LayTec GmbH | Date: 2010-08-18
A pyrometer that is adapted for detecting radiation in the range of 250 to 450 nm is disclosed. The pyrometer can be used for determining the temperature of a matter thermally emitting only ultraviolet-radiation. In particular, the pyrometer can include: a detector having an active area adapted for measuring thermal radiation, a longpass filter having a cut-off wavelength in the range of 400 to 450 nm, means adapted for alternately activating and deactivating the longpass filter, means adapted for measuring a first thermal radiation signal when the longpass filter is deactivated and adapted for measuring a second thermal radiation signal when the longpass filter is activated, and means adapted for determining a temperature corresponding to the measured thermal radiation from a difference of the first radiation signal and the second radiation signal.
LayTec GmbH | Date: 2010-05-11
The present invention relates to a method and an apparatus for determining the layer thickness and the refractive index of a sample. It is an object of the present invention to provide a method for determining the layer thickness of a sample (layer) having high light scattering characteristics that allows a fast (real-time process) and cost-effective measurement having a high accuracy. The method according to the present invention comprises: irradiating a first optical radiation onto the sample (
LayTec GmbH | Date: 2010-05-11
The present invention relates to a method for calibrating a pyrometer, a method for determining the temperature of a semiconducting wafer and a system for determining the temperature of a semiconducting wafer. It is an object of the present invention to provide a method for calibrating a pyrometer which overcomes the disadvantages of the prior art. According to the invention, during the heating process, a first optical radiation having a first wavelength is irradiated onto the calibration sample (
LayTec GmbH | Date: 2010-09-15
Agency: Cordis | Branch: FP7 | Program: CP-IP | Phase: NMP.2012.1.4-1 | Award Amount: 13.40M | Year: 2013
In this proposed integrating project we will develop innovative in-line high throughput manufacturing technologies which are all based on atmospheric pressure (AP) vapour phase surface and on AP plasma processing technologies. Both approaches have significant potential for the precise synthesis of nano-structures with tailored properties, but their effective simultaneous combination is particularly promising. We propose to merge the unique potential of atmospheric pressure atomic layer deposition (AP-ALD), with nucleation and growth chemical vapour deposition (AP-CVD) with atmospheric pressure based plasma technologies e.g. for surface nano-structuring by growth control or chemical etching and, sub-nanoscale nucleation (seed) layers. The potential for cost advantages of such an approach, combined with the targeted innovation, make the technology capable of step changes in nano-manufacturing. Compatible with high volume and flexible multi-functionalisation, scale-up to pilot-lines will be a major objective. Pilot lines will establish equipment platforms which will be targeted for identified, and substantial potential applications, in three strategically significant industrial areas: (i) energy storage by high capacity batteries and hybridcapacitors with enhanced energy density, (ii) solar energy production and, (iii) energy efficient (lightweight) airplanes. A further aim is to develop process control concepts based on in-situ monitoring methods allowing direct correlation of synthesis parameters with nanomaterial structure and composition. Demonstration of the developed on-line monitoring tools in pilot lines is targeted. The integrating project targets a strategic contribution to establishing a European high value added nano-manufacturing industry. New, cost efficient production methods will improve quality of products in high market value segments in industries such as renewable energy production, energy storage, aeronautics, and space. DoW adaptations being made responding on requests from Phase-2 Evaluation Report In Phase-2 of the evaluation process, a number of points were noted by the evaluators where the project had insufficient information or could benefit from upgrading or justification. Our response and actions against each point raised has been summarized and send to the project officer, Dr. Rene Martins, in a separate document.