Kochi Industrial Promotion Center

Kochi, Japan

Kochi Industrial Promotion Center

Kochi, Japan
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Jiang N.,Kochi University of Technology | Jiang N.,Applied Nanotech, Inc. | Wang H.-X.,Dialight | Sasaoka H.,Kochi Industrial Promotion Center | And 2 more authors.
Materials Letters | Year: 2010

The thermal desorption behaviors of highly graphitized carbon nanowalls (CNWs) and their effects on CNW field emission properties have been investigated. The hydrocarbon materials are identified to be the main contents adsorbed on CNWs, and the absorption of H2O and O2, to a large degree, associates with the surface hydrocarbon. These major species desorb from CNW surface at 350-400 °C, and after desorption the CNWs present distinctly improved field emission properties. © 2010 Elsevier B.V.

Matsuda T.,Kochi University of Technology | Matsuda T.,Kochi Industrial Promotion Center | Furuta M.,Kochi University of Technology | Furuta M.,Kochi Industrial Promotion Center | And 6 more authors.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | Year: 2010

Ion implantation experiments of indium (In) into sputter-deposited undoped ZnO films were carried out to control the resistivity for n+ -ZnO layers of electronic device. Improvement of ZnO crystallinity after the ion implantation was revealed by x-ray diffraction patterns including a shift of lattice parameter, enhancement of peak intensity, and a decrease in full width at half maximum in 2θ. In-implanted ZnO crystallinity was greatly improved compared to results of the Ga and Al-implanted ZnO experiments. The resistivity of 1× 1016 ions/ cm2 implanted ZnO film was decreased with over 11 orders of magnitude to 5.1× 10-2 Ωcm with postimplantation annealing at 400 °C. The ratio of resistivity between unimplanted ZnO and In-implanted one at 1× 10 15 ions/ cm2 was seven orders of magnitude after annealing at 300 °C. The In-implanted ZnO would be suitable for fabricating source and drain regions of ZnO thin film transistors. © 2010 American Vacuum Society.

Jiang N.,Kochi University of Technology | Wang H.X.,Dialight | Zhang H.,Kochi University of Technology | Sasaoka H.,Kochi Industrial Promotion Center | Nishimura K.,Kochi Industrial Promotion Center
Journal of Materials Chemistry | Year: 2010

The microstructure and surface features of carbon nanowall (CNW) thin films has been investigated by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). It is found that CNWs have a surface chemical state comprising a mixture of sp2 and a few sp3 bonds. Some oxygen atoms are chemically absorbed on the CNW surface. The valence band XPS spectra revel the CNW shows a band structure like normal crystalline graphite materials. Hydrogen plasma treatment technique is employed to modify the CNW surface, which is evidenced to be an efficient approach to increase CNW surface areas, benefiting to host and anchor catalyst substances. © 2010 The Royal Society of Chemistry.

Kochi Industrial Promotion Center and Casio Computer Co. | Date: 2010-05-13

An electron emission film having a pattern of diamond in X-ray diffraction and formed of a plurality of diamond fine grains having a grain diameter of 5 nm to 10 nm is formed on a substrate. The electron emission film can restrict the field intensity to a low level when it causes an emission current to flow, and has a uniform electron emission characteristic.

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