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Popescu A.-M.,Ilie Murgulescu Institute of Physical Chemistry | Constantin V.,Ilie Murgulescu Institute of Physical Chemistry | Soare V.,National Institute of Research | Tircolea M.,University of Bucharest | Olteanu M.,Ilie Murgulescu Institute of Physical Chemistry
Revista de Chimie

This Study deals with the obtaining of corrosion protection Zn-Ni-P films deposited on steel products. The protective thin layers were deposited by both electrochemical and electroless processes in aqueous solutions. The development of such deposition techniques of films with high mechanical and chemical resistance will contribute to the gradual replacement of the conventional corrosion protection method through thermal zinc plating. The obtained Zn-Ni-P films have been characterized by scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX) in an attempt to understand the chemistry and structure of the films before and after the corrosion process. The corrosion behaviour in 3.5 wt% NaCl solution of different samples of thin Zn-Ni-P films deposited on steel (which differ by the way of preparation) was determined by open circuit potential vs. time curves, linear polarization and Tafel plots and compared with the behaviour of steel support. The corrosion parameters were calculated and the obtained results were correlated with the micrographic images of the studied samples. The influence of Zn/Ni ratio and P content of the alloy on the corrosion protection properties was evaluated. Source

Janta D.,National Institute of Public Health | Janta D.,U.S. Center for Disease Control and Prevention | Stanescu A.,National Institute of Public Health | Lupulescu E.,National Institute of Research | And 2 more authors.

A rubella outbreak has been ongoing in Salaj, Romania since September 2011 involving 1,840 probable and confirmed cases among mainly unvaccinated adolescents. The index case had onset of illness on 6 September 2011. The highest number of cases was recorded among 10-14-year-olds and 15-19-year-olds. Complications were recorded for 11 cases and included meningitis and arthritis. Although the peak has passed, surveillance is being maintained in the region. Source

Papadopoulos N.,National Technical University of Athens | Karayianni C.-S.,National Technical University of Athens | Tsakiridis P.,National Technical University of Athens | Sarantopoulou E.,National Institute of Research | Hristoforou E.,National Technical University of Athens
Chemical Vapor Deposition

Cobalt thin films are deposited by metal-organic (MO)CVD, under various experimental conditions, on Si and SiO2 substrates. The precursors used are cobalt nitrosyl tricarbonyl, Co(CO)3NO, cobalt acetylacetonate, Co(acac)2, and cobalt carbonyl, Co 2(CO)8. Emphasis is given to the delivery method of each precursor, especially to a new technique of aerosol delivery. The films are thoroughly examined in terms of microstructure and surface morphology in order to establish relevance to magnetic properties. It is found that Co films deposited from Co2(CO)8 dissolved in dichloromethane are characterized by a high degree of planarity and purity, while exhibiting a non-hysteretic giant magnetoresistance (GMR) behavior in the presence of an externally applied magnetic field normal to their surface. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Source

Velicu I.-L.,Al. I. Cuza University | Neagu M.,Al. I. Cuza University | Chiriac H.,National Institute of Research | Tiron V.,Al. I. Cuza University | Dobromir M.,Al. I. Cuza University
IEEE Transactions on Magnetics

Using high-power impulse magnetron sputtering (HiPIMS) technique, Fe 73.5Cu 1Nb 3Si 15.5B 7 thin films with thickness between 40 and 700 nm were deposited. The influence of deposition conditions (deposition time and argon pressure) and of the annealing temperature on the structure and coercive magnetic field of the magnetic films was analyzed. In the as-deposited state, the coercive magnetic field presents a minimum at about 10 mtorr argon pressure. The X-ray diffraction studies show that in the as-deposited state, the samples are amorphous, while after annealing at temperatures between 400°C to 525°C, α-Fe(Si) grains start to nucleate, the grain size varying from 2 to 18 nm. The Curie temperature of as-deposited amorphous phase and the onset of the primary crystallization are 355°C and 460°C , respectively. The lowest coercive magnetic field was obtained after annealing at 475°C. © 2006 IEEE. Source

Papadopoulos N.D.,National Technical University of Athens | Karayianni H.S.,National Technical University of Athens | Tsakiridis P.E.,National Technical University of Athens | Perraki M.,National Technical University of Athens | And 2 more authors.
Journal of the Electrochemical Society

A novel precursor based on the inclusion complex of Β -cyclodextrin with Co I2 is proposed for the deposition of cobalt oxide films by metallorganic chemical vapor deposition (MOCVD). Deposition is viable through an abnormal behavior of the inclusion molecules during heating. A decomposition mechanism based on experimental results is proposed, while the films are examined in terms of microstructure, electrical, and magnetic properties. A uniform, nanocrystalline structure of Co3 O4 was revealed, along with impurities of silicide phases. The films presented a semiconducting behavior and minor in-plane magnetization. © 2010 The Electrochemical Society. Source

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