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Patent
Nissan Chemical Industries Ltd. | Date: 2016-04-12

A substituted alkenylbenzene compound of formula (4): wherein X^(1 )is selected from the group consisting of halogen atom, SF_(5), C_(1)-C_(6)halo alkyl, hydroxy C_(1)-C_(6)haloalkyl, C_(1)-C_(6)alkoxy C_(1)-C_(6)haloalkyl, C_(3)-C_(8)halocycloalkyl, C_(1)-C_(6 )haloalkoxy, C_(1)-C_(3)haloalkoxy C_(1)-C_(3)haloalkoxy, C_(1)-C_(6)haloalkylthio, C_(1)-C_(6)haloalkylsulfinyl and C_(1)-C_(6)haloalkylsulfonyl; X^(3 )is selected from the group consisting of a hydrogen atom, halogen atom, cyano, nitro, C_(1)-C_(6)alkyl, C_(1)-C_(6)haloalkyl, C_(1)-C_(6)alkoxy and C_(1)-C_(6 )alkylthio; X^(4 )is selected from the group consisting of a hydrogen atom, halogen atom, cyano, C_(1)-C_(4)alkyl, C_(1)-C_(4)alkoxy and C_(1)-C_(4)haloalkoxy; R^(3 )is C(R^(3a))(R^(3b))R^(3c), where R^(3a )and R^(3b )independently of each other are a halogen atom, or R^(3a )and R^(3b )together form 3- to 6-membered ring together with the carbon atom bonding them by forming a C_(2)-C_(5)haloalkylene chain, and R^(3c )is selected from the group consisting of a hydrogen atom, halogen atom, C_(1)-C_(5)alkyl, C_(1)-C_(5)haloalkyl, C_(1)-C_(4)haloalkoxy and C_(1)-C_(4)haloalkylthio, with a proviso that in case where X^(1 )is a fluorine atom, chlorine atom or trifluoromethyl, and both X^(2 )and X^(3 )are a hydrogen atom, in case where both X^(1 )and X^(2 )are fluorine atom and X^(3 )is a hydrogen atom, and in case where both X^(1 )and X^(2 )are trifluoromethyl and X^(3 )is a hydrogen atom, R^(3c )is a hydrogen atom, chlorine atom, bromine atom, iodine atom, C_(1)-C_(5)alkyl, C_(1)-C_(5)haloalkyl, C_(1)-C_(4)haloalkoxy or C_(1)-C_(4)haloalkylthio.


Patent
Waseda University and Nissan Chemical Industries Ltd. | Date: 2016-03-09

A ion-conductive fused-ring quinone polymer includes recurring units of formula (1) and/or (2) below wherein each X is independently a single bond or a divalent group, and A^(1 )and A^(2 )are each independently an aromatic hydrocarbon ring or an oxygen atom or sulfur atom-containing aromatic heterocycle that forms together with two carbon atoms on a benzoquinone skeleton. This polymer is a material having charge-storing properties which, when used as an electrode active material, is capable of providing a high-performance battery possessing high capacity, high rate characteristics and high cycle characteristics.


Patent
Waseda University and Nissan Chemical Industries Ltd. | Date: 2016-03-09

Materials having charge-storing properties and made variously of dipyridine-fused benzoquinones of formula (1) below or derivatives thereof, dipyridine-fused benzoquinones of formula (4) below or derivatives thereof, or dipyridine-fused benzoquinone skeleton-containing polymers are provided. In the formulas, Ar^(1 )and Ar^(2 )are each independently a pyridine ring that forms together with two carbon atoms on a benzoquinone skeleton, or a derivative thereof. When used as electrode active materials, these charge storage materials are capable of providing high-performance batteries possessing a high capacity, high rate characteristics and high cycle characteristics.


Patent
Nissan Chemical Industries Ltd. | Date: 2017-04-12

A charge-transporting thin film, which enables the achievement of an organic EL element having excellent durability in cases where the charge-transporting thin film is applied to a hole injection layer of the element, is obtained using a charge-transporting varnish that contains a charge-transporting substance, a nonionic fluorine-containing surfactant and an organic solvent, and wherein the nonionic fluorine-containing surfactant has, for example, a perfluoroalkenyl group-containing perfluorohydrocarbon structure represented by one of formulae (1)-(3) and an alkylene oxide structure.


Provided is an arylsulfonic acid compound characterized by being represented by formula (1).^(1) represents a group represented by formula (2) (in formula (2), R^(1) to R^(5) each independently represent a hydrogen atom, halogen atom, cyano group, nitro group, methyl group, or trifluoromethyl group; however, at least one of R^(1) to R^(5) represents a halogen atom) and Ar^(2) represents a group represented by formula (3) or (4).]


Patent
Nissan Chemical Industries Ltd. | Date: 2016-07-06

The present invention provides a pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method comprising: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a forth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.


Patent
Nissan Chemical Industries Ltd. | Date: 2016-03-30

A silica sol having a silica particle size/average primary particle size ratio measured by dynamic light scattering of 3.0 or lower, the silica sol containing silica particles having an average primary particle size of 20-100 nm surface modified by an organic silane compound having -ray emission of 0.005 count/cm^(2)hr or less and a coefficient of moisture absorption of 0.5 mass% or less when allowed to stand for 48 hours in a 23C, 50% relative humidity (RH) environment.


Patent
Nissan Chemical Industries Ltd. | Date: 2016-10-26

There is provided an epoxy resin composition in a liquid or solid state having excellent solubility and having high preservation stability. A modified epoxy resin composition characterized by comprising:Compound A containing tris-(2,3-epoxypropyl)-isocyanurate having 1 to 3 glycidyl group(s) in a molecule substituted with a functional group(s) of Formula (1):^(1) and R^(2) are each independently an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an aralkyl group, a heterocyclic group; or a halogenated derivative, an aminated derivative, or a nitrated derivative of these groups; and Compound B containing tris-(2,3-epoxypropyl)-isocyanurate, wherein tris-(2,3-epoxypropyl)-isocyanurate of Compound A before the substitution and tris-(2,3-epoxypropyl)-isocyanurate of Compound B comprises 2% by mass to 15% by mass of -type tris-(2,3-epoxypropyl)-isocyanurate and a remaining percentage of -type tris-(2,3-epoxypropyl)-isocyanurate based on a total mass of Compound A before the substitution and Compound B.


Patent
Nissan Chemical Industries Ltd. | Date: 2016-03-02

There is provided a thickening composition. A thickening composition comprising: an electrolyte; and cellulose fibers having an average fiber diameter (D) of 0.001 to 100 m and containing hemicellulose and amorphous regions.


Patent
Nissan Chemical Industries Ltd. | Date: 2016-02-24

There is provided a material having a low refractive index that exhibits a sufficiently low refractive index without deteriorating the strength of the cured film produced therefrom, and that can be cured by an active energy ray that is applicable for a resin base material that is not desired to be exposed to heat. A curable composition comprising: a siloxane oligomer (a) containing a radically polymerizable double bond obtained through hydrolysis and condensation of alkoxysilanes containing at least an alkoxysilane A of Formula [1] and an alkoxysilane B of Formula [2] in an amount of 100 parts by mass; inorganic fine particles (b) in an amount of 10 parts by mass to 1,000 parts by mass; and a polymerization initiator (c) generating a radical upon active energy ray irradiation in an amount of 0.1 parts by mass to 25 parts by masR[1]R[2]a cured film produced from the composition, and a laminate comprising a low refractive index layer produced from the composition.

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