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Patent
Tosoh Corporation and Sagami Chemical Research Institute | Date: 2013-12-27

A compound useful for the manufacture of a Group 5 metal oxide film is provided. The compound is a Group 5 metal oxo-alkoxo complex represented by the following formula (A), and after preparing a film-forming material solution containing the compound and an organic solvent, a Group 5 metal oxide film can be manufactured using the film-forming material solution: (wherein M represents a niobium atom, etc.; R


A phenyl-substituted 1,3,5-triazine compound represented by the general formula (1): wherein Ar


Patent
Sagami Chemical Research Institute and Manac Inc. | Date: 2012-12-21

The present invention provides a method for producing farnesal that is useful as a production intermediate of pharmaceuticals, agricultural chemicals and perfumes. More specifically, the present invention provides a method for producing farnesal (3), comprising reacting (E)-nerolidol (1) with an oxidizing agent in the presence of a vanadium complex of the general formula (2): wherein R1 to R7 are the same as defined in the description and claims.


Patent
Kaken Co. and Sagami Chemical Research Institute | Date: 2014-03-14

Provided are a polycyclic pyrazolinone derivative indicated by general formula (1) (in the formula, R


Patent
Sagami Chemical Research Institute and Tosoh Corporation | Date: 2011-05-30

This invention aims at providing a material from which a silicon-containing thin film can be efficiently produced at a low temperature of 500 C. or less without using plasma or the like. The invention relates to produce a hydrosilane derivative represented by the general formula (1) by reacting a chlorosilane derivative ( In the formulae, R

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