Obducat AB

Malmö, Sweden

Obducat AB

Malmö, Sweden

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News Article | December 14, 2016
Site: www.prnewswire.co.uk

OBDUCAT AB (publ), a leading supplier of nanolithography machines, has taken a decision to establish a wholly-owned subsidiary in Hong Kong. The aim is to increase the presence in the Asian markets. The subsidiary, Obducat Asia Ltd, will constitute the regional hub for Obducat's future activities in Asia. The establishment in Hong Kong forms an important part to achieve the strategic target for Obducat to build up a strong presence in major markets. The function for the subsidiary will be to drive the business development together with marketing- and sales activities in the region, and in addition also contribute to the technical development in Obducat. A local presence will also provide the ability to offer improved and faster service and support to our customers. Recruitment of management staff in Hong Kong has already been initiated. "The establishment of a local organisation in Hong Kong sends a strong message to our present customers as well as to our future customers and cooperation partners in the region. This will promote our continued addressing of the Asian markets" says Patrik Lundström, CEO. This is information that Obducat AB (publ.) is required to disclose pursuant to the Swedish Securities Market Act and/or the Financial Instruments Trading Act. The information was submitted for publication on December 14th, 2016 at 18.30 CET. This information was brought to you by Cision http://news.cision.com The following files are available for download:


News Article | December 16, 2016
Site: www.prnewswire.co.uk

OBDUCAT AB (publ) subsidiary Obducat Technologies AB, a leading supplier of lithography solutions based on nanoimprint lithography (NIL), has signed an LOI with an Asian company in the LED industry. The LOI concerns the formation of a joint venture and thereto connected order for five Sindre 400 NIL systems at a preliminary value of 1 MEUR each. The LOI, which is non-legally binding, confirms the mutual interest of continuing the already initiated work related to the formation of a joint venture. The preliminary activities to be conducted in this joint venture are development and production of new products and applications based on NIL technology, as well as manufacturing of lithography equipment for the Asian market. If the joint venture is successfully established the counterparty's intention is to place an order for five Sindre 400 NIL systems at a preliminary value of 1 MEUR each. The negotiations are expected to be finalized during the first quarter 2017. This is information that Obducat AB (publ.) is required to disclose pursuant to the EU Market Abuse Regulation. The information was submitted for publication, through the agency of the contact persons set out below, on December 16th 2016 at 08.30 CET. This information was brought to you by Cision http://news.cision.com http://news.cision.com/obducat/r/obducat-signs-letter-of-intent-concerning-a-joint-venture-with-asian-led-player,c2151617 The following files are available for download:


Forchheimer D.,Lund University | Forchheimer D.,KTH Royal Institute of Technology | Luo G.,Lund University | Luo G.,Obducat AB | And 2 more authors.
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics | Year: 2011

Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity. © 2011 American Vacuum Society.


Zhou Y.,Obducat AB | Luo G.,Obducat AB | Asbahi M.,Norwegian University of Science and Technology | Eriksson T.,Obducat AB | And 5 more authors.
Microelectronic Engineering | Year: 2012

A simple method for replicating metallic stamp from original masters via combined nanoimprint and electroforming is presented. In this work we demonstrate the generality of the method by replicating structures with dimensions ranged from several microns to sub-100 nm in large patterned area. The structures were transferred first into an intermediate polymer sheet (IPS) with good uniformity and high structural fidelity, and then this IPS was used as the galvano-template for nickel electroforming. The major advantage of the method relies on the pattern transfer occurred between a soft polymer and the hard master, thereby the risk of damaging the mold is extremely low. © 2011 Elsevier B.V. All rights reserved.


Meng F.,Dalian University of Technology | Meng F.,Lund University | Luo G.,Obducat AB | Maximov I.,Lund University | And 7 more authors.
Nanotechnology | Year: 2011

Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning - both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning. © 2011 IOP Publishing Ltd.


Zhou Y.,Obducat AB | Asbahi M.,Obducat AB | Luo G.,Obducat AB | Eriksson T.,Obducat AB | And 3 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2010

In order to realize industrial level manufacturing using Nano Imprint Lithography, one of the key challenges is to supply stamps for the high volume machines. The master stamp is typically time consuming to produce and thus very expensive. It is therefore preferable to produce the maximum amount of replicated stamp from a master and to ensure that each stamp replica can deliver as many imprints as possible without losing yield. Currently, stamp replication is an area of intense development. How to produce a replicated a stamp and how many replicas that can be achieved from each master depend both on feature sizes, pattern density as well as aspect ratio of the structures. Several different techniques can be combined in order to obtain a large number of stamp replicas from each master. The ability to combine several different techniques enables the choice of the ideal technique suited for each structure type. This paper will focus on how to address stamp replication challenges in order to secure an adequate supply of stamps to enable high volume manufacturing with Nano Imprint Lithography. Results will be presented on the number of stamps that can be manufactured from each master as well as the lifetime of each individual stamp. © 2010 Copyright SPIE - The International Society for Optical Engineering.


Meng F.,Dalian University | Chu J.,Dalian University | Luo G.,Obducat AB | Han Z.,Dalian University | Wang Z.,Dalian University
Key Engineering Materials | Year: 2011

Flexible polymer stamps are considered as an attractive alternative to rigid, brittle and expensive stamps made of inorganic materials because of their low cost and ease of fabrication. In this paper, we present a nanoimprint process to fabricate large area, high-resolution nanograting patterns using flexible polymer stamp made from fluoropolymer. The flexibility and low surface energy of polymer stamp provide a clean release without fracture or deformation of the stamp and of the replicated nanograting. Large-area, high-density nanograting patterns with good shape homogeneity and size uniformity have been successfully fabricated using the flexible polymer stamp with advantages of its good conformal contact and low adhesion. Using flexible polymer stamps can resolve many serious issues in NIL and therefore can bring it to real industrial applications. © (2011) Trans Tech Publications.


The invention provides a modification of a polymer film surface interaction properties. In this process a polymer carrier object is covered by a chemical composition, comprising photo-polymerizable compounds, photo-initiators or catalysts with the ability to initiate polymerization and semi-fluorinated molecules. The so-produced polymer mold contains semi-fluorinated moieties, which are predominantly located on the surface and on the surface near region of the patterned surface. The polymer mold is suitable as a template with modified properties in a nano-imprint lithography process.


A method and process for obtaining a metal stamp from an intermediate polymer stamp comprising the steps of providing a first print layer on top of a first polymer layer, imprinting structures to obtain an intermediate stamp. A conductive layer is provided on top of the structures to obtain a seed layer if the imprinted polymer is a non-conductive, plating metal on top of the intermediate polymer stamp to obtain a metal stamp then separating the intermediate stamp from the metal stamp. This invention demonstrates stamp replication in high throughput and at low cost.


Patent
Obducat AB | Date: 2016-06-29

A demolding device (3) for use in an imprint machine, in which machine a foil (31) is intermittently passed in a feed direction over a press region (7) where a stamp is pressed against the foil for imprinting a surface pattern. The demolding device comprises a carrier (12), a pressing roller (9) mounted in the carrier, and a demolding roller (8) mounted parallel to the pressing roller in the carrier, wherein the carrier is configured to slide over the press region against the feed direction while rolling the foil under the pressing roller and over the demolding roller for detaching the foil from the stamp after imprinting of the pattern.

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