PureLight Labs LLC

Scottsdale, AZ, United States

PureLight Labs LLC

Scottsdale, AZ, United States
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Dilocker S.,PureLight Labs LLC | Mullane S.,PureLight Labs LLC | Kumar A.,PureLight Labs LLC
Journal of Photopolymer Science and Technology | Year: 2016

This paper describes discrete metal compounds that are soluble in commonly known ester and alcohol organic solvents such as PGMEA and PGME. These metal-containing compositions (RX4) can form homogeneous films in varying film thickness in the range of nanometers to micrometers with excellent film thickness uniformity of less than 300 Å. RX4 films are photosensitive and can form negative tone patterns under multiple exposure conditions. RX4 films demonstrate tunable optical and electrical properties. Furthermore, such films act as useful patternable hard mask due to their excellent etch selectivity against organic layers and silicon oxide. High density of RX4 films renders them exceptionally resistant to high power ion beams in applications involving ion implantation. © 2016 SPST.

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