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Irvine, CA, United States

Ryaboy V.M.,Newport Corporation
Journal of Sound and Vibration | Year: 2014

Pneumatic vibration isolation is the most widespread effective method for creating vibration-free environments that are vital for precise experiments and manufacturing operations in optoelectronics, life sciences, microelectronics, nanotechnology and other areas. The modeling and design principles of a dual-chamber pneumatic vibration isolator, basically established a few decades ago, continue to attract attention of researchers. On the other hand, behavior of systems of such isolators was never explained in the literature in sufficient detail. This paper covers a range of questions essential for understanding the mechanics of pneumatic isolation systems from both design and application perspectives. The theory and a model of a single standalone isolator are presented in concise form necessary for subsequent analysis. Then the dynamics of a system of isolators supporting a payload is considered with main attention directed to two aspects of their behavior: first, the static stability of payloads with high positions of the center of gravity; second, dynamic stability of the feedback system formed by mechanical leveling valves. The direct method of calculating the maximum stable position of the center of gravity is presented and illustrated by three-dimensional stability domains; analytic formulas are given that delineate these domains. A numerical method for feedback stability analysis of self-leveling valve systems is given, and the results are compared with the analytical estimates for a single isolator. The relation between the static and dynamic phenomena is discussed. © 2013 Elsevier Ltd.


Patent
Newport Corporation | Date: 2014-01-30

An optical mount system that may be adjusted by a variety of devices and methods. In some cases, a post collar assembly may be configured to engage a collar coupling surface of a post holder body such that the post collar engages the collar coupling surface in indexed and predetermined angular positions. In some cases, a base of a post holder body may be configured to accept a secondary base element in the form of a mounting adapter which may be releasably secured the base to provide additional stiffness for the mounting of the base to a reference surface.


Patent
Newport Corporation | Date: 2015-04-23

Demultiplexing systems and methods are discussed which may be small and accurate without moving parts. In some cases, demultiplexing embodiments may include optical filter cavities that include filter baffles and support baffles which may be configured to minimize stray light signal detection and crosstalk. Some of the demultiplexing assembly embodiments may also be configured to efficiently detect U.V. light signals and at least partially compensate for variations in detector responsivity as a function of light signal wavelength.


Patent
Newport Corporation | Date: 2014-04-15

A piezoelectric actuator that may include a monolithic frame having an integral bias band that provides a resilient restoring force between a first contact surface and a second contact surface of the actuator that may be used to rotate an adjustment shaft. In some cases, a preload mechanism may also be included with the frame. Such piezoelectric actuators may be used for adjustable optical mounting devices such as optical mounting devices.


System and method are disclosed for measuring properties (e.g., shrinkage) of a photosensitive material (e.g., photoresist) while undergoing a defined photolithography process. The system includes a photolithography processing system adapted to perform a defined photolithography process of the photosensitive material, and a coherent anti-Stokes Raman scattering (CARS) microscopy system adapted to perform measurement of the properties of the photosensitive material. In another aspect, the CARS microscopy system is adapted to measure properties of the photosensitive material simultaneous with the defined photolithography process being performed on the photosensitive material by the photolithography processing system. In still another aspect, the CARS microscopy system is adapted to measure properties of the photosensitive material while the defined photolithography process on the photosensitive material is paused. Another system is adapted to perform similar measurements during the manufacturing of the photosensitive material.

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