Entity

Time filter

Source Type

Oxford, United Kingdom

Moghal J.,University of Oxford | Reid S.,Oxford Advanced Surfaces Group Plc | Hagerty L.,Oxford Advanced Surfaces Group Plc | Gardener M.,Oxford Advanced Surfaces Group Plc | Wakefield G.,Oxford Advanced Surfaces Group Plc
Thin Solid Films | Year: 2013

Mesoporous silica nanoparticles are used to fabricate single layer anti-reflection coatings on polymer substrates. High optical performance is achieved by using a binder system in conjunction with the mesoporous silica nanoparticles. The ratio of nanoparticles to binder and the process conditions were used to optimize the optical and mechanical properties of the film. This study investigates how the refractive index of the nanoparticle coating can be optimized such that it matches the properties required for zero reflectance of the underlying polymer substrate. The addition of a binder results in a mechanically robust anti-reflection coating, which shows improvement on current available technology. © 2013 Elsevier B.V. Source


Wakefield G.,Oxford Advanced Surfaces Group Plc | Adair M.,Oxford Advanced Surfaces Group Plc | Gardener M.,Oxford Advanced Surfaces Group Plc | Greiner D.,Helmholtz Center Berlin | And 3 more authors.
Solar Energy Materials and Solar Cells | Year: 2015

A single layer anti-reflective (AR) mesoporous silica nanoparticles coating on Cu(In,Ga)Se2 (CIGS) thin film solar cells has been fabricated. Unlike traditional vacuum deposited AR coatings, this nanoparticle coating is applied using simple wet deposition techniques. In this study we investigate the structural properties and anti-reflection effects of the nanoparticle coating on the CIGS solar cell. The reduction in reflection and increase in the short circuit current shows the potential of this nanoparticle coating to compete with current technology. © 2014 Elsevier B.V. Source


Moghal J.,University of Oxford | Kobler J.,Nanoscape AG | Sauer J.,Nanoscape AG | Best J.,Oxford Advanced Surfaces Group Plc | And 3 more authors.
ACS Applied Materials and Interfaces | Year: 2012

Mesoporous silica nanoparticles are used to fabricate antireflectance coatings on glass substrates. The combination of mesoporous silica nanoparticles in conjunction with a suitable binder material allows mechanically robust single layer coatings with a reflectance <0.1% to be produced by simple wet processing techniques. Further advantages of these films is that their structure results in broadband antireflective properties with a reflection minimum that can tuned between 400 nm and 1900 nm. The ratio of binder material to mesoporous nanoparticles allows control of the refractive index. In this report, we discuss how control of the structural properties of the coatings allows optimization of the optical properties. © 2011 American Chemical Society. Source


Moghal J.,University of Oxford | Moghal J.,Oxford Advanced Surfaces Group Plc | Bird A.,Micro Materials Ltd | Harris A.H.,Micro Materials Ltd | And 3 more authors.
Journal of Physics D: Applied Physics | Year: 2013

The mechanical properties of ultrathin (<120 nm) films differ substantially from the bulk properties of the material and are also strongly substrate dependent. We compare the properties of two differing film systems; a high particle loading nanocomposite of silica and a multiple layer physical vapour deposition (PVD) coating by nanoindentation, nano-scratch and nano-impact followed by structural analysis. The work is undertaken on hardcoated polymer substrates and uses two types of anti-reflection coatings as test systems. The nanocomposite film comprises of a high (>50%) loading of silica nanoparticles in an inorganic binder, which demonstrates significant flex and elastic recovery whereas PVD films are subject to brittle failure even at low applied loads. Failure of the nanocomposite film, with the exception of minor plastic deformation, does not occur until the underlying substrate fails. Although the PVD film has a greater hardness than the nanocomposite, failure occurs at lower loads due to a number of toughness reducing factors including reduced modulus, modulus mismatch with the substrate and film thickness. The resistance of ultrathin films to external mechanical stresses is therefore related to a number of factors and not simply to film hardness, the most important of which are film structure and film mechanical matching to the substrate. © 2013 IOP Publishing Ltd. Source

Discover hidden collaborations