ORC Manufacturing Co.

Machida, Japan

ORC Manufacturing Co.

Machida, Japan
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Patent
Orc Manufacturing Co. | Date: 2011-11-04

An exposure device can exposes a circuit pattern while information data is suitably changed. An exposure device comprises a first light source (20) for irradiating a first light including ultraviolet rays, a projection exposure unit (70) for exposing a circuit pattern drawn on a photomask on a substrate, with the first light, a substrate stage (60) for mounting the substrate, a housing (11) for arranging the substrate stage, a second light source (41) for irradiating a second light including ultraviolet rays, arranged at a position different from the first light source, a spatial light modulation unit (40) for exposing information data formed electrically using the second light on the substrate, and a spatial optical light modulation unit driving means (5) for moving the spatial light modulation unit arranged on the housing (11) in a direction parallel to a moving direction of the substrate stage.


Patent
ORC Manufacturing Co. | Date: 2011-05-06

The present invention relates to a transfer device that can feed a work in a stable condition without applying it any excess loads. The transfer device for feeding a tape-shaped work to a process stage standing in an upright position, which is placed on one side of the process stage and which includes a supply reel, a take-up reel and a work feeding mechanism. Specifically, the supply reel, around which the work and a protective sheet are wound, is adapted to feed the work and the protective sheet therefrom. The take-up reel is adapted to wind the work and the protective sheet that have been fed from the supply reel, and it is located below the supply reel. The work feeding mechanism is adapted to forward the work from the supply reel to the take-up reel through the process stage.


Patent
ORC Manufacturing Co. | Date: 2011-06-23

A projection aligner comprises a projection optical system for radiating a luminous flux including ultraviolet rays onto a photomask, and projecting said luminous flux which has passed through the photomask onto a substrate to which photoresist is applied; a substrate table for mounting the substrate, and a light blocking means for covering the peripheral portion of the substrate to block luminous flux. The light blocking means (80) includes a first light blocking member (84) and a second light blocking member (86) each having a substantially semicircular opening, and moving means (82, 83) for moving the first light blocking means and the second light blocking means approaching each other and away from each other. As the first light blocking member and the second light blocking member are moved to approach each other, the first light blocking member and the second light blocking member form an annular shape and cover the peripheral portion of the substrate (CB).


Patent
Orc Manufacturing Co. | Date: 2010-09-10

An excimer lamp has a single tubular discharge chamber configured to enclose a discharge gas that is a noble gas or a mixing gas consisting of a noble gas and a halogen gas; a pair of electrodes configured to be arranged along opposite sides of the exterior surface of the discharge chamber; and an outer tube configured to cover the discharge chamber and the electrodes. Excimer molecules are produced by either dielectric barrier discharge or capacitive-coupled high-frequency discharge. An interior of a space formed between the outer tube and the discharge chamber is either in a vacuum state that is necessary and sufficient for preventing discharge, or is filled with an arc-suppression gas.


Patent
Orc Manufacturing Co. | Date: 2011-08-29

A photolithography system is equipped with a light modulator that comprises a plurality of regularly arrayed light modulation elements; a scanning mechanism configured to move an exposure area relative to an object in a main scanning direction, in a state in which the exposure area is inclined in the main scanning direction; an exposure controller that controls the plurality of light-modulating elements in accordance with a given exposure pitch to carry out an overlapping exposure process in both the main scanning direction and a sub-scanning direction; and an exposure pitch adjuster that calculates an exposure pitch that allows exposure points to be distributed evenly on the basis of an effective area of the light modulator.


Patent
Orc Manufacturing Co. | Date: 2013-06-26

A discharge lamp is equipped with a discharge tube; at least one band-shaped electrode that is provided in the discharge tube; and at least one dielectric that covers the electrode, then, the thickness of at least one of the edge portions of the band-shaped electrode along longitudinal direction is thinner than the thickness of the electrode center portion.


Pps

Trademark
ORC Manufacturing Co. | Date: 2012-02-07

Exposure machines for manufacturing semiconductor devices; exposure machines for manufacturing electronic circuit boards; semiconductor manufacturing machines.


Orc

Trademark
ORC Manufacturing Co. | Date: 2014-05-07

Discharge tubes, electric, other than for lighting.


Orc

Trademark
ORC Manufacturing Co. | Date: 2010-08-24

Exposure machines for manufacturing semiconductor devices, exposure machines for manufacturing electronic circuit boards, namely, printed circuit boards; exposure machines for manufacturing liquid crystal displays, projection exposure machines, direct exposure machines, ultraviolet exposure machines for manufacturing semiconductor devices.


Trademark
ORC Manufacturing Co. | Date: 2012-05-22

Exposure machines for manufacturing printed wiring boards; Exposure machines for manufacturing semiconductor devices; semiconductor manufacturing machines.

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