Nissan Chemical Industries Ltd.

Toyama-shi, Japan

Nissan Chemical Industries Ltd.

Toyama-shi, Japan
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Patent
Nissan Chemical Industries Ltd. | Date: 2017-05-17

There is provided a method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. A method for producing an active silicic acid solution fulfilling the following condition: (1) the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method characterized by including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 m is 50% or more, and whose filtering rate is 13 L/min to 400 L/min per 1 m^(2) of the filtration area of the used filter.


Patent
Nissan Chemical Industries Ltd. | Date: 2017-05-17

Provided are a fluorine-atom-containing polymer that is a condensation polymer of a fluorine-atom-containing triphenylamine derivative giving a repeating unit represented by formula (1) and a fluorene derivative giving a repeating unit represented by formula (2) and the use of this fluorine-atom-containing polymer.^(1) and R^(2) represents any of an alkoxyl group, an alkenyloxy group, an alkynyloxy group, an aryloxy group, a heteroaryloxy group, and an alkyl group including at least one ether structure, R^(3)-R^(6) represent prescribed substituents, m^(1) and m^(2) each independently represent an integer of 0-4, n^(1) and n^(2) represent an integer of 0-3.)


The invention provides a charge-transporting varnish, containing a charge-transporting substance formed of an indolocarbazole represented by the following formula (1), a dopant substance, and an organic solvent.


Patent
Nissan Chemical Industries Ltd. | Date: 2017-05-17

A charge-transporting varnish according to the present invention includes a charge-transporting substance, a dopant substance, and an organic solvent, wherein the charge-transporting substance contains at least one selected from N,N-di(l-naphthyl)benzidine, N,N-di(2-naphthyl)benzidine, and N-(1-naphthyl)-N-(2-naphthyl)benzidine. The charge-transporting varnish allows formation of a charge-transporting thin film with which an organic EL element excellent in durability can be achieved when the charge-transporting thin film is applied to a hole injection layer.


Patent
Nissan Chemical Industries Ltd. | Date: 2017-02-08

The present invention provides a polymerizable composition suitable for producing a molding that maintains a high refractive index and a low Abbes number, discoloration (thermal yellowing) resulting from high thermal hysteresis can be reduced, no Tg and a low CTE are exhibited, and has good mold release properties. A polymerizable composition comprising: 100 parts by mass of a reactive silicone compound (a) obtained by polycondensation, in the presence of an acid or a base, of a polycondensable compound containing at least a diarylsilicic acid compound A, an alkoxy silicon compound B having a phenyl group or a naphthyl group having at least one group having a polymerizable double bond, and an alkoxy silicon compound C containing a fluoro group; and 1 part by mass to 200 parts by mass of a (meth) acrylate compound (b), and a cured product and a material for high refractive index resin lens which are obtained from the polymerizable composition.


Patent
Nissan Chemical Industries Ltd. | Date: 2017-02-01

A production method for forsterite fine particles having a primary particle diameter of 1-200nm when observed using an electron microscope, said method being characterized in that a solution containing a water-soluble magnesium salt and a colliodal silica at a magnesium atom and silicon atom mol. ratio (Mg/Si) of 2 is spray-dried at equal to or greater than 50C and less than 300C and, subsequently, fired in an atmosphere of 800-1000C.


Provided are an oligoaniline derivative represented by formula (1), a charge-transporting varnish comprising the oligoaniline derivative, and an organic EL element.^(1) is a hydrogen atom or optionally substituted alkyl group, R^(2) to R^(10) are each independently a hydrogen atom, halogen atom, nitro group, cyano group, or optionally substituted alkyl group, alkenyl group, alkynyl group, aryl group, or heteroaryl group; A is an optionally substituted fluoroalkyl group, fluorocycloalkyl group, fluorobicycloalkyl group, fluoroalkenyl group, or fluoroalkynyl group, optionally substituted fluoroaryl group, substituted phenyl group, optionally substituted fluoroaralkyl group, or substituted aralkyl group; and n^(1) is an integer of 1 to 20.)


Patent
Nissan Chemical Industries Ltd. | Date: 2017-01-04

There is provided a polymerizable composition that is suitable to produce a molded product that can suppress cracking and dimensional change caused by a high-temperature heat history with a high refractive index of a cured product maintained. A polymerizable composition comprising (a) 100 parts by mass of the specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of the specific fluorene compound, a cured product obtained by the polymerizable composition and a material for a high-refractive index resin lens comprising the polymerizable composition.


Patent
Nissan Chemical Industries Ltd. and Kyusyu Nanotec Optics Co. | Date: 2017-09-13

To provide a liquid crystal display device, whereby transparency when no voltage is applied and scattering properties when a voltage is applied, are good, adhesion between a liquid crystal layer and a vertical liquid crystal alignment film is high, and its lifespan is long even in a severe environment. The liquid crystal display device has a liquid crystal layer formed by disposing a liquid crystal composition containing a liquid crystal and a polymerizable compound between a pair of substrates provided with electrodes, and irradiating and curing the composition with ultraviolet rays by an ultraviolet irradiation apparatus, and at least one of the substrates is provided with a liquid crystal alignment film to vertically align a liquid crystal, wherein the ultraviolet irradiation apparatus is an ultraviolet irradiation apparatus capable of controlling the irradiation light intensity and wavelength of the ultraviolet rays to be irradiated and the surface temperature of the pair of the substrates, the liquid crystal composition contains a compound represented by the formula [1], and the liquid crystal alignment film is a liquid crystal alignment film obtained from a liquid crystal alignment treating agent containing a polymer having a side chain structure represented by the formula [2-1] or formula [2-2].^(1) is a specific side chain structure; X^(2), X^(3), X^(4) and X^(6) are each a single bond, etc.; X^(5) and X^(7) are each a benzene ring, etc.; p is an integer of from 0 to 4; and X^(8) is a C_(1-18) alkyl group, etc.),^(1), Y^(2) and Y^(3) are each a single bond; Y^(4) and Y^(5) are each a benzene ring, etc.; n is from 0 to 4; and Y^(6) is a C_(1-18) alkyl group, etc.,-Y^(7)-Y^(8)[2-2](Y^(7) is a single bond; and Y^(8) is a C_(8-22) alkyl group, etc.).


Patent
Nissan Chemical Industries Ltd. | Date: 2017-09-27

There is provided film-forming composition having favorable effects such as curability and embeddability and resist underlayer film for use in lithography process for semiconductor devices. A film-forming composition comprising, as silane, hydrolyzable silane, hydrolysis product thereof, or hydrolysis-condensation product thereof, wherein hydrolyzable silane includes hydrolyzable silane of Formula (1):R^(1)_(a)R^(2)_(b)Si(R^(3))_(4-(a+b))Formula (1)in Formula (1), R^(1) is organic group of Formula (2) and is bonded to silicon atom through Si-C bond: Film-forming composition, wherein the hydrolyzable silane is combination of hydrolyzable silane of Formula (1) with another hydrolyzable silane, wherein other hydrolyzable silane is at least one selected from group consisting of hydrolyzable silane of Formula (3):R^(7)_(c)Si(R^(8))_(4-c)Formula (3)and hydrolyzable silane of Formula (4):(R^(9)_(d)Si(R^(10))_(3-d)]_(2)Y_(e)Formula (4) Resist underlayer film, obtained by applying the resist underlayer film-forming composition on semiconductor substrate and baking.

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