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Nishi-Tokyo-shi, Japan

A crystalline phase identification method, a crystalline phase identification device, and a crystalline phase identification program which can conduct qualitative analysis with higher precision are provided. The crystalline phase identification method for identifying crystalline phases contained in a sample by powder diffraction pattern of the sample with use of database includes: a whole pattern fitting step of subjecting a first diffraction pattern which is the powder diffraction pattern to whole pattern fitting with the use of crystalline phase information contained in the sample to calculate a theoretical diffraction pattern of the crystalline phase(s) already identified; a residual information generating step of generating residual information on the sample on the basis of a difference between the theoretical diffraction pattern and the first diffraction pattern; and a residual information search and matching step of comparing the residual information with the database to select a new crystalline phase contained in the sample.


An X-ray data processing apparatus for processing X-ray data that is obtained by simultaneously measuring X-rays of multiple wavelengths. The apparatus includes a management unit


Patent
Rigaku Corporation | Date: 2015-01-29

An image processing method and an image processing apparatus which remove the effects of cosmic rays, noise and defective pixels without losing data in a specified time and which can correct image data efficiently and with high accuracy are provided. An image processing method of performing correction processing on an abnormal value of X-ray image data is provided which includes the steps of: (S


There are provided an image processing apparatus, an image processing method and an image processing program which can easily and accurately specify and analyze an abnormal part of a subject. An image processing apparatus


Patent
Rigaku Corporation | Date: 2014-11-05

An optical axis adjustment method for an X-ray analyzer. In a 2-adjustment step, a 0 position of the rotation of a receiving-side arm and a 0 position of the angle of diffraction 2 are aligned. In a Zs-axis adjustment step, the position of an incident-side slit along a direction orthogonal to the centerline of the X-rays incident upon a sample from an X-ray source is adjusted. In a -adjustment step, the centerline of X-rays incident upon the sample from the X-ray source and the surface of the sample are adjusted so as to be parallel. In the 2-adjustment step, the Zs-axis adjustment step, and the -adjustment step, the capability for X-ray intensity positional resolution upon a straight line possessed by a one-dimensional X-ray detector is used to perform 2-adjustment, Zs-axis adjustment, and -adjustment.

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