Science and Technology on Micro Nano Fabrication Laboratory

Shanghai, China

Science and Technology on Micro Nano Fabrication Laboratory

Shanghai, China

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Jiang S.-D.,Science and Technology on Micro Nano Fabrication Laboratory | Jiang S.-D.,Shanghai JiaoTong University | Liu J.-Q.,Science and Technology on Micro Nano Fabrication Laboratory | Liu J.-Q.,Shanghai JiaoTong University | And 6 more authors.
Microsystem Technologies | Year: 2014

In this paper, thin film Pt temperature microsensor in the temperature range of 10-100 K for cryogenic engineering applications is proposed and researched. The sensor is designed with two structures, and they are obtained by micro fabrication technology. The sensors are annealed in different conditions. The degree crystallization and grain size are analyzed by X-ray diffraction and SEM for both as-deposited and annealed sensors. The resistance dependency on temperature test result shows that when temperature is larger and smaller than 50 K, the average temperature coefficient resistance (TCR) of rectangular shape sensor could achieve 3,118 ppm/K and above 257 ppm/K, respectively. Meanwhile, TCR of circular shape sensor is 2,778 ppm/K and above 249 ppm/K, respectively. The good thermal cycle stability is observed. After three cycles between 10 and 100 K, the maximum resistance variation values are 0.0034 and 0.0137 %, which correspond to 0.0082 and 0.061 K temperature shift for the rectangular and circular sensors, respectively. The ΔT/T (%) of rectangular and circular sensors is performed with the magnetic field up to 6T in the temperature range of 10-100 K, and they are within the range of -19.84 to 0.137 and -2.18 to 11.33 for rectangular and circular sensors,respectively. The impedance test shows that the sensors have the same electric properties under direct current and alternating current condition. © 2013 Springer-Verlag Berlin Heidelberg.


Wu T.-T.,Science and Technology on Micro Nano Fabrication Laboratory | Wu T.-T.,Shanghai JiaoTong University | Liu J.-Q.,Science and Technology on Micro Nano Fabrication Laboratory | Liu J.-Q.,Shanghai JiaoTong University | And 10 more authors.
8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013 | Year: 2013

NiCr (80/20 at.%) thin films were deposited on SiO2/Si substrates as a cryonetic heater by DC magnetron sputtering technique. After a series of annealing treatments under various conditions, the electrical properties and microstructure of the films were investigated. The crystallinity and composition of the films were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The films are changed from crystalline to amorphous phase after annealing at 250 °C in nitrogen ambient and the annealing conditions have a significant effect on the resistivity and temperature coefficient of resistance (TCR) of the films. TCR of the samples annealed at 250 °C for 9 minutes in N2 shows 9.23 ppm/K at 20K which is finally confirmed as the optimal result. © 2013 IEEE.

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