Agency: European Commission | Branch: FP7 | Program: CP | Phase: ENERGY.2010.10.2-1 | Award Amount: 3.90M | Year: 2010
The current technologies to produce photovoltaic modules exhibit features, which prevent cost-reduction to below 0,5/Wp: - Sawing/Wafering and Module assembly is costly and material intensive for wafer solar cells - Efficiency is comparatively low for classical thin-film solar cells (CdTe, CIS, a-Si/c-Si, dye, organic). One approach to avoid both disadvantages is the so-called crystalline Si thin-film lift-off approach, where thin c-Si layers are stripped from a silicon wafer. This approach has the potential to reach > 20% efficient solar cells, however handling issues stop quick progress so far. The basic idea of the current project is to enable the use of lift-off films in a nearly handling-free approach, to avoid limitations by handling issues. The technological realization has the following key features and steps: - Continuous separation of a very thin (< 10 m) c-Si foil from the circumference of a monocrystalline silicon ingot - Attachment to a high-temperature stable substrate of large area (e.g. graphite, Sintered Silicon, or ceramics), which can also serve as module back side. - High-temperature re-organisation of the silicon foil followed by in-situ epitaxial thickening (~40 m base thickness) in an in-line chemical vapour deposition reactor, including pn-junction formation - Processing of high-efficiency solar cells and formation of integrated interconnected high-voltage modules - Encapsulating into a module (glass / encapsulant only if needed) The resulting module to be demonstrated in R2M-Si has a cost potential around 0.55 /Wp, at 18% module efficiency and thus low Balance-of-System cost. Future enhanced R2M-Si modules can exceed even 20% efficiency, at costs below 0.5 /Wp. The project shall demonstrate the feasibility of the most critical process steps like continuous layer detachment, bonding to a carrier substrate, high-quality epitaxy, handling-free solar cell processing and module integration. As a deliverable, a mini module of higher than 18% efficiency shall be prepared.
Siltronic AG and RENA GmbH | Date: 2010-06-14
The present invention relates to an apparatus and a method for the fluidic inline-treatment of flat substrates with at least one process module. In particular, the invention relates to such a treatment during the gentle and controlled transport of the substrates, wherein the treatment can also just relate to the transport of the substrates. According to the invention, a process module 1 is provided which comprises a treatment chamber 2 having at least one treatment surface 7A being substantially horizontally arranged in a treatment plane 5 and being designed for the formation of a lower fluid cushion 6A, wherein two openings in the form of entry 3 and exit 4 for the linear feed-through of the substrates 22 in the same plane are assigned to the treatment surface 7A, and at least one feed device with at least one catch 10 for the controlled feed 9 of the substrates 22 within the treatment chamber 2. Furthermore, the invention provides a method using the apparatus according to the invention.
RENA GmbH | Date: 2011-02-10
The present invention relates to the field of wet chemical treatment of silicon substrates. The invention particularly relates to a method for the determination of the concentration of nitric acid in aqueous process solutions as being used for the treatment of substrates such as those made from silicon. The method is based on the determination of nitrate by means of UV spectroscopy/photometry with the aid of eliminating agents which effectively remove disturbing absorptions caused by other substances. Therein, the concentration of nitrate corresponds to that of nitric acid. According to the invention, a robust method is proposed by means of which the content of nitric acid in acid mixtures can be determined very precisely, and in fact likewise in fresh as well as in acid mixtures that have been used according to their intended purpose.
RENA GmbH | Date: 2011-11-17
A device for holding a substrate block to be sawed and for flushing the intermediate spaces formed by sawing the substrate block. It comprises two regions arranged parallel to the device longitudinal axis and above one another, the upper region being configured as an adapter region by means of which the device can be connected to a machine instrument, and the lower region being formed as a holding region which comprises a circumferentially closed or closable channel system which can be supplied with flushing liquid by means of closable supply openings and the bottom of which is opened in a slot-like fashion during the sawing of the substrate block so as to provide passage openings for the flushing liquid. A method for flushing intermediate spaces formed by sawing a substrate block using the above device.
