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Rousset, France

Grant
Agency: Cordis | Branch: H2020 | Program: IA | Phase: NMP-05-2014 | Award Amount: 8.01M | Year: 2015

Printed electronics (PE) is set to revolutionise the electronics industry over the next decade and can offer Europe the opportunity to regain lost market share. Printed electronics allows for the direct printing of a range of functional (conductive, resistive, capacitive and semi-conducting) nanomaterials formulations to enable a simpler, more cost-effective, high performance and high volume processing in comparison to traditional printed circuit board and semiconductor manufacturing techniques. It has been reported by Frost and Sullivan that the market for printed electronics will increase in revenues from $0.53Bn in 2010 to $5.04 Bn in 2016 at a compound annual growth rate of 32.5%. However, the migration towards low-cost, liquid-based, high resolution deposition and patterning using high throughput techniques, such as inkjet printing, requires that suitable functional nanomaterials formulations (e.g. inks) are available for end users in industrially relevant quantities. Presently, there are issues with industrial supply of nanomaterials which are low cost, high performance, environmentally friendly and tailored for high throughput systems. Therefore better collaboration is warranted between supply chain partners to ensure nanomaterial production and nanomaterial formulations are tailored for end use applications to meet this need. The INSPIRED project will address these fundamental issues within the printed electronics industry: Ensuring that suitable functional nanomaterials formulations (inks) are available for end users in industrial scale quantities. Production of these nanomaterial formulations on an industrial scale and then depositing them using cost-effective, high throughput printing technologies enables rapid production of printed electronic components, on a wide variety of substrates. Therefore, enabling new electronics applications, whilst overcoming the problems associated with traditional manufacturing.


Patent
Nexcis and Aix - Marseille University | Date: 2013-12-09

A photoreflectance device for characterizing a rough surface includes a pump beam emitter to emit a pump beam; a probe beam emitter to emit a probe beam; a detector to detect the probe beam reflected by the surface; an integrating sphere to collect the probe beam reflected by the surface, the integrating sphere including: a first output connected to the detector, and disposed so as to receive a majority of the probe beam reflected by the surface; a second output arranged so as to receive a majority of the pump beam reflected by the surface.


The invention relates to the production of a thin film having photovoltaic properties, containing a I-III-VI


The present invention relates to the manufacture of a photovoltaic cell panel, said manufacture comprising the steps of: a) obtaining photovoltaic (PV) films that are each intended for a cell and are placed onto a front surface of a metal substrate; b) applying at least one conductive film (CG, CND) onto each front surface of a photovoltaic film; c) cutting up the substrate (SUB) so as to isolate the cells from each other; and d) encapsulating (ENC) the cells on a common mounting. According to the invention, steps d) and c) are reversed, so step d) relates to encapsulating the front surface of the substrate before step c), cutting the substrate up by the rear surface thereof. Additionally,in step b), an area of the conductive film is extended over the substrate so that the conductive film simultaneously makes contact with the front surface of the photovoltaic film and the front surface of the substrate, andin step c), the substrate is cut up so as to avoid short-circuiting between the photovoltaic cells, at least under the above-mentioned area of the conductive film and over a substrate width less than the width of the area.


Grant
Agency: Cordis | Branch: FP7 | Program: CP-IP | Phase: ENERGY.2011.2.1-2;NMP.2011.1.2-1 | Award Amount: 10.02M | Year: 2012

This project will exploit the potential of chalcogenide based thin film photovoltaic technologies for the development and scale-up of new processes based on nanostructured materials for the production of high efficiency and low cost photovoltaic devices and modules compatible with mass production requirements. Cu(In,Ga)(S,Se)2 (CIGS) chalcogenide based devices have the highest efficiency of all thin film PV technologies, having recently achieved a record value of 20.3% at cell level. These technologies have already entered the stage of mass production, with commercial modules that provide stable efficiencies in the 11-12% range, and a predicted world-side production capacity over 2 GW/a for 2011. However, current production methods in CIGS industrial technologies typically rely on costly, difficult to control (over large surfaces) vacuum-based deposition processes that are known for low material utilisation of 30-50%. This compromises the potential reduction of material costs inherent to thin film technologies. At the forefront of this, the SCALENANO project proposes the development of alternative environmental friendly and vacuum free processes based on the electrodepositon of nanostructured precursors with the objective to achieve a much more efficient exploitation of the cost saving and efficiency potential of CIGS based PV. The project also includes the exploration and development of alternative new processes with very high potential throughput and process rate based in the use of printing techniques with novel nanoparticle ink formulations and new cost effective deposition techniques, that will allow proposing an industrial roadmap for the future generation of chalcogenide based cells and modules

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