resin laminate comprising an organic resin substrate and a multilayer coating system on a surface of the substrate is provided. The multilayer coating system can include a plasma layer which is a dry hard coating obtained from plasma polymerization of an organosilicon compound, and an intermediate layer (II) on the substrate which is a cured coating of a wet coating composition comprising (A) a specific reactive UV absorber, (B) a multi-functional (meth)acrylate, and (C) a photopolymerization initiator. (B) a multifunctional (meth)acrylate, and (C) a photopolymerization initiator. The laminate has a high level of abrasion resistance and improved adhesion and weather resistance.
Shin - Etsu Chemical Co. | Date: 2016-06-14
A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.
Shin - Etsu Chemical Co. | Date: 2016-05-24
The present invention is a photo-curable resin composition containing (A) a silicone polymer compound having repeating units shown by the formulae (1) and (2), (B) a photosensitive acid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm, (C) one or more compounds selected from an amino condensate modified with formaldehyde or formaldehyde-alcohol, a phenol compound having on average two or more methylol groups or alkoxymethylol groups per molecule, and a polyhydric phenol compound whose phenolic hydroxyl group is substituted with a glycidoxy group, and (D) one or more compounds selected from polyhydric phenols having 3 or more hydroxyl groups. As a result, there is provided a photo-curable resin composition that can facilitate thick and fine patterning when the composition is used in patterning.
Shin - Etsu Chemical Co. | Date: 2016-11-02
The present invention includes a negative electrode active material for a non-aqueous electrolyte secondary battery, wherein the negative electrode active material is represented by an elemental composition formula of Met^(1)-Si-O-C-H (wherein Met^(1) represents one alkali metal element or a mixture of alkali metal elements), including: a silicate salt made of a silicon-based inorganic compound and the alkali metal, and fine particles composed of silicon, silicon alloy, or silicon oxide being dispersed in the silicate salt; and a negative electrode active material for a non-aqueous electrolyte secondary battery, wherein the negative electrode active material is represented by an elemental composition formula of Met^(2)-Si-O-C-H (wherein Met^(2) represents one alkaline earth metal element or a mixture of alkaline earth metal elements), including: a silicate salt made of a silicon-based inorganic compound and the alkaline earth metal.
Shin - Etsu Chemical Co. | Date: 2016-04-27
Provided are an alkyl cellulose excellent in formability when added even in a small amount and not causing marked delay in disintegration; a solid preparation comprising it; and a method for producing the solid preparation. More specifically, provided are an alkyl cellulose for use in tableting, the alkyl cellulose having a specific surface area of from 0.5 to 10.0 m^(2)/g as measured by BET method and a solid preparation comprising the alkyl cellulose. Also provided is a method for producing the alkyl cellulose, comprising the steps of: bringing pulp into contact with an alkali metal hydroxide solution to obtain alkali cellulose, reacting the alkali cellulose with an etherifying agent to obtain a first alkyl cellulose, pulverizing the first alkyl cellulose, and depolymerizing the pulverized first alkyl cellulose through hydrolysis with an acid catalyst or through oxidative decomposition with an oxidant to obtain a second alkyl cellulose.
Shin - Etsu Chemical Co. | Date: 2016-05-19
A fluoropolyether-containing polymer-modified silane having a hydroxyl group protected with a carbonyl, sulfonyl or phosphoryl group may be synthesized without forming by-products.
Shin - Etsu Chemical Co. | Date: 2016-05-04
The present invention provides a nanoparticle of an inorganic oxide particle being surface-treated, wherein: a primary particle size of the nanoparticle measured by a dynamic light scattering method is 8 nm or more and 30 nm or less, and the inorganic oxide particle is surface-treated in such a way that alkoxy groups having 1 to 10 carbon atoms are contained in a range of 0.001 to 0.5 mol/100 g. The inventive nanoparticle, being added to a silicone resin composition, enables the cured product thereof to possess excellent mechanical properties, transparency, crack resistance, heat resistance, and gas barrier properties, and enables the composition to have low viscosity and good workability even after the addition of the nanoparticle.
Shin - Etsu Chemical Co. | Date: 2016-06-29
Provided is a simple, selective and efficient method for producing 4-alkyl-3-methylenebutyl carboxylates such as 7-methyl-3-methylene-7-octenyl propionate. More specifically, provided is, for example, a method for producing a 4-alkyl-3-methylenebutyl carboxylate compound, comprising an acyloxylation step of subjecting a 1-(2-haloethyl)cyclopropyl sulfonate compound (1) to acyloxylation to obtain a 1-(2-acyloxyethyl)cyclopropyl sulfonate compound (2), a halogenation step of subjecting the compound (2) to halogenation involving cyclopropyl-allyl rearrangement to obtain a 3-halomethyl-3-butenyl carboxylate compound (3), and a coupling step of subjecting the compound (3) to a coupling reaction with an organometallic reagent (4) to obtain the 4-alkyl-3-methylenebutyl carboxylate compound (5).
Shin - Etsu Chemical Co. | Date: 2016-10-26
Shin - Etsu Chemical Co. | Date: 2016-03-09
A chemically amplified positive resist dry film to be formed on a support film contains 5-40 wt% of a component having a boiling point of 55-250C under atmospheric pressure. The resist dry film having flexibility and dimensional stability can be prepared through simple steps. The resist dry film can be efficiently and briefly laid on an article and processed to form a pattern.