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Kanata, Canada

Atkinson G.M.,University of Western Ontario | Yenier E.,University of Western Ontario | Greig D.W.,Nanometrics
Seismological Research Letters | Year: 2014

We develop a simple model to estimate moment magnitude for events of M <4 at distances out to ∼300 km, based on readily available ShakeMap parameters and seismological scaling principles. Estimates of moment magnitude for such small events are not available from standard methods but are needed for local-network applications and for traffic light systems for induced-seismicity applications. This issue is currently of particular interest in central and eastern North America. The method takes advantage of the fact that for small events the response spectrum is well-correlated with seismic moment for periods greater than 0.3 s and can be predicted from a simple stochastic point-source model. We develop an equation by which we calculate M from the 1 s pseudoacceleration amplitudes (PSA) (M ≥3) or the 0.3 s PSA (M <3) at each station, using a simple linear equation that corrects for the effects of attenuation. We show that this method produces unbiased estimates of moment magnitudes in both eastern and western North America, for M ≤4 events recorded at distances <300 km. Source

Hosler E.R.,Globalfoundries | Kamineni V.,Globalfoundries | Preil M.,Globalfoundries | Keller N.,IBM | And 2 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2015

Measurement and control of line edge roughness (LER) is one of the most challenging issues facing patterning technology. As the critical dimensions (CD) of patterned structures decrease, LER of only a few nanometers can negatively impact device performance. Here, Mueller matrix spectroscopic ellipsometry (MMSE) based scatterometry is used to determine LER in periodic line-space structures in 28 nm pitch Si fin samples fabricated by directed selfassembly (DSA) patterning. The optical response of the Mueller matrix (MM) elements is influenced by structural parameters like pitch, CD, height, and side-wall angle (SWA), as well as the optical properties of the materials. Evaluation and decoupling MM element response to LER from other structural parameters requires sensitivity analysis using simulations of optical models that include LER. Here, an approach is developed that quantifies Si fin LER by comparing the optical responses generated by systematically varying the grating shape and measurement conditions. Finally, the validity of this approach is established by comparing the results obtained from top down scanning electron microscope (SEM) images and cross-sectional TEM image of the 28 nm pitch Si fins. © 2015 SPIE. Source

Bandyopadhyay S.,Nanometrics
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2015

Applications of interferometer are countless both in the research and commercial world. Laser sources offer precise measurements of relative path difference between two interfering beams. An exciting example is LIGO (laser Interferometer for Gravitational Observatory), which is aiming to resolve length change as small as 10-19 m over a 4 km length for detection of gravitational waves. However, laser is a disadvantage for microscopic imaging and surface topography applications usually required in semiconductor industry. A different approach for microscopy is to use white light in place of laser. White light due to its limited temporal coherence offers a multitude of benefits for imaging applications. An immediate benefit from white light is the sharp localisation of interference fringe that makes the 3D topography construction or OCT (Optical Coherence Topography) realisable using a Scanning White Light Interferometer (SWLI) imager. In Mirau Mode, SWLI performs high resolution imaging; whereas in Michelson mode Fourier Transform Spectroscopy (FTS) is realised. SWLI can easily be modified into PUPS (Pupil Plane SWLI) for Ellipsometry. Superimposing Michelson Interferometer known as VISAR (Velocity Interferometer System for Any reflector) can form interference fringes even in presence of wide angle light scattered from a moving illuminated object. This paper describes work undertaken at Nanometrics (UK) on simulation of SWLI fringes including high Numerical Aperture (NA) applications, thin film characterisation, OCT generation and Zemax modelling of compact dispersion-free vibration-immune Fourier-Transformed spectrometer. VISAR as a modified Mach-Zehnder Interferometer is also discussed based on the work at Rutherford-Appleton laboratory (UK). © 2015 Copyright SPIE. Source

Home > Press > Nanometrics to Announce Fourth Quarter and Full Year Financial Results on February 2, 2016 Abstract: Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control systems, will release its fourth quarter and full year 2015 financial results after market close on February 2, 2016. A conference call to discuss the results will be held at 4:30 PM ET. To participate in Nanometrics' Q4/FY 2015 conference call: Dial-In Numbers: (877) 374-4041 (U.S.) (253) 237-1156 (Int'l) Conference ID/Passcode: 26782452 A live and recorded webcast of the conference call and supplemental financial information can be accessed from Nanometrics' website at www.nanometrics.com. About Nanometrics Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors and other solid-state devices, including sensors, optoelectronic devices, high-brightness LEDs, discretes and data storage components. Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, topography and various thin film properties, including three-dimensional features and film thickness, as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced three-dimensional wafer-level packaging applications. Nanometrics' systems enable advanced process control for device manufacturers, providing improved device yield at reduced manufacturing cycle time, supporting the accelerated product life cycles in the semiconductor and other advanced device markets. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. For more information, please click If you have a comment, please us. Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

News Article | June 21, 2011
Site: www.siliconbeat.com

“[Winifred Jiau] played a vital role. She provided information to the decimal point. That’s unheard of in business.” — Parbodh Sharma, a juror in the New York trial of Winifred Jiau, the Fremont resident who on Monday was found guilty of passing inside information to hedge funds about the earnings of Silicon Valley companies Nvidia and Marvell Technology Group in exchange for what she called “sugar” — or about $200,000 from 2006 to 2008, according to prosecutors. Jiau worked for Primary Global Research, a Mountain View-based expert network firm that employed others who have pleaded guilty in the case; another trial against another former employee is yet to come. Primary Global is one of many like it that have been thrust into the spotlight amid a U.S. crackdown on insider trading. The Wall Street Journal says that in the past 18 months, 44 out of 49 hedge-fund managers and others have been convicted or pleaded guilty to insider trading. Jiau faces up to 25 years in prison.

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