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Huang C.-L.,Shandong Nonmetal Metal Material Research Institute | Li Y.-B.,Shandong Nonmetal Metal Material Research Institute | Zhang Y.,Armored Military Repersentative Office Stationed in Jinan Area | Wang M.,Shandong Nonmetal Metal Material Research Institute | And 2 more authors.
Rengong Jingti Xuebao/Journal of Synthetic Crystals | Year: 2015

High quality ITO transparent conductive oxide thin films were deposited on 6 cm×6 cm sized organic glass substrates by facing targets magnetron sputtering at room temperature, the effect of sputtering time on the electrical conductivity, light transmittance in the visible spectrum and infrared emissivity were studied. As sputtering time increasing, thickness of ITO films increases linearly, the structure of thin films changes from amorphous to polycrystalline structure with (400) and (440) preferred orientation. The resistivity decreases rapidly, while carrier concentration increases, thin film deposited as long as 60 min has the highest conductivity, the resistivity is 2.1×10-4Ω·cm, carrier concentration is 1.2×1021 cm-3, while infrared emissivity is as low as 0.17. The transmittance of ITO thin films decreases with sputtering time increasing, also UV-Vis spectrum shows red-shift phenomena in ultraviolet region. ©, 2015, Chinese Ceramic Society. All right reserved. Source

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