Nanotools Gmbh | Date: 2008-07-29
Scientific apparatus and instruments, namely scanning probes for use in scanning probe microscopes for detecting structures on the submicron scale by mechanically contacting said structures. Material processing, namely, using semiconductor processing methods for the coating of carrier materials, namely, silicon, carbon, silicon oxide, silicon nitride, or silicon carbide in the preparation of probes for scanning microscopes; custom production of prods for probe devices for microscopes that use additive and/or subtractive, chemical and/or mechanical and/or electronic methods; materials processing of probe devices, namely, scanning probes for microscopes by coating, using mechanical or electronic or chemical methods; treatment of materials, namely, silicon, carbon, silicon oxide, silicon nitride, or silicon carbide, by coating, etching, metallizing, annealing, oxidizing or laser treatment; coating silicon, carbon, silicon oxide, silicon nitride, or silicon carbide with metals, insulators, semiconductors or organic chemicals for the purpose of producing conductive probes, insulating probes or semi-conducting probes for scanning microscopes [ ; etching of surfaces, namely, silicon, carbon, silicon oxide, silicon nitride, or silicon carbide by using wet chemical, dry chemical or mechanical or electronic methods. ]. [ Scientific and industrial research, namely, in the area of mesoscopic technology; development of calibrations standards; using scanning electron microscopes and atomic force microscopes to analyze surfaces and present visual representations of the surfaces so analyzed; scientific investigations, scientific analyses, scientific recordings, and scientific evaluations, namely, using scanning electron microscopes and atomic force microscopes, in the field of microtechnology or nanotechnology. ].
Agency: Cordis | Branch: FP7 | Program: CP-TP | Phase: NMP.2012.1.4-3 | Award Amount: 4.33M | Year: 2013
Knowing the mechanical properties of workpieces and machine-tools also at the nanometer scale is an absolute necessity for an efficient nanoscale production. Current technologies are lacking the flexibility and robustness needed for measuring such key parameters as topography, morphology, roughness, adhesion, or micro- and nano-hardness directly in a production environment. This hinders rapid development cycles and resource efficient process and quality control. The following technology and methodology gaps for addressing these challenges were identified: Efficient disturbance rejection and systems stability; robustness and longevity of probes; short time to data (i.e. high-speed measurements and data handling); and traceability of the measurement. The project aim4np strives at solving this problem by combining measuring techniques developed in nanoscience with novel control techniques from mechatronics and procedures from traceable metrology. Goal and Deliverable The main deliverable will be a fast robotic metrology platform and operational procedures for measuring with nanometer resolution and in a traceable way the topography, morphology, roughness, micro- and nano-hardness, and adhesive properties of large samples in a production environment.