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Ilmenau, Germany

Ahmad A.,TU Ilmenau | Ivanov T.,TU Ilmenau | Angelov T.,Nano Analytik GmbH | Rangelow I.W.,TU Ilmenau
Journal of Micro/ Nanolithography, MEMS, and MOEMS | Year: 2015

The conventional optical lever detection technique involves optical components and their precise mechanical alignment. An additional technical limit is the weight of the optical system in cases where a top-scanner is used with high-speed and high-precision metrology. An alternative represents the application of self-actuated atomic force microscopy (AFM) cantilevers with integrated two-dimensional electron gas (2-DEG) piezoresistive deflection sensors. A significant improvement in the performance of such cantilevers with respect to deflection sensitivity and temperature stability has been achieved by using an integrated Wheatstone bridge configuration. Due to employing effective crosstalk isolation and temperature drift compensation, the performance of these cantilevers was significantly improved. In order to enhance the speed of AFM measurements, we present an adaptive scanning speed procedure. Examples of AFM measurements with a high scanning speed (up to 200 lines/s) committed to advanced lithography process development are shown. © 2015 Society of Photo-Optical Instrumentation Engineers (SPIE). Source


Kaestner M.,TU Ilmenau | Ivanov T.,TU Ilmenau | Schuh A.,TU Ilmenau | Ahmad A.,TU Ilmenau | And 11 more authors.
Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics | Year: 2014

Scanning probes have enabled modern nanoscience and are still the backbone of today's nanotechnology. Within the technological development of AFM systems, the cantilever evolved from a simple passive deflection element to a complex microelectromechanical system through integration of functional groups, such as piezoresistive detection sensors and bimaterial based actuators. Herein, the authors show actual trends and developments of miniaturization efforts of both types of cantilevers, passive and active. The results go toward the reduction of dimensions. For example, the authors have fabricated passive cantilever with a width of 4 μm, a length of 6 μm and thickness of 50-100 nm, showing one order of magnitude lower noise levels. By using active cantilevers, direct patterning on calixarene is demonstrated employing a direct, development-less phenomena triggered by tip emitted low energy (<50 eV) electrons. The scanning probes are not only applied for lithography, but also for imaging and probing of the surface before and immediately after scanning probe patterning. In summary, piezoresistive probes are comparable to passive probes using optical read-out. They are able to routinely obtain atomic step resolution at a low thermal noise floor. The active cantilever technology offers a compact, integrated system suited for integration into a table-top scanning probe nanolithography tool. © 2014 American Vacuum Society. Source


Kaestner M.,TU Ilmenau | Aydogan C.,TU Ilmenau | Ivanov T.,TU Ilmenau | Ahmad A.,TU Ilmenau | And 12 more authors.
Journal of Micro/ Nanolithography, MEMS, and MOEMS | Year: 2015

The routine "on demand" fabrication of features smaller than 10 nm opens up new possibilities for the realization of many devices. Driven by the thermally actuated piezoresistive cantilever technology, we have developed a prototype of a scanning probe lithography (SPL) platform which is able to image, inspect, align, and pattern features down to the single digit nanoregime. Here, we present examples of practical applications of the previously published electric-field based current-controlled scanning probe lithography. In particular, individual patterning tests are carried out on calixarene by using our developed table-top SPL system. We have demonstrated the application of a step-and-repeat SPL method including optical as well as atomic force microscopy-based navigation and alignment. The closed-loop lithography scheme was applied to sequentially write positive and negative tone features. Due to the integrated unique combination of read-write cycling, each single feature is aligned separately with the highest precision and inspected after patterning. This routine was applied to create a pattern step by step. Finally, we have demonstrated the patterning over larger areas, over existing topography, and the practical applicability of the SPL processes for lithography down to 13-nm pitch patterns. To enhance the throughput capability variable beam diameter electric field, current-controlled SPL is briefly discussed. © 2015 Society of Photo-Optical Instrumentation Engineers. Source


Kaestner M.,TU Ilmenau | Aydogan C.,TU Ilmenau | Lipowicz H.-S.,TU Ilmenau | Ivanov T.,TU Ilmenau | And 10 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2015

The routine "on demand" fabrication of features smaller than 10 nm opens up new possibilities for the realization of many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated, piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of molecular resists using active scanning probes represents a promising path circumventing the problems in today's radiation-based lithography. Here, we present examples of practical applications of the previously published electric field based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature the practical applicability of the lithographic processes. © 2015 SPIE. Source


Ahmad A.,TU Ilmenau | Ivanov T.,TU Ilmenau | Reum A.,Nano Analytik GmbH | Guliyev E.,TU Ilmenau | And 7 more authors.
Proceedings of SPIE - The International Society for Optical Engineering | Year: 2015

The conventional optical lever detection technique involves optical components and its precise mechanical alignment. An additional technical limit is the weight of the optical system, in case a top-scanner is used in high speed and high precision metrology. An alternative represents the application of self-actuated AFM cantilevers with integrated 2DEG piezoresistive deflection sensors. A significant improvement in performance of such cantilevers with respect to deflection sensitivity and temperature stability has been achieved by using an integrated Wheatstone bridge configuration. Due to employing effective cross-talk isolation and temperature drift compensation the performance of these cantilevers was significantly improved. In order to enhance the speed of AFM measurements we are presenting a fast cantilever-approach technology, Q-factor-control and novel adaptive scanning speed procedure. Examples of AFM measurements with high scanning speed (up to 200 lines/s) committed to advanced lithography process development are shown. © 2015 SPIE. Source

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