Satya Narayana P.V.,Vellore Institute of Technology |
Venkateswarlu B.,Madanapalli Institute of Technology and Science |
Devika B.,Gandhi Institute of Technology and Management
Ain Shams Engineering Journal | Year: 2015
This paper investigates the effect of heat and mass transfer on MHD oscillatory flow in an asymmetric wavy channel with chemical reaction and heat source. The unsteadiness in the flow is due to an oscillatory pressure gradient across the ends of the channel. A magnetic field of uniform strength is applied in the direction perpendicular to the channel. However, the induced magnetic field is neglected due to the assumption of small magnetic Reynolds number. The temperature difference of the channel is also assumed high enough to induce heat transfer due to radiation. The governing equations are solved analytically by regular perturbation method. The analytical results are evaluated numerically and then are presented graphically to discuss the effects of different parameters entering into the problem. It is observed that the heat transport of a system is more increased in oscillatory flow than in ordinary conduction. © 2015.
Rajasekhar Reddy N.,Madanapalli Institute of Technology and Science |
Bahadur S.,Madanapalli Institute of Technology and Science |
Sateesh K.R.K.,Madanapalli Institute of Technology and Science
ACM International Conference Proceeding Series | Year: 2012
The paper presents two atypical risk chain prediction metrics for barometer coupling and accord in software systems. Our aboriginal metric, Ideal Coupling between Object classes (ICBO), is based on the acclaimed CBO coupling metric, while the added metric, Ideal Lack of Cohesion on Methods (ILCOM5), is based on the LCOM5 accord metric. One advantage of the proposed risk chain prediction metrics is that they can be computed in a simpler way as compared to some of the structural metrics. We empirically advised ICBO and ILCOM5 for admiration fault proneness of classes in a ample accessible antecedent arrangement and compared these metrics with a host of absolute structural and risk chain prediction metrics for the aforementioned task. Copyright © 2012 ACM.
Chandra Sekhar M.,Madanapalli Institute of Technology and Science |
Nanda Kumar Reddy N.,Madanapalli Institute of Technology and Science |
Victor Vedanayakam S.,Madanapalli Institute of Technology and Science |
Raja Reddy M.,Madanapalli Institute of Technology and Science |
Uthanna S.,Sri Venkateswara University
Journal of Optoelectronics and Advanced Materials | Year: 2014
Thin films of [(Ta2O5)0.85(TiO2)0.15] were deposited on p-Si (100) substrates by DC reactive magnetron sputtering technique subsequently, the as-deposited films were annealed at various temperatures in the range 873-1173 K. The composition and core level binding energies of the films were analyzed by XPS. X-ray diffraction results revealed that the as-deposited and the films annealed at 873 K was amorphous, where as the films annealed at ≥ 973 K were transformed to polycrystalline. The as-deposited (Ta2O5)0.85(TiO2)0.15 film (300 nm thick) showed a low leakage current density of 7.7x10-5 A/cm2 at 1.5 V and it was decreased to 1.1x10-6 A/cm2 at 1173 K. The current conduction mechanisms in the (Ta2O5)0.85(TiO2)0.15 films, was compared and correlated with the Poole-Frenkel and Schottky emissions.