RENA GmbH | Date: 2010-06-02
The invention relates to a method for etching of silicon surfaces with the following steps: Furnishing an aqueous alkaline hydrocolloid etching solution containing at least one hydrocolloid, at a temperature of 50 C. to 95 C., bringing the silicon surface in contact with the hydrocolloid etching solution for a specified duration, and Removing the hydrocolloid etching solution from the silicon surface.
RENA GmbH | Date: 2012-07-18
An apparatus for the removal of gaseous reaction products (2) from an inline plant (1) for the single sided wet chemical treatment of flat objects (3) by means of a transport gas (G) has an entry (8), a treatment basin (4) for the reception of a treatment liquid (F), an inline transport device (5) with a transport plane (6) for the horizontal transport of the flat objects (3) in transport direction (7), an exit (9), as well as a collection chamber (10) for gaseous reaction products (2) which is arranged above the transport plane (6).
RENA GmbH | Date: 2012-06-01
The invention relates to a method for the conditioning of flat objects such as silicon substrates. The objects, obtained by sawing from a block form a comb like structure by being fixed with one edge to a plate shaped fixation apparatus, are conditioned by conventional rinsing, separating and wet chemical treatment, wherein the treatment takes place before the separation of the sawed substrates from the fixation apparatus. An apparatus which is suitable for carrying out the method has two regions arranged parallel to the apparatus longitudinal axis (L) and above one another, wherein the upper region is configured as an adapter region (1). The lower region is formed as a holding region (2) which comprises a part, provided as a channel (11), of a circumferentially closed or closable channel system which can be supplied with liquid by means of closable supply openings (5). The bottom of this channel (11) is opened in a slot-like fashion during the sawing of the substrate block so as to provide passage openings (15) for the treatment liquid, and it is subdivided into a plurality of sections (11A, 11B) along the apparatus longitudinal axis (L).
RENA GmbH | Date: 2013-10-09
The present invention relates to apparatuses and methods for the transporting of substantially flat objects, wherein the transporting takes place by the use of a streaming liquid. More particularly, the invention relates to such apparatuses and methods wherein the velocity of the object can precisely be controlled. According to the invention, the apparatus for the velocity controlled horizontal transport of a substantially flat and freely moveable object (1) on a liquid comprises (i) at least one treatment surface (7) with at least one inflow region (2) having a multitude of pass-through openings (6) out of which the flat object (1) can be streamed against by a first liquid (L1), and (ii) at least one discharge region (3) preferably laterally adjoining the treatment surfaces (7) at least one inflow region (2) at least at one of its sides for discharging said first liquid (L1) after provision of the inflow. The apparatus is characterized in that the treatment surface (7) is further equipped with at least one pocket (4) for the provision of a Velocity controlling liquid roller, wherein said pocket (4) has at its upstream edge an inlet (5A) through which a second liquid (L2) can be fed into said pocket (4) in the form of a liquid jet stream (8). A method for the velocity controlled horizontal transport of a substantially flat and freely moveable object (1) on a liquid is also disclosed.
RENA GmbH | Date: 2011-04-13
The invention relates to a method for the adjustment of the beam axis of a laser head and an apparatus for this purpose. The method includes the steps of introducing the laser head (3) into a mounting (8), determining the set/actual deviation of the beam axis (2), determining of motions (6A and/or 6B) necessary for reduction of the deviation, and adjustment of the beam axis (2) by driving the adjusting device (4) to generate the adjusting motions (6A and/or 6B), and transmitting the adjusting motions (6A and/or 6B) via the both arms (7A, 7B) of the adjusting lever (7) to the laser head (3) which is arranged in the mounting (8).
RENA GmbH | Date: 2011-08-12
The invention relates to a separating, deflecting and transporting of a disc like substrate (3) such as e.g. a solar wafer. The apparatus (1) for the separating, deflecting and transporting of disc shaped substrates (3) which are sequentially arranged standing one after another in feed direction in the form of a substrate stack (5) within a liquid, comprises a vertical belt conveyor (9) with at least two conveyor belts (11, 11), whose conveying span (10) is arranged at one front side (12) of the stack (5) parallel to the front side (12), wherein the belt conveyor (9) has a vacuum device (16) by means of which the respective foremost substrate (3) of the stack (5) can be sucked against at least a first conveyor belt (11), and wherein the at least two conveyor belts (11, 11) of the vertical belt conveyor (9) are arranged coplanar to each other in the adjoining region.