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Patent
Shanghai Micro Electronics Equipment Co. | Date: 2015-07-03

A laser annealing apparatus for annealing a silicon wafer placed on a wafer stage is disclosed which includes: a laser light source for generating a light beam; a first optical unit, configured to convert the light beam generated by the laser light source into a polarized light beam of a first type; and a second optical unit, including a light guiding element and a first reflecting element. The light guiding element is configured to make the polarized light beam of the first type incident on and reflected by a surface of the silicon wafer for a first time along a first optical path, and the light beam reflected from the surface of the silicon wafer is further reflected by the first reflecting element and is thereby incident on the surface of the silicon wafer for a second time along a second optical path symmetrical to the first optical path and reflected by the surface to the light guiding element.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2016-11-02

A wafer edge protection apparatus, including an electrical control module having a servomotor (1), a vertical motion mechanism (3) and a protection mechanism (2). The protection mechanism (2) includes: a shaft coupler (202), in fixed connection with a shaft of the servomotor (1) and having a plurality of first connecting components; and a transmission sleeve (203), in fixed connection with the vertical motion mechanism (3) and having a plurality of second connecting components in movable connection with the plurality of first connecting components. The plurality of first connecting components is in movable connection with the plurality of second connecting components such that, in the event of a torque output by the shaft of the servomotor (1) not exceeding a limit, the plurality of first connecting components is engaged with the plurality of second connecting components, and in the event of the torque output by the shaft of the servomotor exceeding the limit, the plurality of first connecting components is disengaged from the plurality of second connecting components, thereby preventing a rotational motion generated by the servomotor (1) from transferring to the vertical motion mechanism (3).


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2015-06-10

A linear motor includes a magnet unit (2) and a coil unit (1). The magnet unit (2) includes two magnet arrays oppositely parallel and symmetrically located on a magnetic yoke (3): a first and a second magnet array (21, 22). The coil unit (1) is disposed in a magnetic gap (4) between the two magnet arrays. In a spatial rectangular coordinate system defined by X, Y and Z axes, the coil unit (1) includes a first and a second coil array (11, 12) arranged in a stacked manner in the Z-axis direction and staggered from each other by a distance of P in the Y-axis direction. P satisfies: when a control system charges the coil unit (1) with a desired current, the coil unit (1) generates a control force along the Y-axis direction, another control force along the Z-axis direction, and a moment about the X-axis direction, which may reduce a magnetic flux leakage and provide higher driving forces, making the linear motor generate required three degrees-of-freedom control force or control torque, and further improve vertical and horizontal magnetic fluxes in the magnet array.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2015-02-12

A fine-motion module for use in a wafer stage of a photolithography tool includes: a base (201); a fine-motion plate (210); a plurality of vertical motors (203), fixed between the base and the fine-motion plate; a plurality of gravity compensators (202), each having one end fixed on the base and the other end configured to support the fine-motion plate; a plurality of absolute-position sensors (205, 211), configured to measure an absolute position of the fine-motion plate and to adjust pressures in the gravity compensators based on the obtained absolute-position measurements such that the absolute position of the fine-motion plate is changed to a predetermined initial vertical position; and a plurality of relative-position sensors (204, 207), configured to measure a relative position of the fine-motion plate to the base and to control the fine-motion plate based on the obtained relative-position measurements, thereby moving the fine-motion plate to a relative zero position.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2016-11-09

A focusing and leveling apparatus, including: an illumination light source (201) for emanating a light beam; an illumination lens group (202), a projecting unit, an object (209) being measured, a detecting unit, a refractive unit, a relay lens group and a photoelectric detector (220), disposed sequentially in this order in a transmission path of the light beam. The projecting unit includes projection slits (203) defining a plurality of non-linearly arranged marks, such that after passing sequentially through the illumination lens group (202), the projecting unit, the object (209) being measured and the detecting unit, the light beam emanated by the illumination light source (201) becomes a plurality of non-linearly arranged sub-beams corresponding to the plurality of marks. The refractive unit is so configured that after passing through the refractive unit, the plurality of sub-beams form a plurality of linearly arranged light spots.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2015-12-02

