Entity

Time filter

Source Type

Billerica, MA, United States

Orbotech Ltd. is an international developer and producer of automated optical inspection and related imaging and computer-aided manufacturing systems. The company's imaging tools are used in the manufacturing of printed circuit board, flat panel displays, and IC packaging, among other applications. These systems aid manufacturers by providing highly accurate, high-speed, and automated optical inspection, allowing faster production speeds with less waste and at lower cost. The company is headquartered in Yavne, Israel and operates in North America, Europe, Japan and Asia-Pacific. Wikipedia.


Ben-Ari R.,Orbotech
IEEE Transactions on Pattern Analysis and Machine Intelligence | Year: 2014

Depth from Defocus (DFD) suggests a simple optical set-up to recover the shape of a scene through imaging with shallow depth of field. Although numerous methods have been proposed for DFD, less attention has been paid to the particular problem of alignment between the captured images. The inherent shift-variant defocus often prevents standard registration techniques from achieving the accuracy needed for successful shape reconstruction. In this paper, we address the DFD and registration problem in a unified framework, exploiting their mutual relation to reach a better solution for both cues. We draw a formal connection between registration and defocus blur, find its limitations and reveal the weakness of the standard isolated approaches of registration and depth estimation. The solution is approached by energy minimization. The efficiency of the associated numerical scheme is justified by showing its equivalence to the celebrated Newton-Raphson method and proof of convergence of the emerged linear system. The computationally intensive approach of DFD, newly combined with simultaneous registration, is handled by GPU computing. Experimental results demonstrate the high sensitivity of the recovered shapes to slight errors in registration and validate the superior performance of the suggested approach over two, separately applying registration and DFD alternatives. © 2013 IEEE.


Grant
Agency: Cordis | Branch: FP7 | Program: CP-IP | Phase: NMP.2011.1.4-2 | Award Amount: 10.43M | Year: 2012

While nanotechnology was originally limited to small areas of a few cm2, the quest for lower costs has been the latest years the drive for developing processes utilising larger substrate sizes at increasing throughputs. A typical example is the flat panel display industry where the push to larger gen size and faster processing has resulted in a significant cost reduction. The next challenge here is the move to smaller feature sizes. Large area processing at high speeds is optimal when using roll-to-roll (R2R) processing, able to deliver the ultimate cost reduction. Flexible innovative thin film devices, like organic light emitting diodes (OLEDs) for lighting, photo voltaic (PV) and organic photo voltaic (OPV) modules, organic circuitry, printed electronics and thin film batteries, are currently developed using this kind of processing. The overall objective of Clean4Yield is the development and demonstration of technologies and tools for nano-scale detection, cleaning, prevention and repair of defects and contaminations in nano-scale layers. The R2R production processes for OLED, OPV, and high-end moisture barrier layers on flexible substrates will serve as development platform for the various methods. Clean4Yield will demonstrate that the developed methods increase yield, reduce production costs, and improve performance and operational device lifetimes of these applications. The developed technologies will be easy to adapted for other large-scale production technologies of other nano layer applications.


Patent
Orbotech | Date: 2014-04-07

An optical inspection system including a first multiplicity of cameras operative to image a second multiplicity of regions on an object, a third multiplicity of illumination sources and at least one illumination manager operative to combine illumination from the third multiplicity of illumination sources and thereafter to direct illumination therefrom to the second multiplicity of regions, the at least one illumination manager including a beam distributor receiving a composite input beam of a multiplicity of non-mutually coherent, spatially concentrated laser pulses and directing a multiplicity of composite output beams of a plurality of the non-mutually coherent, spatially concentrated laser pulses to a corresponding plurality of spatially distinct locations corresponding to the second multiplicity of regions.


An inspection system includes a CMOS integrated circuit having integrally formed thereon an at least two dimensional array of photosensors and providing an inspection output representing an object to be inspected. A defect analyzer is operative to receive the inspection output and to provide a defect report.


Patent
Orbotech | Date: 2014-05-08

Optical apparatus includes a mount, which holds a workpiece. An array of optical heads project respective patterns of radiation onto the workpiece. A calibration assembly captures images of the respective patterns. A motion assembly, on which the calibration assembly is mounted, transports the calibration assembly among a plurality of different positions between the array of the optical heads and the mount so as to intercept and image, at each of the different positions, a respective pattern projected by a different one of the optical heads. A processor processes the images captured by the calibration assembly at the different positions so as to monitor operation of the apparatus.

Discover hidden collaborations