Entity

Time filter

Source Type


Inoue M.,Wakayama University | Ohta T.,Meijo University | Takota N.,Wakayama University | Tsuchitani S.,Wakayama University | And 6 more authors.
Japanese Journal of Applied Physics | Year: 2012

The behaviors of Pb and metastable He atoms in the multi-micro hollow cathode lamp (multi-MHCL) at pressures of the order of kPa have been investigated by diode laser absorption spectroscopy. The pressure broadening effect for absorption line-profile was overlapped to Doppler profile and was estimated to be 0.26 MHz/Pa from line-profiles of metastable He atoms in the range from 5 to 10 kPa. The translational temperatures of metastable He atoms decreased from 830 to 410 K with increasing the pressure from 5 to 10 kPa. From line-profiles of Pb atoms, the temperatures and densities of Pb in the multi-MHCL were evaluated to decrease from 820 to 610 K and 9:0 × 10 11 to 4:6 × 10 11 cm -3 with increasing He pressure from 4.9 to 7.4 kPa, respectively. The Lorentz broadenings was larger than those of He atom and the pressure dependence were estimated to be 0.22 MHz/Pa. The behaviors of emission intensities corresponded with those of atomic densities due to enhancement of sputtering. From these results, the multi-MHCL with line-profile guaranteed has been realized for measuring multi-metallic atom densities precisely. © 2012 The Japan Society of Applied Physics. Source


Takeda K.,Nagoya University | Takeda K.,Japan Science and Technology Agency | Miyawaki Y.,Nagoya University | Takashima S.,Nagoya Industries Promotion Corporation | And 6 more authors.
Journal of Applied Physics | Year: 2011

Plasma-induced damage to porous SiOCH (p-SiOCH) films during organic resist film ashing using dual-frequency capacitively coupled O2 plasmas was investigated using the pallet for plasma evaluation method developed by our group. The damage was characterized by ellipsometry and Fourier-transform infrared spectroscopy. Individual and synergetic damage associated with vacuum ultraviolet (VUV) and UV radiation, radicals, and ions in the O2 plasma were clarified. It was found that the damage was caused not only by radicals but also by synergetic reactions of radicals with VUV and UV radiation emitted by the plasmas. It is noteworthy that the damage induced by plasma exposure without ion bombardment was larger than the damage with ion bombardment. These results differed from those obtained using an H 2/N2 plasma for resist ashing. Finally, the mechanism of damage to p-SiOCH caused by O2 and H2/N2 plasma ashing of organic resist films is discussed. These results are very important in understanding the mechanism of plasma-induced damage to p-SiOCH films. © 2011 American Institute of Physics. Source


Inoue M.,Wakayama University | Ohta T.,Meijo University | Takota N.,Wakayama University | Tsuchitani S.,Wakayama University | And 6 more authors.
Japanese Journal of Applied Physics | Year: 2012

Indium-zinc-oxide (IZO) films were synthesized by radio frequency magnetron sputtering. In order to clarify the mechanisms of IZO film formation, the absolute densities of In and Zn atoms were measured simultaneously by absorption spectroscopy employing the multi-micro hollow cathode lamp. Their densities were measured to be 10 9 to 10 11 cm -3 and increased with pressure from 1 to 10 Pa. The density ratios of In to Zn in the gas phase corresponded to the ratios of film composition, and the relative amount of Zn atom increased with decreasing pressure. Carrier density increased with decreasing density ratio of In to Zn owing to the increase in the number of oxygen vacancies, which was clarified from the O 1s spectra obtained by X-ray photoelectron spectroscopy. A low resistivity of 10 -6 ωm and an optical transmission of over 80% in the visible region were achieved at a pressure of 1 Pa. © 2012 The Japan Society of Applied Physics. Source


Ito M.,Nagoya Industries Promotion Corporation | Hayakawa M.,Nagoya Industries Promotion Corporation | Takashima S.,Nagoya Industries Promotion Corporation | Asami E.,Nagoya Industries Promotion Corporation | And 7 more authors.
Japanese Journal of Applied Physics | Year: 2012

A method for preparing an aqueous dispersion of titanium dioxide (TiO 2) nanoparticles by generating plasma on the liquid surface was developed. The plasma was generated between the tip of a needle electrode in the gas phase and the liquid surface. A 0.01 wt% aqueous dispersion of TiO 2 was prepared by plasma treatment with ultrasonication. Dynamic light scattering measurements indicated that the average TiO 2 nanoparticle sizes in the dispersions with plasma treatment in air and Ar atmosphere were approximately 150 and 180 nm, respectively. Although the pH of the dispersion prepared by Ar plasma treatment was fairly close to the isoelectric point of TiO 2, the dispersion maintained a finely dispersed state. The surface potentials of TiO 2 nanoparticles in the dispersions treated with plasma were confirmed to be positively charged. This suggests that the dispersions formed by plasma treatment were stabilized by electrostatic repulsion between the particles. © 2012 The Japan Society of Applied Physics. Source

Discover hidden collaborations