Okuno Chemical Industries Co.

Tsurumi ku, Japan

Okuno Chemical Industries Co.

Tsurumi ku, Japan
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Patent
Okuno Chemical Industries Co. | Date: 2017-05-17

An object of the invention is to provide a jig electrolytic stripper that can sufficiently remove palladium adhered to the current-conducting portion of a plating jig, that can remove palladium adhered to the insulating-material-coated portion of the jig, and that exhibits reduced erosion of the metal of the current-conducting portion of the jig. The jig electrolytic stripper comprises the following components (A) to (C): (A) at least one member selected from the group consisting of nitric acid and salts thereof, (B) at least one member selected from the group consisting of ammonia, ammonium salts, ethylene amine compounds, alkyl diamine compounds, and amino acids, and (C) a bromide.


Patent
Okuno Chemical Industries Co. | Date: 2017-05-17

The present invention provides a resin plating method using an etching bath containing manganese as an active ingredient, the method being capable of maintaining stable etching performance even during continuous use. The resin plating method includes: an etching step, which uses a resin material-containing article as an object to be treated and etches the article using an acidic etching bath containing manganese; a catalyst application step, which uses palladium as a catalyst metal; and an electroless plating step; and the method further includes a step of maintaining the palladium concentration in the acidic etching bath at 100 mg/L or less.


Patent
Okuno Chemical Industries Co. | Date: 2015-07-28

An object of this invention is to provide a copper-tin alloy plating bath that allows for film thickening without using cyanide ions, and that can also be applied to barrel plating. This invention relates to a copper-tin alloy plating bath comprising an aqueous solution containing a water-soluble copper compound, a water-soluble divalent tin compound, a sulfur-containing compound represented by formula (1): R(CH_(2))_(l)S(CH_(2))_(m)S(CH_(2))_(n)R(1), wherein R is H, OH, or SO_(3)Na, and l, m, and n are each independently an integer of 0 to 3,and a hydroxyl group-containing aromatic compound.


Patent
Okuno Chemical Industries Co. | Date: 2015-06-15

An object is to provide a novel composition for blackening treatment that can sufficiently blacken copper circuits of printed wiring boards, circuits made of silver paste, and other various articles containing a copper-based metal, such as copper or a copper alloy, or a silver-based metal, such as silver or a silver alloy, without impairing the smoothness of the copper-based metal or silver-based metal. A composition is provided for blackening treatment of a copper-based metal or a silver-based metal, the composition comprising an aqueous solution containing:


Patent
Okuno Chemical Industries Co. | Date: 2017-06-14

An object of this invention is to provide a copper-tin alloy plating bath that allows for film thickening without using cyanide ions, and that can also be applied to barrel plating. This invention relates to a copper-tin alloy plating bath comprising an aqueous solution containing a water-soluble copper compound, a water-soluble divalent tin compound, a sulfur-containing compound represented by formula (1):R-(CH_(2))_(1)-S-(CH_(2))_(m)-S-(CH_(2))_(n)-R(1),wherein R is H, OH, or SO_(3)Na, and 1, m, and n are each independently an integer of 0 to 3,and a hydroxyl group-containing aromatic compound.


Patent
Okuno Chemical Industries Co. | Date: 2015-04-24

The present invention provides a resin plating method using an etching bath containing manganese as an active ingredient, the method being capable of maintaining stable etching performance even during continuous use. The resin plating method includes: an etching step, which uses a resin material-containing article as an object to be treated and etches the article using an acidic etching bath containing manganese; a catalyst application step, which uses palladium as a catalyst metal; and an electroless plating step; and the method further includes a step of maintaining the palladium concentration in the acidic etching bath at 100 mg/L or less.


Patent
Okuno Chemical Industries Co. | Date: 2017-04-26

An object of the present invention is to provide a multilayer plating film with excellent corrosion resistance. The present invention provides a multilayer plating film containing at least a chrome plating film and a tin-nickel plating film, the chrome plating film being the outermost layer, and the tin-nickel plating film being formed below the chrome plating film by using an acidic tin-nickel alloy plating solution containing a divalent tin compound, a nickel compound, a triamine compound, and a fluoride.


Patent
Okuno Chemical Industries Co. | Date: 2015-06-16

An object of the present invention is to provide multilayer plating film with excellent corrosion resistance. The present invention provides a multilayer plating film containing at least a chrome plating film and a tin-nickel plating film, the chrome plating film being the outermost layer, and the tin-nickel plating film being formed below the chrome plating film by using an acidic tin-nickel alloy plating solution containing a divalent tin compound, a nickel compound, a triamine compound, and a fluoride.


Patent
Okuno Chemical Industries Co. | Date: 2015-10-28

The present invention provides a composition for etching treatment of a resin material, the composition comprising an aqueous solution having a permanganate ion concentration of 0.2 mmol/L or more and a total acid concentration of 10 mol/L or more, and the aqueous solution satisfying at least one of the following conditions (1) to (3):(1) containing an organic sulfonic acid in an amount of 1.5 mol/L or more,(2) setting the divalent manganese ion molar concentration to 15 or more times higher than the permanganate ion molar concentration, and(3) setting the addition amount of an anhydrous magnesium salt to 0.1 to 1 mol/L. The composition for etching treatment of the present invention is a composition containing no hexavalent chromium and having excellent etching performance and good bath stability.


Patent
Okuno Chemical Industries Co. | Date: 2016-09-21

An object of the present invention is to provide a novel conductive film-forming bath comprising an alkaline aqueous solution that can be used to form a film by electroplating on a non-conductive plastic material, the conductive film-forming bath being capable of forming a film by electroplating that has an excellent appearance and that does not suffer from reduced adhesiveness with respect to a non-conductive plastic material. The present invention relates to a conductive film-forming bath comprising an aqueous solution containing a copper compound, a complexing agent, an alkali metal hydroxide, and a water-soluble polymer having a polyoxyalkylene structure.

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