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Li D.,National Key Laboratory of Novel Micro Nano Device and System | Li D.,Chongqing University | Wen Z.,National Key Laboratory of Novel Micro Nano Device and System | Wen Z.,Chongqing University | And 4 more authors.
Bandaoti Guangdian/Semiconductor Optoelectronics | Year: 2011

Aiming at the problems such as high cost and long processing period in fabricating glass-based microfluidic chips, a simple and low cost fabrication process based on wet etching technology was proposed. Commercial glass slide was used as the substrate, and the general negative photoresist RFJ-220 was used as the etching mask. By optimizing the processing parameters of photolithography and wet etching, microchannels with the depth greater than 40 μm, undercut ratio of 1.25:1 and surface roughness less than 5.2 nm were obtained. The problem of adhesion between the photoresist and the substrate was solved. It was also analyzed the influence of corrosive liquid ratio and etching methods on the microchannel surface topography. The whole process is simple, low cost, reliable, and can be widely used in the fabrication of glass based microfluidic chip.

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