Shanghai Key Laboratory of Development and Application for Metal Functional Materials

Shanghai, China

Shanghai Key Laboratory of Development and Application for Metal Functional Materials

Shanghai, China
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Shui L.-Y.,Tongji University | Shui L.-Y.,Shanghai Key Laboratory of Development and Application for Metal Functional Materials | Yan B.,Tongji University | Yan B.,Shanghai Key Laboratory of Development and Application for Metal Functional Materials
Chinese Physics Letters | Year: 2014

At the aim of investigating the growth mechanism and morphology evolution of magnetron-sputtered TiAl alloy thin films, we observe the films deposited for different times and find out the variation by atomic force microscopy. Nucleation mechanism and growth kinetics are studied by dynamic scaling, obtained from the morphology evolution of as-deposited TiAl thin films with different growth times. As a result, we demonstrate that the process of film growth goes through three stages, divided by three different growth exponents. The three growth exponents are β1 = 0.52 ±0.01, β2 = 0.71 ±0.01, and β3 = 0.17 ±0.02, respectively. With the deposition time varying from 2 min to 10 min, the roughness exponent α fluctuates in the range 0.61-1.16. © 2014 Chinese Physical Society and IOP Publishing Ltd.

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