R and nter for INC Corporation

Hwaseong, South Korea

R and nter for INC Corporation

Hwaseong, South Korea
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Lee S.W.,R and nter for INC Corporation | Song H.S.,R and nter for INC Corporation | Kim H.J.,R and nter for INC Corporation | Kim H.J.,Hanyang University | And 3 more authors.
Journal of Nanoscience and Nanotechnology | Year: 2014

The method for the alumina surface regeneration and the particle reduction in an inductively coupled plasma are described. Due to the chemical reaction between the alumina surface and the oxygen gas in high temperature plasma, the by product Al(OH)3 is formed. Then, it fell out to the wafer as the particle. Since the particles mainly generated from the alumina surface, the seasoning process was progressed after the photoresist (PR) strip process. As the results, the byproduct of the alumina surface changed from Al(OH)3 to Al2O3 after the seasoning process. Then, total number of the particles on the wafer was considerably reduced. For the surface analysis, X-ray Photoelectron Spectroscopy (XPS) and FT-IR were applied to comparing the status of the alumina surface before and after the seasoning process. © 2014 American Scientific Publishers.

Ji Y.,Randnter for INC Corporation | Cho J.-H.,Randnter for INC Corporation | Chae H.-S.,Randnter for INC Corporation
Applied Surface Science | Year: 2013

Condition processes are commonly implemented in semiconductor fabrication to prepare plasma chamber for the optimal performance of plasma processes. When used with plasma ash and etch chambers, conditioning processes typically involve generating conditioning plasma in the plasma chamber for a predetermined length of time to prepare, or "season", the chamber for the performance of ash and etch processes with production wafers. We report on the seasoning of aluminum baffle surfaces by plasma with non-polar aromatic hydrocarbon such as toluene. The aluminum surface was simply treated by radio frequency (RF) plasma with toluene. The non-polar property of the sample increases with increasing plasma treatments. Therefore, the ashing rate of toluene coated baffle improved 1.3 times without scavenging activative species. ©2013 Elsevier B.V. All rights reserved.

Kim H.J.,Hanyang University | Kim H.J.,Randnter for INC Corporation | Hwang H.J.,Randnter for INC Corporation | Kim D.H.,Hanyang University | And 3 more authors.
Physics of Plasmas | Year: 2015

The electrical characteristics and the spatial distribution of oxygen plasma according to the number of turns in ferrite inductively coupled plasmas (ferrite ICPs) are investigated. Through a new ICP model, which includes the capacitive coupling and the power loss of the ferrite material with the conventional ICP model, the variation of the oxygen discharge characteristics depending on the number of turns is simply understood by the electrical measurement, such as the antenna voltages and the currents. As the number of the turns increases, the capacitive coupling dominantly affects the spatial plasma distribution. This capacitive coupling results in a center focused density profile along the radial direction. In spite of the same discharge conditions (discharge chamber, neutral gas, and pressure), the spatial plasma distribution over 450mm has drastic changes by increasing number of the turns. In addition, the effect of the negative species to the density profile is compared with the argon discharge characteristics at the same discharge configuration. © 2015 AIP Publishing LLC.

Kim H.J.,Hanyang University | Kim H.J.,R and nter for INC Corporation | Hwang H.-J.,R and nter for INC Corporation | Kim D.H.,Hanyang University | And 3 more authors.
Journal of Applied Physics | Year: 2015

Radial plasma discharge characteristics in the range of 450 mm were studied in a dual inductively coupled plasma (ICP) source, which consisted of a helical ICP and the side type ferrite ICPs. Since the energy relaxation length is shorter than the distance between each of the ferrite ICPs in an intermediate pressure (600 mTorr), local difference in the plasma ignition along the antenna position were observed. In addition, large voltage drop in the discharge of the ferrite ICPs causes an increase in the displacement current to the plasma, and separate discharge mode (E and H mode) according to the antenna position was observed. This results in non-uniform plasma distribution. For the improvement in the discharge of the ferrite ICPs, a capacitor which is placed between the ends of antenna and the ground is adjusted to minimize the displacement current to the plasma. As a result, coincident transitions from E to H mode were observed along the antenna position, and radially concave density profile (edge focused) was measured. For the uniform density distribution, a helical ICP, which located at the center of the discharge chamber, was simultaneously discharged with the ferrite ICPs. Due to the plasma potential variation through the simultaneous discharge of helical ICP and ferrite ICPs, uniform radial distribution in both plasma density and electron temperature are achieved. © 2015 AIP Publishing LLC.

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