Brecksville, OH, United States
Brecksville, OH, United States

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Patent
Sumitomo Bakelite and Promerus LLC | Date: 2017-01-11

There is provided a polymer including a structural unit represented by the following Formula (1a), a structural unit represented by the following Formula (1b) and a structural unit represented by the following Formula (1c)._(1), R_(2), R_(3) and R_(4) independently represents a hydrogen atom or an organic group having 1 to 10 carbon atoms. In Formula (1c), R_(5) represents an organic group having 1 to 10 carbon atoms.


A variety of polycycloalkyl polynorbornene monomers and polymers derived therefrom are disclosed and claimed. The polymers and copolymers as disclosed herein are useful for forming pervaporation membranes, among other uses.


The present invention relates to use of certain chain transfer agents to control molecular weight of addition mass polymerization of certain polycycloolefinic monomers. More specifically, the present invention relates to use of a series of substituted bicycloalkenes as chain transfer agents in the addition mass polymerization of a series of functionalized norbornene-type monomers. This invention also relates to compositions containing bicycloalkenes as chain transfer agents in forming in mold polycycloolefinic polymers by addition mass polymerization.


Patent
Promerus Llc | Date: 2016-03-31

The present invention relates to certain vinyl addition polymers encompassing polycycloolefinic monomers and a certain of olefinic monomers having thermally labile functional group. More specifically, the present invention relates to vinyl addition polymers under mass polymerization conditions of a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like. This invention also relates to reaction compositions containing a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like, which undergo vinyl addition polymerization to produce materials which are useful as flame retardant materials having a variety of applications.


Patent
Promerus Llc | Date: 2016-03-31

The present invention relates to certain ring open metathesis polymerized (ROMP) polymers encompassing polycycloolefinic monomers and a certain of olefinic monomers having thermally labile functional group. More specifically, the present invention relates to ROMP polymers under mass polymerization conditions of a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like. This invention also relates to reaction compositions containing a series of functionalized norbornene-type monomers and at least one other olefinic monomer containing a thermally labile functional group such as, ether, acetal, ester, and the like, which undergo ring open metathesis polymerization to produce materials which are useful as flame retardant materials having a variety of applications.


The present invention relates to polynorbornene (PNB) composition embodiments that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs having norbornene-type repeating units that are polyether functionalized where such the PNBs of such compositions and the microelectronic and/or optoelectronic devices made therefrom are resistant to thermo-oxidative chain degradation of said polyether functionalization.


Patent
Promerus Llc | Date: 2016-02-12

Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions containing photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.


Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.


Patent
Promerus Llc and University of Akron | Date: 2016-07-15

A nanoporous film formed from a series of vinyl addition block polymers derived from functionalized norbornene monomers are disclosed and claimed. The nanoporous films as disclosed herein are useful as pervaporation membranes and antireflective coatings among various other uses. Also disclosed herein are the fabrication of nanoporous films into pervaporation membranes which exhibit unique separation properties, and their use in the separation of organic volatiles from biomass and/or organic waste, including butanol, phenol, and the like. The fabrication of nanoporous films into antireflective coatings are also disclosed.


Patent
Promerus Llc and Sumitomo Bakelite | Date: 2016-04-12

The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are capable of controlling the adhesiveness by radiation.

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