Kyoto, Japan

Murata Manufacturing Co., Ltd. is a Japanese manufacturer of electronic components, based in Nagaokakyo, Kyoto. Honorary Chairman Akira Murata started Murata Manufacturing as a personal venture in October, 1944. On December 1950 reorganized the company into Murata Manufacturing Co., Ltd. with paid-in Capital ¥1 million.Murata Manufacturing is a leading company primarily involved in the manufacturing of ceramic passive electronic components, primarily capacitors, and it has an overwhelming share worldwide in ceramic filters, high-frequency parts, and sensors. As of March 31, 2013 Murata Manufacturing has 24 subsidiaries in Japan and 52 overseas in the United States, Canada, Mexico, Brazil, Germany, France, Italy, the United Kingdom, Switzerland, the Netherlands, Spain, Hungary, Finland, China, Taiwan, South Korea, Singapore, Malaysia, the Philippines, Thailand, Hong Kong, Vietnam and India.On April 13, 2012, Murata announced a deal to acquire RF Monolithics for $1.78 per share.On August 23, 2014, Murata announced the acquisition of Peregrine Semiconductor Corporation. Wikipedia.


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Patent
Murata Manufacturing Co. | Date: 2017-01-11

A fluid control device (10) having a flow passage passing through a pump chamber (45) and a valve chamber (40) includes a vibration unit (37) that vibrates to cause fluctuation of an internal pressure in the pump chamber (45), a valve bottom plate (23) facing the valve chamber (40) and having a communication hole (43) communicating with the pump chamber (45) at one end and communicating with the valve chamber (40) at the other end, and a valve top plate (21) facing the valve chamber (40) to be opposed to the valve bottom plate (23) and having a discharge hole (41) communicating with the valve chamber (40). The communication hole (43) and the discharge hole (41) are not opposed to each other, and the valve bottom plate (23) is elastically deformed by transmission of vibration of the vibration unit (37) thereto.


A ceramic electronic component includes a ferrite material magnetic body part and a Cu conductive part, the ferrite containing 20 to 48% trivalent Fe in terms of Fe_(2)O_(3 )and divalent Ni. The ferrite can contain Mn so that it is less than 50% of the total of Fe and Mn in terms of Mn_(2)O_(3 )and Fe_(2)O_(3). The magnetic and conductive parts are co-fired at a pressure not exceeding the equilibrium oxygen partial pressure of CuCu_(2)O thereby ensuring insulating performance and favorable electrical characteristics.


Patent
Murata Manufacturing Co. | Date: 2017-01-30

A ceramic electronic component includes a rectangular or substantially rectangular parallelepiped-shaped stack in which a ceramic layer and an internal electrode are alternately stacked and an external electrode provided on a portion of a surface of the stack and electrically connected to the internal electrode. The external electrode includes an inner external electrode covering a portion of the surface of the stack and including a mixture of a resin component and a metal component and an outer external electrode covering the inner external electrode and including a metal component. A volume occupied by the resin component in the inner external electrode is within a prescribed range.


Patent
Murata Manufacturing Co. | Date: 2017-01-27

First no-electrode-forming areas where first wiring electrodes such as internal wiring electrodes and external connection terminals are not formed are set to ranges that overlap inductor components in a plan view of at least one of dielectric layers of a first substrate, and second no-electrode-forming areas where second wiring electrodes such as internal wiring electrodes and mounting electrodes are not formed are set to ranges that overlaps the inductor components in a plan view of at least one of dielectric layers of a second substrate. Accordingly, reduction of the inductance of the inductor components, which is caused by the first and second wiring electrodes crossing the magnetic field of the inductor components, can be suppressed. Therefore, the overall component size can be reduced without deteriorating the Q value of the inductor components by configuring an RF component with a stacking structure.


Patent
Murata Manufacturing Co. | Date: 2017-01-27

A ladder filter includes a piezoelectric substrate, an antenna terminal, a transmission terminal, and ground terminals on the piezoelectric substrate, and IDT electrodes. Each of the IDT electrodes is disposed on the piezoelectric substrate and includes a plurality of electrode fingers and a pair of busbars to which first ends of the plurality of electrode fingers are connected commonly. The IDT electrodes define elastic wave resonators. The ladder filter further includes an interlayer insulating film disposed on at least one of the busbars and a thermally conductive member made of a material with thermal conductivity higher than that of the interlayer insulating film and disposed on the interlayer insulating film. The thermally conductive member is in contact with at least one of the antenna terminal, the transmission terminal, and the ground terminals.


Patent
Murata Manufacturing Co. | Date: 2017-01-31

Connection patterns of plural diodes include a first series connection pattern and a second series connection pattern. The first series connection pattern extends from an input terminal in the X direction. The second series connection pattern has a portion through which a current flows to approach the input terminal. The first series connection pattern includes a first diode, which is the first diode counted from the input terminal. The second series connection pattern includes a second diode, which is the last diode counted from the input terminal. The second diode is disposed separately from the first diode with some distance therebetween in the Y direction. An N-type region of the first diode and a P-type region of the second diode directly oppose each other as viewed in a planar direction.


Patent
Murata Manufacturing Co. | Date: 2017-05-17

An aspirator (10) includes a pump, a detecting unit, and a control unit. The pump is driven by a piezoelectric element (22) and has a suction portion and a discharge portion. The detecting unit includes a current detector (32) and a regulator (33), and detects a closed state of the suction portion. The control unit includes the regulator (33) and a voltage controller (34), and regulates an output voltage for the piezoelectric element (22) in accordance with the closed state of the suction portion detected by the detecting unit.


Patent
Murata Manufacturing Co. | Date: 2017-05-17

An object of the present invention is to provide a low pass filter that allows the interval between attenuation poles to be easily adjusted. A low pass filter according to the present invention includes: a first via-hole conductor connected to a first end portion of a first inductor and a third end portion of a second inductor and extending to another side in a lamination direction with respect to a second end portion of the first inductor and a fourth end portion of the second inductor; and a first capacitor connected in parallel with at least a portion of the first inductor and a portion of the second inductor and formed by a first capacitor conductor layer.


Patent
Murata Manufacturing Co. | Date: 2017-03-29

The method of the invention is concerned with creating MEMS structures by selectively etching a silicon wafer that is patterned by using a masking layer for defining the structural features of a MEMS device. The method comprises depositing and patterning a first mask (2) on a silicon wafer (1) to define desired first areas on the wafer (1) to be etched. First trenches (3a, 3b) are etched on parts of the wafer (1) not covered by the first mask (2) in a first trench etching. The first trenches (3a, 3b) are then filled with a deposit layer (4). A part of the deposit layer (4) is removed on desired second areas to be etched and the rest of it is left on areas to function as a second mask (4) in order to define final structures. Parts of the wafer (1) on the desired second areas is etched in a second trench etching, and said second mask (4) is removed. The method of the invention can be used for manufacturing a gyroscope by dimensioning the structures suitable for a gyroscope or for manufacturing an accelerator by dimensioning the structures suitable for an accelerator.


Patent
Murata Manufacturing Co. | Date: 2017-01-04

A microelectromechanical device that comprises a first structural layer, and a movable mass suspended to a primary out- of plane motion relative the first structural layer. A cantilever motion limiter structure is etched into the movable mass, and a first stopper element is arranged on the first structural layer, opposite to the cantilever motion limiter structure. Improved mechanical robustness is achieved with optimal use of element space.

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