Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands

Netherlands

Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands

Netherlands
SEARCH FILTERS
Time filter
Source Type

Yang M.,Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands | Aarnink A.A.I.,Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands | Kovalgin A.Y.,Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands | Wolters R.A.M.,Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands | Schmitz J.,Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands
Physica Status Solidi (A) Applications and Materials Science | Year: 2015

In this work, we investigated an approach of hot-wire assisted ALD (HWALD), utilizing a hot (up to 2000°C) tungsten (W) wire. Tungsten films were deposited by this method using alternating pulses of WF6 gas and atomic hydrogen (at-H). The latter was generated by catalytic dissociation of molecular hydrogen (H2) upon the hot-wire. The W films were grown on a 100-nm thick thermal SiO2. The growth process was monitored in real time by an in-situ spectroscopic ellipsometer (SE). The real-time SE monitoring revealed the coexistence of three processes: CVD, etching, and ALD of the W film. WF6 could back-stream diffuse to the hot-wire, resulting in WF6 decomposition and generation of a flux of fluorine (F). The latter caused etching of the grown W film and the filament, and provided extra tungsten supply, which might cause CVD. Higher pressure and higher carrier gas flow rate were found to largely suppress the back-stream diffusion of WF6, which efficiently limited CVD. By controlling the dose of WF6 and process pressure, the etching had also been minimized. X-ray photoelectron spectroscopy of optimized HWALD grown W revealed 99at% of W; concentrations of oxygen and fluorine were lower than 1%, below the detection limit. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Loading Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands collaborators
Loading Mesa And Institute For Nanotechnologyuniversity Of Twentepo Box 2177500Aeenschedethe Netherlands collaborators