A magnetic alignment system is disclosed, including a magnet array (10), a motor rotor (20), a fixed tooling (30) and a force sensor (40). The motor rotor (20) is disposed over the magnet array (10) and is connected via the force sensor (40) to the fixed tooling (30) that is positionally fixed relative to the magnet array (10). By varying an angle of a three-phase current supplied to a specific one of three-phase coil assemblies in the motor rotor (20) within an angular range for magnetic alignment and measuring a force generated by the specific one of three-phase coil assemblies using the force sensor (40), an angle of magnetic alignment for the specific one of three-phase coil assemblies is determinable based on the angle of three-phase current that causes the specific one of three-phase coil assemblies to generate a maximum force.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2016-11-09

A wafer pre-alignment device is disclosed, including a first unit (40) configured to drive a wafer (60) to rotate or move upward or downward, a second unit (50) configured to drive the wafer to translate, and a position detector including a light source, a lens and an image sensor (20). A light beam from the light source passes through the wafer and the lens and thereby provides information indicating a position of the wafer to the image sensor. The first unit and the second unit are able to adjust the position of the wafer based on the information obtained by the image sensor. A method for pre-aligning a TSV wafer is also disclosed.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2016-06-15

A Halbach magnetic array is disclosed, including a plurality of first and second magnetic units alternately arranged in a width direction, wherein: each first magnetic unit includes first magnetic groups and first magnetic columns alternately arranged in a length direction, each first magnetic group includes four first magnetic bars arranged in a 2*2 matrix; each second magnetic unit includes second magnetic groups and second magnetic columns alternately arranged in the length direction, each second magnetic group includes four second magnetic bars arranged in a 2*2 matrix; each first magnetic column is magnetized in a height direction, and each second magnetic column is magnetized in a direction opposite to the height direction. A magnetic suspension vibration damper is also disclosed which includes Halbach magnetic arrays as described above that are stacked together along a height direction to produce a magnetic force in the height direction and performs the vibration damping function by means of magnetic attractive forces or magnetic repulsive forces. As a Halbach array has a magnetic density on one side that is


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2016-10-05

A flat voice coil motor, including a coil unit and two primary magnetic pole units exerting an Ampere force on the coil unit. The coil unit includes a small, weak magnet (107), and the force exerted by the two primary magnetic pole units on the small, weak magnet (107) is a vertically upward resultant force. By arranging the small, weak magnet (107) in the coil unit, magnetic repulsion or attraction forces between the small, weak magnet and the primary magnetic pole units always ensure a vertically upward force on the coil unit, thereby achieving gravity compensation. In addition, this arrangement is achieved simply by replacing an internal portion of the coil unit with the small, weak magnet (107), which neither has influence on the Ampere force acting on a coil in the coil unit nor adversely leads to motor overheating caused by a structural addition.


Patent
Shanghai Micro Electronics Equipment Co. | Date: 2016-12-07

A beam homogenizer for laser annealing (500), for use in a laser annealing apparatus having a laser (100) for producing a laser beam, includes a plurality of cylindrical lenses (510) which have a same radius of curvature and same dimensions in a plane of curvature. The cylindrical lenses (510) have different lengths in a direction of transmission of the laser beam, and any two adjacent ones of the cylindrical lenses have a length difference, in the direction of transmission of the laser beam, greater than a coherence length of the laser (100). Replacement of a combination of transparent glass plates (11) and cylindrical lenses (21) in the prior art with the differently long, larger cylindrical lenses can still achieve de-coherence and homogenization of the laser beam. Diffraction that is detrimental to the homogenization effect can be circumvented, and the complexity and cost of constructing the optical system can be reduced.

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