Tokyo, Japan
Tokyo, Japan

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First and second multi-pair thermocouples (21, 22) are formed on the upper surface of a heat-sensitive member (10), and a thermally uniformizing member (30) is adhesively attached to a base portion (11) of the heat-sensitive member (10). The thermally uniformizing member (30) is formed of a heat-resistant and electrically insulating material having a higher thermal conductivity than the heat-sensitive member (10) and a linear expansion coefficient approximate to the linear expansion coefficient of the heat-sensitive member (10). For example, the heat-sensitive member (10) is formed of mullite, and the thermally uniformizing member (30) is formed of aluminum nitride, whereby damage caused by thermal expansion can be prevented and at the same time the base portion (11) of the heat-sensitive member (10) can be thermally uniformalized.


Provided is an operation guide system for an X-ray analysis, including: a sample information acquisition portion for acquiring sample information on a sample to be measured for a predetermined analysis purpose with an X-ray measuring unit; a measurement condition acquisition portion for acquiring a plurality of measurement conditions different from one another; a virtual result acquisition portion for subjecting the sample information to simulations respectively based on the plurality of measurement conditions, to thereby acquire a plurality of virtual measurement results of measurements for the predetermined analysis purpose; and a comparison result output portion for outputting, as comparison results, at least two virtual measurement results among the plurality of virtual measurement results and at least two of the plurality of measurement conditions respectively corresponding to the at least two virtual measurement results.


Patent
Rigaku Corporation | Date: 2016-09-08

Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.


Patent
Rigaku Corporation | Date: 2016-08-10

A stress analysis apparatus capable of improving the accuracy of a stress value, a method, and a program are provided. A stress analysis apparatus 100 that calculates a residual stress of a sample S includes an analysis unit configured to calculate an error as one of solutions by using an equation including an error term and prescribing a relationship between stress and strain with using measured values by diffracted X-rays with respect to a plurality of scattering vectors and a provisional value when the stress in the direction perpendicular to the surface of the sample S is constant, and a provisional value correction unit configured to correct the provisional value by the calculated error, and the analysis unit and the correction unit repeat the calculation of the error and the correction of the provisional value.


Patent
Rigaku Corporation | Date: 2017-02-01

A micro beam generation unit capable of simultaneously capturing anisotropic images in a high signal-to-background ratio with a compact configuration and an X-ray small-angle scattering apparatus are provided. A micro beam generation unit 110 generates X-rays having a micro spot size, with which a sample is irradiated, in order to detect diffracted X-rays by a one-dimensional detector or a two-dimensional detector. The micro beam generation unit 110 includes a slit 115 that is provided on an X-ray optical path and reshapes X-rays into parallel beams, and two channel-cut monochromator crystals 117 and 118 that are arranged in arrangement of (+, -, -, +) and remove parasitic scattering of parallel beams reshaped by the slit. Accordingly, it is possible to simultaneously obtain anisotropic images in a high signal-to-background ratio with a compact configuration.


Patent
Rigaku Corporation | Date: 2017-03-29

Only X-rays having a specific wavelength out of focusing X-rays 2 diffracted from a sample S is reflected from a monochromator 60 based on a Braggs condition, passed through a receiving slit 30 and detected by an X-ray detector 20. The monochromator 60 is configured to be freely removable, and arranged between the sample S and a focal point 2a at which the focusing X-rays 2 diffracted from the sample S are directly focused. At this time, the monochromator 60 is approached to the focal point 2a as closely as possible. The monochromator 60 comprises a multilayer mirror having an internal interplanar spacing which varies continuously from one end to the other end.


Patent
Rigaku Corporation | Date: 2017-03-15

Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.


Provided is an operation guide system for an X-ray analysis, including: a sample information acquisition portion for acquiring sample information on a sample to be measured for a predetermined analysis purpose with an X-ray measuring unit; a measurement condition acquisition portion for acquiring a plurality of measurement conditions different fromone another; a virtual result acquisition portion for subjecting the sample information to simulations respectively based on the plurality of measurement conditions, to thereby acquire a plurality of virtual measurement results of measurements for the predetermined analysis purpose; and a comparison result output portion for outputting, as comparison results, at least two virtual measurement results among the plurality of virtual measurement results and at least two of the plurality of measurement conditions respectively corresponding to the at least two virtual measurement results.


Patent
Rigaku Corporation | Date: 2017-01-04

Provided are an X-ray generator (1) capable of suppressing effects of a fluctuation in a disturbance magnetic field and an adjustment method therefor. The X-ray generator includes: an electron-beam generating unit (11) configured to emit an electron beam; an electron target (17) onto which the electron beam is radiated to generate an X-ray; an electron-beam adjusting unit (2), which is arranged between the electron-beam generating unit and the electron target, and is configured to adjust the electron beam emitted from the electron-beam generating unit; an electron-beam deflecting unit (15), which is arranged between the electron-beam adjusting unit and the electron target, and is configured to deflect the electron beam to be radiated onto the electron target; and a magnetic sensor (16) arranged in a vicinity of a region of the electron target, onto which the electron beam is radiated, so as to be away from the electron beam.


Patent
Rigaku Corporation | Date: 2017-01-25

An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a spectrometer 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, K1 ray from K2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

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