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Fīrozpur, India

Sikri G.,LLRIET | Rajni,SBSCET
Advances in Intelligent Systems and Computing | Year: 2012

Peak to Average Power Ratio (PAPR or PAR) is major problem of Orthogonal Frequency Division Multiplexing. The Classical Clipping method is used in this paper for reduction of PAPR using 4-PAM, 4-QAM and QPSK. Through the Analysis, it is shown that Clipping on 4-PAM is better than QPSK and 4-QAM with 64 subcarriers. © 2012 Springer-Verlag. Source


Bhandari A.,National Institute of Technology Jalandhar | Sangal A.L.,National Institute of Technology Jalandhar | Saluja K.K.,SBSCET
Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics) | Year: 2012

Distributed Denial of Service (DDoS) attack is one of the biggest threats now days. This paper aims at providing the simulation results of buffer size and attack intensities effects on various queuing algorithms such as Drop Tail, Fair Queuing (FQ), Stochastic Fair Queuing (SFQ), Deficit Round Robin (DRR) and Random Early Detection (RED) using ns-2 as a simulation environment. The results in this paper indicate that Stochastic Fair Queuing is the best algorithms in terms of providing maximum bandwidth to legitimate users against various attack intensities. It is also cleared from simulation results that there is no effect of variation in buffer size on queuing algorithms such as Fair Queuing, Stochastic Fair Queuing and Deficit Round Robin while DropTail and Random Early Detection algorithms are giving the best performance on buffer size 60 against various attack intensities. © 2012 Springer-Verlag. Source


Goyal T.,Punjab Technical University | Walia R.S.,PEC University of Technology | Sidhu T.S.,SBSCET
Materials and Manufacturing Processes | Year: 2012

In this research article, Taguchi L 18 orthogonal array has been employed for depositing electro-conductive coatings by varying process and material parameters, i.e., type of powder feeding arrangement, substrate material, stagnation gas temperature, stagnation gas pressure, and standoff distance. The response parameter of the low-pressure cold spray coatings produced is measured in terms of coating density. The analyses of the raw data and signal-to-noise (S/N) ratio of the response parameters have been performed using analysis of variance (ANOVA). The optimum parameters are predicted on the basis of analyses of the raw data and S/N ratio. It was found that the experimental conditions that provide better coating density are expected to also show a strong S/N ratio. The percentage contribution of the various parameters in regard to coating density as response parameter has also been predicted. The significant parameters in order of their decreasing percentage contribution are: substrate material, standoff distance, stagnation temperature, stagnation pressure of the carrier gas, and feed arrangement of powder particles, respectively. © 2012 Copyright Taylor and Francis Group, LLC. Source


Goyal T.,Punjab Technical University | Walia R.S.,University of Punjab | Sidhu T.S.,SBSCET
Materials and Manufacturing Processes | Year: 2012

In this article, Taguchi design of experiments L 18 orthogonal array have been adopted for making the electro-conductive coatings. Process parameters selected for this study are: substrate material, type of powder feeding arrangement, stagnation gas temperature, stagnation gas pressure, and standoff distance. The response parameter of cold spray coatings produced is measured in terms of coating thickness. The analyses of the raw data and Signal-to-Noise (S/N) ratio of the response parameters have been performed using analysis of variance (ANOVA). The optimum process parameters are predicted on the basis of analyses of the raw data and S/N ratio. The percentage contribution of the various process parameters with reference to coating thickness as response has been predicted. The significant process parameters in decreasing order of their contribution are: standoff distance, stagnation gas temperature, substrate material, stagnation pressure of the carrier gas, and feed arrangement of the powder particles. © 2012 Copyright Taylor and Francis Group, LLC. Source


Goyal T.,Punjab Technical University | Walia R.S.,PEC University of Technology | Sidhu T.S.,SBSCET
International Journal of Advanced Manufacturing Technology | Year: 2012

In this paper, Taguchi L 18 orthogonal array have been employed for depositing the electro-conductive coatings by varying various process parameters, i.e., substrate material, type of powder feeding arrangement, stagnation gas temperature, stagnation gas pressure, and stand-off distance. The response parameter of the coatings so produced is measured in terms of surface roughness. The optimum process parameters are predicted on the basis of analyses (ANOVA) of the raw data and signal to noise ratio. The significant process parameters in order of their decreasing percentage contribution are: stagnation pressure, stand-off distance, substrate material, stagnation temperature of the carrier gas, and feed arrangement of the powder particles, respectively. © 2011 Springer-Verlag. Source

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