NANO UV Sas

Villebon-sur-Yvette, France

NANO UV Sas

Villebon-sur-Yvette, France

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Zakharov S.V.,NANO UV Sas | Zakharov S.V.,EPPRA Sas | Zakharov S.V.,RAS Research Center Kurchatov Institute | Zakharov V.S.,RAS Research Center Kurchatov Institute | And 9 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2011

In the specifications for EUV sources, high EUV power at IF for lithography HVM and very high brightness for actinic mask and in-situ inspections are required. In practice, the non-equilibrium plasma dynamics and self-absorption of radiation limit the in-band radiance of the plasma and the usable radiation power of a conventional single unit EUV source. A new generation of the computational code Z* is currently developed under international collaboration in the frames of FP7 IAPP project FIRE for modelling of multi-physics phenomena in radiation plasma sources, particularly for EUVL. The radiation plasma dynamics, the spectral effects of self-absorption in LPP and DPP and resulting Conversion Efficiencies are considered. The generation of fast electrons, ions and neutrals is discussed. Conditions for the enhanced radiance of highly ionized plasma in the presence of fast electrons are evaluated. The modelling results are guiding a new generation of EUV sources being developed at Nano-UV, based on spatial/temporal multiplexing of individual high brightness units, to deliver the requisite brightness and power for both lithography HVM and actinic metrology applications. © 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).


Powell K.,NANO UV Sas | Duffy G.,NANO UV Sas | Choi P.,NANO UV Sas | Choi P.,EPPRA Sas | And 9 more authors.
AIP Conference Proceedings | Year: 2010

Soft x-ray microscopy is an attractive tool for the study of biological samples in-vitro, due to the penetrating nature of x-rays and the natural contrast which can be achieved in hydrated samples. There has been a roadblock to the commercialisation and rollout of small, laboratory scale, x-ray microscopes for use in the wider community, as high resolution x-ray microscopy requires tuneable, high brightness x-ray sources. NANO-UV has engaged in a product development programme to introduce the first affordable stand-alone compact soft x-ray microscope for in-vitro studies, known as McXI. The initial specification of McXI is to provide 100 nm resolution on in-vitro specimens, with a unique wavelength selection mechanism in the 2.3-4.4 nm region. © 2011 American Institute of Physics.


Choi P.,NANO UV sas | Choi P.,EPPRA sas | Zakharov S.V.,NANO UV sas | Zakharov S.V.,EPPRA sas | And 17 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2010

EUV sources for actinic mask metrology, particularly for defect inspection, require extremely high brightness. The selfabsorption of radiation limits the in-band EUV radiance of the source plasma and makes it difficult to attain the necessary brightness and power from a conventional single unit EUV source. One possible solution is through multiplexing of multiple low etendue sources. NANO-UV is delivering a new generation of EUV light source with an intrinsic photon collector, the i-SoCoMo™ concept, where a micro plasma pulsed discharge source is integrated to a photon collector based on an in situ active plasma structure. The source is characterized by high brightness, low etendue and very high irradiance, at moderate output power, without the use of external physical optics. Such a source could form the basic building block, through multiplexing of several units, to satisfy the very high brightness and moderate power requirement of the EUV sources required for actinic mask metrology. Based upon this multiplexing concept, a family of specially configured multiplexed source structures, the HYDRA™ design, is being introduced to address the mask metrology needs. © 2010 Copyright SPIE - The International Society for Optical Engineering.


Zakharov S.V.,NANO UV sas | Zakharov S.V.,EPPRA sas | Zakharov S.V.,RAS Research Center Kurchatov Institute | Choi P.,NANO UV sas | And 2 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2010

EUV source for actinic mask metrology, particularly for defect inspection, requires extremely high brightness. The selfabsorption of radiation limits the in-band EUV radiance of the source plasma and the etendue constraint limits the usable power of a conventional single unit EUV source. Theoretical study and numerical modelling has been carried out to address fundamental issues in tin and xenon plasmas and to optimize the performance of EUV sources. The highly ionized xenon plasma in the presence of fast electrons demonstrates the enhanced radiance. Theoretical models and robust modelling tools are being further developed under an international collaboration project FIRE in the frame of the EU FP7 IAPP program. NANO-UV is delivering a new generation of EUV light source with an intrinsic photon collector. Extensive numerical modelling has provided basic numbers to select the optimal regimes for tin and xenon based source operation. From these designs, a family of specially configured multiplexed source structures is being introduced to address the mask metrology needs. © 2010 Copyright SPIE - The International Society for Optical Engineering.


Choi P.,NANO UV Sas | Choi P.,EPPRA Sas | Zakharov S.V.,NANO UV Sas | Zakharov S.V.,EPPRA Sas | And 16 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2011

The roll out of EUV lithography for HVM, including the associated tools for actinic mask and mask blank defect inspection, require reliable and powerful EUV radiation sources. NANO-UV has developed a unique EUV/soft X-ray source, the CYCLOPSTM, based on a fast, micro-plasma pulsed discharge, incorporating the i-SoCoMoTM technology; an intrinsic plasma structure to provide photon collection and delivery. We report on the EUV light source development, including the extensive numerical modelling which provided the basic parameters required for high power or high irradiance operating regimes. Without using external physical optics, a peak irradiance exceeding 1018 ph/cm2/s, in a 3 nm bandwidth around 13.5nm, has been recorded at a distance 74 cm downstream from the source, which was operating at 1 kHz in a He:N2:Xe gas admixture at up to 0.5J per pulse operation. A new Sn-alloy cathode material has enhanced the output by a factor of 1.5 with the power now delivered in a sub-cm size spot being greater than 20W in 3nm band, with a typical étendue below 10-2 mm2• sr. NANO-UV can meet the HVM source requirements with its HYDRATM spatial/temporal multiplexed source development. A multiplex of 12 units form HYDRATM -12P having the potential of reaching 240W (within 3 nm EUV band) at IF demonstrates multiplexing principle. © 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).

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